Semiconductor device structure and method for fabricating the same
A semiconductor device structure is provided. The semiconductor device includes a semiconductor substrate, a first device, and a second device. Each of the first and second devices includes a gate extending in a first direction, source/drain regions respectively formed on opposite first and second sides of the gate, dielectric spacers formed respectively on outer sidewalls of the gate on the first side and the second side, and conductive spacers serving contacts to the source/drain regions and formed respectively on outer sidewalls of the respective gate spacers. A second direction from the source/drain region on the first side to the source/drain region on the second side crosses the first direction.
1. A semiconductor device structure, comprising:
a semiconductor substrate;
a first device and a second device, each of the devices comprising:
a gate extending in a first direction;
source/drain regions respectively formed on opposite first and second sides of the gate, wherein a second direction from the source/drain region on the first side to the source/drain region on the second side crosses the first direction;
dielectric spacers formed respectively on outer sidewalls of the gate on the first side and the second side; and
conductive spacers serving contacts to the source/drain regions and formed respectively on outer sidewalls of respective gate spacers,
wherein the first device and the second device are disposed next to each other in the first direction, their respective gates align to each other and extend in a substantially straight line along the first direction, their respective dielectric spacers align to each other and extend in a substantially straight line along the first direction, and their respective conductive spacers align to each other and extend in a substantially straight line along the first direction,
wherein an end surface of the gate of the first device facing the second device and end surfaces of the conductive spacers of the first device facing the second device are substantially flush with each other, and
wherein the semiconductor device structure further comprises inter-device electrical isolation provided between the first device and the second device, and in the first direction, the gates of the first device and the second device are electrically isolated from one another by the inter-device electrical isolation.
2. The semiconductor structure of claim 1 , wherein an end surface of the gate of the second device facing the first device and end surfaces of the conductive spacers of the second device facing the first device are substantially flush with each other.
3. The semiconductor structure of claim 1 , wherein each of the dielectric spacers of the first device does not extend onto the end face of the gate of the first device facing the second device.
4. The semiconductor structure of claim 2 , wherein each of the dielectric spacers of the second device does not extend onto the end face of the gate of the second device facing the first device.
5. The semiconductor structure of claim 1 , wherein each of the dielectric spacers of the first and second devices is in a straight-line shape.
6. The semiconductor structure of claim 1 , wherein the dielectric spacers of the first device respectively on the first and second sides are physically disconnected from each other.
7. The semiconductor structure of claim 2 , wherein the dielectric spacers of the second device respectively on the first and second sides are physically disconnected from each other.
8. The semiconductor device structure of claim 1 , wherein the inter-device electrical isolation is located above a shallow trench isolation formed in the semiconductor substrate.
9. A semiconductor device structure, comprising:
a semiconductor substrate;
a first device and a second device, each of the devices comprising:
a gate having opposite first and second sidewalls and also opposite third and fourth sidewalls;
source/drain regions respectively formed on opposite sides of the gate;
dielectric spacers formed respectively on the first and second sidewalls of the gate;
conductive spacers serving contacts to the source/drain regions and formed respectively on sidewalls of the respective dielectric spacers facing away from the gate,
wherein the first device and the second device face each other with one of their respective third or fourth sidewalls,
wherein the dielectric spacer of the first device on the first sidewall thereof and the dielectric spacer of the second device on the first sidewall thereof extend only on a plane defined by the respective first sidewalls of the first and second devices, and the dielectric spacer of the first device on the second sidewall thereof and the dielectric spacer of the second device on the second sidewall thereof extend only on a plane defined by the respective second sidewalls of the first and second devices, and
wherein the semiconductor device structure further comprises inter-device electrical isolation between the first device and the second device, and in a first direction, the gates of the first device and the second device are electrically isolated from one another by the inter-device electrical isolation.
10. The semiconductor device structure according to claim 9 , wherein the inter-device electric isolation comprises a substantially uniform dielectric material formed between and contiguous to the facing third or fourth sidewalls of the first and second devices.