Device for producing ultrapure water

1. A device for producing ultrapure water according to a reverse osmosis (RO) principle with a reverse osmosis filter which is subdivided by a RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer,

the device for producing ultrapure water comprising,

a pump connected to a conduit of the primary circuit upstream of the reverse osmosis filter;

a flow resistance means and a valve with a discharge outlet connected to a concentrate conduit of the primary circuit downstream of the reverse osmosis filter;

a deposition layer detector arranged in or on a concentrate line of the primary circuit downstream of the primary chamber that detects a deposition layer of at least one of organic and inorganic deposits, the deposition layer detector being connected to a processor, the processor including a deposition layer evaluator; and

a buffer vessel having a flexible, expandable volume incorporated into a permeate conduit of the secondary circuit,

wherein the deposition layer evaluator is configured to determine a thickness measurement value of the deposition layer detected by the deposition layer detector;

wherein the deposition layer detector comprises a sensor system; and

wherein the sensor system is configured to initiate a back flushing of the RO membrane when the determined thickness measurement value reaches a predetermined limit measurement value, wherein the back flushing comprises the deposition layer evaluator causing the processor to stop the pump and open the valve to the discharge outlet, and further causing the processor to control the buffer vessel to produce a negative pressure on the RO membrane to cause a reverse flow via the RO membrane to the discharge outlet.

2. The device according to claim 1 , wherein the deposition layer evaluator is connected to a display for displaying the determined thickness measurement values.

3. The device according to claim 1 , wherein the deposition layer evaluator outputs an alarm signal when the predetermined limit measurement value is reached or exceeded.

4. The device according to claim 1 , wherein the sensor system comprises a transmitter for transmitting optical signals and a receiver for receiving incoming signals.

5. The device according to claim 4 , wherein a mirror reflecting the optical signals is positioned opposite to the transmitter of the optical signals as a measurement surface that reflects the optical signals to the receiver.

6. The device according to claim 5 , wherein a surface which is inert to deposits is positioned next to the measurement surface as a comparison or calibration surface.

7. The device according to claim 4 , wherein the sensor system containing a section of a liquid-conducting line or of a component getting into contact with the liquid consists fully or partially of transparent or translucent material.

8. The device according to claim 4 , wherein a sensor of the sensor system is installed in a measurement chamber.

9. The device according to claim 4 , wherein the transmitter emits UV light for detecting deposition layers including biological deposits.

10. The device according to claim 1 , wherein the deposit layer evaluator determines a thickness of the deposition layer, wherein the deposition layer comprises a biological and/or inorganic deposition.

11. A device for producing ultrapure water according to a reverse osmosis (RO) principle with a reverse osmosis filter which is subdivided by a RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer,

the device for producing ultrapure water comprising,

a pump connected to a conduit of the primary circuit upstream of the reverse osmosis filter;

a flow resistance means and a valve with a discharge outlet connected to a concentrate conduit of the primary circuit downstream of the reverse osmosis filter;

a deposition layer detector arranged in or on a ring line of the secondary circuit downstream of the secondary chamber that detects a deposition layer of at least one of organic and inorganic deposits, the deposition layer detector being connected to a processor, the processor including a deposition layer evaluator; and

a buffer vessel having a flexible, expandable volume incorporated into a permeate conduit of the secondary circuit,

wherein the deposition layer evaluator is configured to determine a thickness measurement value of the deposition layer detected by the deposition layer detector;

wherein the deposition layer detector comprises a sensor system; and

wherein the sensor system is configured to initiate a back flushing of the RO membrane when the determined thickness measurement value reaches a predetermined limit measurement value, wherein the back flushing comprises the deposition layer evaluator causing the processor to stop the pump and open the valve to the discharge outlet, and further causing the processor to control the buffer vessel to produce a negative pressure on the RO membrane to cause a reverse flow via the RO membrane to the discharge outlet.

12. A device for producing ultrapure water according to a reverse osmosis (RO) principle with a reverse osmosis filter which is subdivided by a RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer,

the device for producing ultrapure water comprising,

a pump connected to a conduit of the primary circuit upstream of the reverse osmosis filter;

a flow resistance means and a valve with a discharge outlet connected to a concentrate conduit of the primary circuit downstream of the reverse osmosis filter;

a deposition layer detector arranged in or on a ring line of the secondary circuit downstream of a consumer line connected to the secondary chamber that detects a deposition layer of at least one of organic and inorganic deposits, the deposition layer detector being connected to a processor, the processor including a deposition deposit layer evaluator; and

a buffer vessel having a flexible, expandable volume incorporated into a permeate conduit of the secondary circuit,

wherein the deposition layer evaluator is configured to determine a thickness measurement value of the deposition layer detected by the deposition layer detector;

wherein the deposition layer detector comprises a sensor system; and

wherein the sensor system is configured to initiate a back flushing of the RO membrane when the determined thickness measurement value reaches a predetermined limit measurement value, wherein the back flushing comprises the deposition layer evaluator causing the processor to stop the pump and open the valve to the discharge outlet, and further causing the processor to control the buffer vessel to produce a negative pressure on the RO membrane to cause a reverse flow via the RO membrane to the discharge outlet.

13. The device according to claim 1 , wherein during said back flushing of the RO membrane, the buffer vessel continues to feed permeate to the consumer in addition to said causing reverse flow via the RO membrane to the discharge outlet.

14. The device according to claim 11 , wherein during said back flushing of the RO membrane, the buffer vessel continues to feed permeate to the consumer in addition to said causing reverse flow via the RO membrane to the discharge outlet.

15. The device according to claim 12 , wherein during said back flushing of the RO membrane, the buffer vessel continues to feed permeate to the consumer in addition to said causing reverse flow via the RO membrane to the discharge outlet.