Negative electrode for power storage device, method for forming the same, and power storage device
An object is to suppress electrochemical decomposition of an electrolyte solution and the like at a negative electrode in a lithium ion battery or a lithium ion capacitor; thus, irreversible capacity is reduced, cycle performance is improved, or operating temperature range is extended. A negative electrode for a power storage device including a negative electrode current collector, a negative electrode active material layer which is over the negative electrode current collector and includes a plurality of particles of a negative electrode active material, and a film covering part of the negative electrode active material. The film has an insulating property and lithium ion conductivity.
1. A method for forming a negative electrode for a battery, comprising the steps of:
forming a dispersion solution by dispersing a particle of an active material in a solution including one of metal alkoxide and silicon alkoxide, a stabilizing agent, and a first solvent, wherein the active material comprises a carbon-based material, and a surface of the particle of the active material has a concave portion and a convex portion; and
partly forming an insulating film on the surface of the particle of the active material by performing a sol-gel method, so that the concave portion of the surface of the active material is covered by the insulating film.
2. The method according to claim 1 , further comprising the steps:
forming a slurry by mixing the active material having the insulating film with a second solvent; and
forming an active material layer on a current collector by applying the slurry on a surface of the current collector and drying the slurry.
3. The method according to claim 1 , wherein the carbon-based material is selected from graphite, graphitizing carbon, non-graphitizing carbon, a carbon nanotube, graphene, and carbon black.
4. The method according to claim 1 , wherein the insulating film comprises niobium oxide.
5. The method according to claim 1 , wherein the insulating film comprises silicon oxide.
6. The method according to claim 1 , wherein the insulating film has carrier ion conductivity.
7. The method according to claim 1 , wherein the insulating film has lithium ion conductivity.
8. The method according to claim 1 , wherein the insulating film has a thickness in a range of 5 nm to 50 nm.
9. A method for forming a negative electrode for a battery, comprising the steps of:
forming a solution including a stabilizing agent, a first solvent, and one of metal alkoxide and silicon alkoxide;
adding an active material to the solution, the active material comprising a carbon-based material, wherein a surface of a particle of the active material has a concave portion and a convex portion;
forming a gel attached on the surface of the particle of the active material by hydrolyzing and condensing the one of metal alkoxide and silicon alkoxide on the surface of the particle of the active material; and
partly forming an insulating film on at least the concave portion of the surface of the particle of the active material by performing heating treatment on the gel.
10. The method according to claim 9 , further comprising the steps:
forming a slurry by mixing the active material having the insulating film with a second solvent; and
forming an active material layer on a current collector by applying the slurry on a surface of the current collector and drying the slurry.
11. The method according to claim 9 , wherein the carbon-based material is selected from graphite, graphitizing carbon, non-graphitizing carbon, a carbon nanotube, graphene, and carbon black.
12. The method according to claim 9 , wherein the insulating film comprises niobium oxide.
13. The method according to claim 9 , wherein the insulating film comprises silicon oxide.
14. The method according to claim 9 , wherein the insulating film has carrier ion conductivity.
15. The method according to claim 9 , wherein the insulating film has lithium ion conductivity.
16. The method according to claim 9 , wherein the insulating film has a thickness in a range of 5 nm to 50 nm.