IP Library › Granted Patent US 10,245,333
Granted Patent B2
US 10,245,333 · App. 15/241,796 · Granted Apr 2, 2019

Plasma generating apparatus and treatment method using the same

Inventors: Han Young Yu (Daejeon, KR); Yark Yeon Kim (Daejeon, KR); Won Ick Jang (Daejeon, KR); Yong Sun Yoon (Daejeon, KR); Bong Kuk Lee (Daejeon, KR)
Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
A61L2/0011A61N1/44A61L2202/11
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Quick Facts
Patent No.
US 10,245,333
App. No.
15/241,796
Granted
Apr 2, 2019
Kind
B2
Abstract

A plasma generating apparatus according to embodiments of the inventive concept, which provides plasma to a biological material, includes a housing configured to provide an inner space in which plasma is generated, a ground electrode coupled to one side of the housing, a power electrode coupled to the other side of the housing, and a controller configured to control a generation mode of the plasma. The generation mode includes a first mode in which the plasma is provided to the biological material while generating the plasma and a second mode in which the plasma is generated in the housing, and then the generated plasma is provided to the biological material.

Claims (45)

1. A plasma generating apparatus comprising:

a housing configured to provide an inner space in which plasma is generated;

a ground electrode coupled to one side of the housing;

a power electrode coupled to the other side of the housing; and

a controller configured to control a generation mode of the plasma,

wherein the generation mode comprises:

a first mode in which the plasma is provided to a target to be processed while generating the plasma; and

a second mode in which the plasma is generated in the housing, and then the generated plasma is provided to the target to be processed.

2. The plasma generating apparatus of claim 1 , wherein, in the first mode, an electric field formed between the power electrode and the target to be processed is greater than that formed between the power electrode and the ground electrode, and

in the second mode, the electric field formed between the power electrode and the target to be processed is less than that formed between the power electrode and the ground electrode.

3. The plasma generating apparatus of claim 2 , further comprising an adjusting device configured to adjust a distance between the ground electrode and the power electrode,

wherein the controller controls the adjusting device.

4. The plasma generating apparatus of claim 3 , wherein the controller controls the adjusting device to be positioned between a first position at which a first distance between the power electrode and the target to be processed is less than a second distance between the power electrode and the ground electrode and a second position at which the first distance is greater than the second distance.

5. The plasma generating apparatus of claim 2 , wherein the housing comprises:

an injection port through which a process gas for generating the plasma is injected into the inner space; and

a discharge port through which the plasma is discharged from the inner space,

wherein the injection port, the ground electrode, the power electrode, and the discharge port are arranged in a first direction.

6. The plasma generating apparatus of claim 5 , wherein, in a cross-section extending in the first direction of the housing, the ground electrode is disposed so that a distance between the ground electrode and the power electrode increases as the ground electrode is away from a surface of the housing.

7. The plasma generating apparatus of claim 5 , wherein one portion of the housing, which is disposed adjacent to the injection port, has a first width, and another portion of the housing, which is disposed adjacent to the discharge port, has a second width greater than the first width.

8. The plasma generating apparatus of claim 7 , wherein the second width is continuously widened from the first width in the first direction.

9. The plasma generating apparatus of claim 7 , wherein the second width is discontinuously widened from the first width in the first direction.

10. The plasma generating apparatus of claim 2 , further comprising an ozone removing part configured to remove ozone generated when the plasma is generated.

11. The plasma generating apparatus of claim 10 , wherein the ozone removing part comprises:

a chamber configured to provide a collection space in which the ozone is collected;

a fan disposed on one side of the chamber to form an inside of the collection space at a low pressure; and

a filter configured to filter the collected ozone.

12. The plasma generating apparatus of claim 2 , further comprising a window disposed on a surface of the housing.

13. A plasma generating apparatus comprising:

a housing configured to provide an inner space in which plasma is generated;

a ground electrode coupled to one side of the housing;

a power electrode coupled to the other side of the housing;

an adjusting device configured to adjust a distance between the ground electrode and the power electrode; and

a controller configured to control the adjusting device,

wherein the controller controls the adjusting device to be positioned between a first position at which a first distance between the power electrode and a target to be processed is less than a second distance between the power electrode and the ground electrode and a second position at which the first distance is greater than the second distance.

14. The plasma generating apparatus of claim 13 , wherein the housing comprises:

an injection port through which a process gas for generating the plasma is injected into the inner space; and

a discharge port through which the plasma is discharged from the inner space, and

the ground electrode is disposed between the injection port and the power electrode.

15. The plasma generating apparatus of claim 13 , further comprising an ozone removing part configured to remove ozone generated when the plasma is generated.

16. The plasma generating apparatus of claim 15 , wherein the ozone removing part comprises:

a chamber configured to provide a collection space in which the ozone is collected;

a fan disposed on one side of the chamber to form an inside of the collection space at a low pressure; and

a filter configured to filter the collected ozone.

17. The plasma generating apparatus of claim 14 , wherein one portion of the housing, which is disposed adjacent to the injection port, has a first width, and another portion of the housing, which is disposed adjacent to the discharge port, has a second width greater than the first width.

18. The plasma generating apparatus of claim 14 , further comprising a window disposed on a surface of the housing.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2016
From: YU, HAN YOUNG; KIM, YARK YEON; JANG, WON ICK; YOON, YONG SUN; LEE, BONG KUK
To: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
Reel/Frame 039764/0045 →
Priority Claims (2)
KR 10-2015-0116802 · Aug 19, 2015 · national
KR 10-2016-0003727 · Jan 12, 2016 · national
Continuity (1)
Related Publication 20170049913A1 · Feb 23, 2017