IP Library › Granted Patent US 10,211,071
Granted Patent B2
US 10,211,071 · App. 15/011,198 · Granted Feb 19, 2019

IC packaging method and a packaged IC device

Inventors: Chung Hsiung Ho (Kaohsiung, TW); Wen-Hsuan Lin (Kaohsiung, TW)
Assignee: NXP B.V.
H01L21/561H01L21/568H01L23/49822H01L23/552H01L24/19H01L24/24H01L24/82H01L24/97H01L25/042H01L25/046H01L25/0655H01L25/072H01L2224/04105H01L2224/12105H01L2224/24247H01L2224/82039H01L2924/14H01L2924/3025
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Quick Facts
Patent No.
US 10,211,071
App. No.
15/011,198
Granted
Feb 19, 2019
Kind
B2
Abstract

Embodiments of a method for packaging Integrated Circuit (IC) dies and an IC device are described. In an embodiment, a method for packaging IC dies involves creating openings on a substrate, where side surfaces of the openings on the substrate are covered by metal layers, placing the IC dies into the openings on the substrate, applying a second metal layer to the substrate, where the IC dies are electrically connected to at least a portion of the second metal layer, and cutting the substrate into IC devices.

Claims (41)

1. A method for packaging Integrated Circuit (IC) dies, the method comprising:

creating a plurality of openings on a substrate, wherein side surfaces of the openings on the substrate are covered by first metal layers and a top surface of the substrate is covered by a second metal layer;

applying a tape layer to a bottom surface of the substrate;

placing the IC dies into the openings on the substrate with a back side of each IC die on the tape layer, and contact pads of each IC die are positioned face-up in each opening;

applying a third metal layer having an attached resin film to the top surface of the substrate and over the IC dies;

removing portions of the third metal layer and the resin film to form gaps exposing the contact pads of the IC dies;

applying metal in each of the gaps to create metal plugs on the contact pads of the IC dies;

patterning the third metal layer around the metal plugs to form metal contacts that are electrically connected to the contact pads of the IC dies; and

cutting the substrate into IC devices.

2. The method of claim 1 , wherein the first metal layers on the side surfaces of the openings are in contact with the second metal layer on the top surface of the substrate and with a fourth metal layer that covers the bottom surface of the substrate.

3. The method of claim 2 , wherein each of the first metal layers that are applied to the side surfaces of the openings and the second, third and fourth metal layers comprises copper (Cu).

4. The method of claim 2 , wherein the tape layer is applied to the fourth metal layer on the bottom surface of the substrate before placing the IC dies into the openings on the substrate.

5. The method of claim 1 , further comprising removing the tape layer after applying the third metal layer having the attached resin film to the top surface of the substrate.

6. The method of claim 1 , wherein the patterning the third metal layer comprises:

applying ultraviolet (UV) lasers to create a first set of openings on the third metal layer.

7. The method of claim 6 , further comprising creating a second set of openings on the resin film such that the contact pads on the IC dies are exposed.

8. The method of claim 2 , further comprising attaching a fifth metal layer to the fourth metal layer on the bottom surface of the substrate.

9. The method of claim 1 , further comprising: attaching a sixth metal layer to a top surface of the third metal layer, after the metal plugs are formed and before the patterning to form metal contacts.

10. The method of claim 1 , wherein the patterning further comprises: removing some portions of the third metal layer by photo patterning.

11. The method of claim 1 , further comprising depositing solder mask layers on the top and bottom surfaces of the substrate.

12. The method of claim 1 , wherein cutting the substrate into the IC devices comprises cutting the substrate using saw blades into Quad Flat No-lead (QFN) devices.

13. The method of claim 1 , further comprising depositing contact balls onto the metal contacts, and wherein cutting the substrate into the IC devices comprises cutting the substrate using saw blades into ball grid array (BGA) devices.

14. The method of claim 1 , further comprising:

removing at least one portion of the third metal layer and the resin film from the top surface of the substrate to form at least one gap exposing a portion of the second metal layer on the top surface of the substrate; and

applying metal in the at least one gap to create at least one metal contact to the second metal layer on the substrate.

15. The method of claim 1 , further comprising:

depositing a solder mask around the metal contacts.

16. A method for packaging Integrated Circuit (IC) dies, the method comprising:

creating a plurality of openings on a substrate;

sputtering a metal material on the substrate such that first metal layers on side surfaces of the openings are electrically connected to a second metal layer on a top surface of the substrate and to a third metal layer on a bottom surface of the substrate;

placing the IC dies into the openings on the substrate with contact pads of each IC die positioned face-up;

applying a fourth metal layer having an attached resin film to the top surface of the substrate and over the IC dies;

forming metal contacts to the contact pads using the fourth metal layer, wherein the metal contacts are electrically connected to the contact pads of the IC dies; and

cutting the substrate into IC devices.

17. The method of claim 16 , further comprising:

applying a tape layer to the third metal layer on the bottom surface of the substrate before placing the IC dies into the openings on the substrate;

and

removing the tape layer after applying the fourth metal and the resin film to the substrate.

18. The method of claim 16 , wherein the forming metal contacts further comprises: applying ultraviolet (UV) lasers to create a plurality of openings on the fourth metal layer and the resin film such that the contact pads on the IC dies are exposed.

19. The method of claim 18 , wherein the forming metal contacts further comprises: applying metal in the plurality of openings on the fourth metal layer to create metal plugs on the contact pads of the IC dies.

20. The method of claim 19 , wherein the forming metal contacts further comprises: patterning the fourth metal layer around the metal plugs to form the metal contacts that are electrically connected to the contact.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2016
From: HO, CHUNG HSIUNG; LIN, WEN-HSUAN
To: NXP B.V.
Reel/Frame 037624/0963 →
Continuity (1)
Related Publication 20170221728A1 · Aug 3, 2017
Cited By (2)
US 12,261,145 US 12,677,693