IP Library › Granted Patent US 10,254,449
Granted Patent B2
US 10,254,449 · App. 14/770,174 · Granted Apr 9, 2019

Electromagnetic radiation-scattering element and method of manufacturing same

Inventors: Hans-Christoph Eckstein (Jena, DE); Uwe Zeitner (Weimar, DE)
Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
G02B5/0221G01B11/24G02B5/0268G02B5/0284G02B5/18G02B27/0012
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Quick Facts
Patent No.
US 10,254,449
App. No.
14/770,174
Granted
Apr 9, 2019
Kind
B2
Abstract

The invention relates to an electromagnetic optical element which scatters radiation in a diffuse manner. Such optical elements can be used in nearly all projection applications including front and rear projection, display applications, (cinema) screens and similar. On the surface of a claimed optical element, a surface profile is provided, the surface structure of which is non-repeating and irregular. Elevations are formed that have a height by means of which a phase shift Δϕ may be achieved that is greater than two and a half times the longest wavelength used, and the elevations have a lateral extension in one plane respectively, in all axial directions, that is greater than five times the longest wavelength used. The individual elevations have a continuous form in the three spatial axial directions and said elevations are devoid of edges, ledges and fissures.

Claims (28)

1. An optical element for diffusely scattering electromagnetic radiation comprising,

a surface having a surface profile which does not form any repeating regular surface structure, wherein said surface profile is configured such that a zeroth order of diffraction is avoided or is suppressed with a proportion below 5%,

said surface including individual elevated portions, each individual elevated portion,

having a height at which a peak deviation Δϕ is achieved which is greater than two-and-a-half times a largest wavelength used to irradiate the optical element,

having a lateral extent in one plane in all axial directions, 360° about a center of said elevated portion, which is greater than five times said largest wavelength used to irradiate the optical element,

being continuously formed in three spatial directions,

having no edges, steps or jumps, and

presenting no second order surfaces.

2. The optical element of claim 1 , wherein said surface having said surface profile is coated with a reflective coating.

3. The optical element of claim 1 , wherein collimated electromagnetic radiation is receivable on said surface.

4. The optical element of claim 1 , wherein no elevated portion of said surface structure has a geometrical design and/or height and/or a volume of another elevated portion.

5. The optical element of claim 1 , wherein said optical element is adapted for a wavelength spectrum in a range between 200 nm and 1200 nm.

6. The optical element of claim 1 , wherein said optical element has a predefinable scatter distribution in a wavelength range which is larger than ±3% of a central wavelength within the wavelength range used to irradiate.

7. The optical element of claim 1 , wherein said elevated portions have no contour regions which change steadily constantly.

8. The optical element of claim 1 , said optical element for scattering electromagnetic radiation from a wavelength spectrum of visible light.

9. The optical element of claim 1 , said optical element formed from a material which is transparent for the electromagnetic radiation in the wavelength spectrum used to irradiate the optical element.

10. The optical element of claim 1 , wherein said surface structure includes regions for achieving a locally targeted deflection of electromagnetic radiation.

11. The optical element of claim 1 , wherein each individual elevated portion has a geometrical design and dimensioning defined by a deterministic calculation algorithm.

12. A method of manufacturing an optical element for diffusely scattering electromagnetic radiation, said optical element including,

a surface having a surface profile which does not form any repeating regular surface structure, wherein said surface profile is configured such that a zeroth order of diffraction is avoided or is suppressed with a proportion below 5%,

comprising calculating said surface structure such that individual elevated portions are formed, each individual elevated portion,

having a height at which a peak deviation Δϕ is achieved which is greater than two-and-a-half times a largest wavelength used to irradiate the optical element,

having a lateral extent in one plane in all axial directions, 360° about a center of said elevated portion, which is greater than five times the largest wavelength used to irradiate the optical element,

being continuously formed in three spatial directions,

having no edges, steps or jumps, and

presenting no second order surfaces.

13. The method of manufacturing as claimed in claim 12 , wherein said surface profile is formed with locally targeted material removal by demolding, injection molding, or injection embossing from a tool.

14. The method of manufacturing as claimed in claim 12 , wherein said calculating is carried out using an iterative Fourier transform algorithm.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2015
From: ECKSTEIN, HANS-CHRISTOPH; ZEITNER, UWE
To: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
Reel/Frame 036437/0407 →
Priority Claims (1)
DE 10 2013 003 441 · Feb 25, 2013 · national
Continuity (1)
Related Publication 20160047951A1 · Feb 18, 2016
Cited By (1)
US 12,724,177