Aspect ratio trapping in channel last process
A method of forming the fin structure that includes forming a replacement gate structure on a channel region of the at least one replacement fin structure; and forming an encapsulating dielectric encapsulating the replacement fin structure leaving a portion of the replacement gate structure exposed. The exposed portion of the replacement gate structure is etched to provide an opening through the encapsulating dielectric to the replacement fin structure. The replacement fin structure is etched selectively to the dielectric to provide a fin opening having a geometry dictated by the encapsulating dielectric. Functional fin structures of a second semiconductor material is epitaxially grown on the growth surface of the substrate substantially filling the fin opening.
1. A method of forming the fin structure comprising:
forming a replacement gate structure on a channel region of the at least one replacement fin structure, the replacement fin structure extending from a supporting substrate;
forming an encapsulating dielectric on the supporting substrate and the at least one replacement gate structure, wherein the encapsulating dielectric encapsulates the replacement fin structure and a portion of the replacement gate structure is exposed;
etching an exposed portion of the replacement gate structure to provide an opening through the encapsulating dielectric to the replacement fin structure;
etching the replacement fin structure selectively to the encapsulating dielectric to remove an entirety of the replacement fin structure and to remove a portion of underlying supporting substrate and provide a fin opening having a geometry dictated by the encapsulating dielectric that exposes a growth surface of the substrate; and
epitaxially growing functional fin structures of a second semiconductor material on the growth surface of the supporting substrate substantially filling the fin opening.
2. The method of claim 1 , wherein the fin opening includes a substrate trench portion having a width greater than a fin body portion of said fin opening.
3. The method of claim 2 , wherein a difference in width between said substrate trench portion and said fin body portion provides for aspect ratio trapping of defects formed during said epitaxially growing said functional fin structures.
4. The method of claim 3 , wherein the aspect ratio trapping provides that a portion of the second semiconductor material in the substrate trench portion includes defects, and a portion of the second semiconductor material formed in the fin body portion of said fin opening is substantially free of defects.
5. The method of claim 4 , wherein a defect density of the second semiconductor material in the substrate trench portion ranges from 1 defect/cm 2 to 1×10 11 defects/cm 2 .
6. The method of claim 5 , wherein a defect density of the second semiconductor material in the fin body portion ranges from 0 defects/cm 2 to 1×10 10 defects/cm 2 .
7. The method of claim 1 , wherein the first semiconductor material is a type IV semiconductor selected from the group consisting of silicon (Si), germanium (Ge), silicon germanium (SiGe) and combinations thereof, and the second semiconductor material is a type III-V semiconductor material selected from the group consisting of indium phosphide (InP), (InGaAs) and combinations thereof.
8. A method of forming a semiconductor device comprising:
forming a replacement gate structure on a channel region of the at least one replacement fin structure;
forming an encapsulating dielectric that encapsulates the replacement fin structure leaving a portion of the replacement gate structure exposed;
etching the portion of the replacement gate structure that is exposed to provide an opening through the encapsulating dielectric to the replacement fin structure;
etching the replacement fin structure selectively to the encapsulating dielectric to remove an entirety of the replacement fin structure and provide a fin opening;
functional fin structures of a second semiconductor material are epitaxially grown on a growth surface of the substrate exposed by the fin opening; and
replacing a remaining portion of the replacement gate structure with a functional gate structure.
9. The method of claim 8 further comprising forming source and drain regions on source and drain portions of the functional fin structure.
10. The method of claim 8 , wherein the fin opening includes a substrate trench portion having a width greater than a fin body portion of said fin opening.
11. The method of claim 10 , wherein a difference in width between said substrate trench portion and said fin body portion provides for aspect ratio trapping of defects formed during said epitaxially growing said functional fin structures.
12. The method of claim 11 , wherein the aspect ratio trapping provides that a portion of the second semiconductor material in the substrate trench portion includes defects, and a portion of the second semiconductor material formed in the fin body portion of said fin opening is substantially free of defects.
13. The method of claim 12 , wherein a defect density of the second semiconductor material in the substrate trench portion ranges from 1 defects/cm 2 to 1×10 11 defects/cm 2 .
14. The method of claim 13 , wherein a defect density of the second semiconductor material in the fin body portion ranges from 0 defects/cm 2 to 1×10 10 defects/cm 2 .
15. The method of claim 8 , wherein the first semiconductor material is a type IV semiconductor selected from the group consisting of silicon (Si), germanium (Ge), silicon germanium (SiGe) and combinations thereof, and the second semiconductor material is a type III-V semiconductor material selected from the group consisting of indium phosphide (InP), indium gallium arsenic (InGaAs) and combinations thereof.