C-plane GaN substrate
Provides is a C-plane GaN substrate which, although formed from a GaN crystal grown so that surface pits are generated, is free from any inversion domain, and moreover, has a low spiral dislocation density in a gallium polar surface. Provides is a C-plane GaN substrate wherein: the substrate comprises a plurality of facet growth areas each having a closed ring outline-shape on a gallium polar surface; the spiral dislocation density is less than 1×10 6 cm −2 anywhere on the gallium polar surface; and the substrate is free from any inversion domain. The C-plane GaN substrate may comprise a high dislocation density part having a dislocation density of more than 1×10 7 cm −2 and a low dislocation density part having a dislocation density of less than 1×10 6 cm −2 on the gallium polar surface.
1. A C-plane GaN substrate comprising:
a plurality of facet growth areas each having a closed ring outline-shape on a gallium polar surface, wherein
a spiral dislocation density is less than 1×10 6 cm −2 anywhere on the gallium polar surface, and
the gallium polar surface is free from any inversion domain.
2. The C-plane GaN substrate according to claim 1 , wherein the spiral dislocation density is less than 8×10 5 cm −2 anywhere on the gallium polar surface.
3. The C-plane GaN substrate according to claim 1 , wherein the substrate comprises a high dislocation density part having a dislocation density of more than 1×10 7 cm −2 and a low dislocation density part having a dislocation density of less than 1×10 6 cm −2 on the gallium polar surface.
4. The C-plane GaN substrate according to claim 3 , wherein, when the entire gallium polar surface is comparted into 100-μm square compartments, 1% or more of all the compartments each have a dislocation density of less than 1×10 5 cm −2 .
5. The C-plane GaN substrate according to claim 1 , wherein the substrate is doped with oxygen.
6. The C-plane GaN substrate according to claim 1 , wherein the substrate is doped with either or both of silicon and germanium.
7. The C-plane GaN substrate according to claim 1 , wherein the substrate has an electrical resistivity of 0.1 Ω·cm or less.
8. The C-plane GaN substrate according to claim 1 , wherein the plurality of facet growth areas are at least partially regularly arranged on the main surface.
9. A method for producing a nitride semiconductor device, comprising a step of preparing the C-plane GaN substrate according to claim 1 , and a step of epitaxially growing at least one nitride semiconductor layer on the prepared C-plane GaN substrate.
10. A method for producing an epitaxial wafer, comprising a step of preparing the C-plane GaN substrate according to claim 1 , and a step of epitaxially growing at least one nitride semiconductor layer on the prepared C-plane GaN substrate.
11. A C-plane GaN substrate having a gallium polar surface, the substrate comprising:
a plurality of facet growth areas each having a closed ring outline-shape on the gallium polar surface, wherein
when a virtual square grid of 2 cm×2 cm is drawn on the gallium polar surface, each cell of the grid comprises at least one 1 cm×1 cm square area in which a spiral dislocation density is anywhere less than 1×10 6 cm −2 , and
the gallium polar surface is free from any inversion domain.
12. The C-plane GaN substrate according to claim 11 , wherein each cell of the grid comprises at least one 1 cm×1 cm square area in which a spiral dislocation density is anywhere less than 8×10 5 cm −2 .
13. The C-plane GaN substrate according to claim 11 , wherein the substrate comprises a high dislocation density part having a dislocation density of more than 1×10 7 cm −2 and a low dislocation density area having a dislocation density of less than 1×10 6 cm −2 on the gallium polar surface.
14. The C-plane GaN substrate according to claim 13 , wherein, when the entire gallium polar surface is comparted into compartments of 100 μm-square, 1% or more of all the compartments each have a dislocation density of less than 1×10 5 cm −2 .
15. The C-plane GaN substrate according to claim 11 , wherein the substrate is doped with oxygen.
16. The C-plane GaN substrate according to claim 11 , wherein the substrate is doped with either or both of silicon and germanium.
17. The C-plane GaN substrate according to claim 11 , wherein the substrate has an electrical resistivity of 0.1 Ω·cm or less.
18. The C-plane GaN substrate according to claim 11 , wherein the plurality of facet growth areas are at least partially regularly arranged on the main surface.
19. A method for producing a nitride semiconductor device, comprising a step of preparing the C-plane GaN substrate according to claim 11 , and a step of epitaxially growing at least one nitride semiconductor layer on the prepared C-plane GaN substrate.
20. A method for producing an epitaxial wafer, comprising a step of preparing the C-plane GaN substrate according to claim 11 , and a step of epitaxially growing at least one nitride semiconductor layer on the prepared C-plane GaN substrate.