Fabricating a cap layer for a magnetic random access memory (MRAM) device
A method for manufacturing a semiconductor device includes forming a magnetic tunnel junction (MTJ) structure comprising a magnetic fixed layer, a non-magnetic barrier layer and a magnetic free layer, and forming a metal oxide cap layer on the MTJ structure, wherein forming the metal oxide cap layer comprises depositing a metal layer on the magnetic free layer, performing an oxidation of the deposited metal layer to form an oxidized metal layer, and depositing a metal oxide layer on the oxidized metal layer.
1. A method for manufacturing a semiconductor device, comprising:
forming a magnetic tunnel junction (MTJ) structure comprising a magnetic fixed layer, a non-magnetic barrier layer and a magnetic free layer; and
forming a metal oxide cap layer on the MTJ structure;
wherein forming the metal oxide cap layer comprises:
depositing a single metal layer directly on the magnetic free layer;
wherein the single metal layer comprises one of lithium, beryllium, and sodium;
subsequent to depositing the single metal layer, performing an oxidation of the deposited single metal layer, wherein the entire single metal layer is converted into an oxidized metal layer comprising a single metal oxide;
wherein performing the oxidation of the deposited single metal layer comprises flowing oxygen over the deposited single metal layer without using a plasma oxidation process; and
depositing a metal oxide layer on the oxidized metal layer;
wherein depositing the metal oxide layer on the oxidized metal layer comprises performing a radio frequency sputtering of the metal oxide layer;
wherein the metal oxide layer comprises one of lithium oxide, beryllium oxide, and sodium oxide;
wherein performing the oxidation of the deposited metal layer further comprises performing a surfactant layer treatment with a noble gas comprising a predetermined concentration of the oxygen which converts the entire single metal layer into the oxidized metal layer; and
wherein the noble gas comprises at least one of xenon, krypton and a combination thereof.
2. The method according to claim 1 , wherein the single metal layer has a vertical thickness ranging from about 0.1 nm to about 1 nm.
3. The method according to claim 1 , wherein the predetermined concentration of the oxygen in the noble gas is about 0.1% to about 100%.
4. The method according to claim 1 , wherein the metal oxide layer has a vertical thickness ranging from about 0.3 nm to about 3 nm.
5. The method according to claim 1 , wherein the metal oxide cap layer comprises the oxidized metal layer, and the metal oxide cap layer has a vertical thickness ranging from about 0.2 nm to about 3 nm.
6. The method according to claim 1 , further comprising forming a contact layer on the metal oxide cap layer.
7. The method according to claim 6 , wherein the contact layer comprises at least one of tantalum, tantalum nitride, copper, ruthenium, titanium and titanium nitride.
8. The method according to claim 1 , wherein the flowing of the oxygen over the deposited single metal layer is performed at a temperature in the range of about 178K to about 290K or about 296K to about 478K.
9. The method according to claim 1 , wherein the magnetic free layer comprises at least one of PtMn, NiFe, IrMn, CoNi, CoIr, and CoPt.
10. The method according to claim 1 , wherein the magnetic free layer comprises multilayers having a stacked structure of Y on X, or X on Y, where X=one of nickel (Ni) and alloys thereof, and Y=one of platinum (Pt), iridium (Ir), and rhodium (Rh).
11. A method for manufacturing a semiconductor device, comprising:
forming a metal oxide cap layer on a magnetic free layer of a magnetic tunnel junction (MTJ) structure comprising a magnetic fixed layer, a non-magnetic barrier layer on the magnetic fixed layer and the magnetic free layer on the non-magnetic barrier layer;
wherein forming the metal oxide cap layer comprises:
depositing a single metal layer directly on the magnetic free layer;
wherein the single metal layer comprises one of lithium, beryllium, and sodium;
subsequent to depositing the single metal layer, performing an oxidation of the deposited single metal layer, wherein the entire single metal layer is converted into an oxidized metal layer comprising a single metal oxide;
wherein performing the oxidation of the deposited single metal layer comprises flowing oxygen over the deposited single metal layer without using a plasma oxidation process; and
depositing a metal oxide layer on the oxidized metal layer;
wherein depositing the metal oxide layer on the oxidized metal layer comprises performing a radio frequency sputtering of the metal oxide layer;
wherein the metal oxide layer comprises one of lithium oxide, beryllium oxide, and sodium oxide; and
wherein performing the oxidation of the deposited metal layer further comprises performing a surfactant layer treatment with a noble gas comprising a predetermined concentration of the oxygen which converts the entire single metal layer into the oxidized metal layer; and
wherein the noble gas comprises at least one of xenon, krypton and a combination thereof.
12. The method according to claim 11 , wherein the single metal layer has a vertical thickness ranging from about 0.1 nm to about 1 nm.
13. The method according to claim 11 , wherein the predetermined concentration of the oxygen in the noble gas is about 0.1% to about 100%.
14. The method according to claim 11 , wherein the metal oxide layer has a vertical thickness ranging from about 0.3 nm to about 3 nm.
15. The method according to claim 11 , wherein the flowing of the oxygen over the deposited single metal layer is performed at a temperature is in the range of about 178K to about 290K or about 296K to about 478K.
16. The method according to claim 11 , wherein the magnetic free layer comprises at least one of PtMn, NiFe, IrMn, CoNi, CoIr, and CoPt.