PVD plasma control using a magnet edge lift mechanism

1. A magnetron assembly for providing a magnetic field within a process chamber, comprising:

an inner rotating mechanism including a first plate having a central axis, wherein the first plate includes a first pair of two magnet tracks disposed proximate a center portion of the first plate, and a second single magnet track disposed about a peripheral edge of the first plate, wherein each of the first pair of two magnet tracks and the second single magnet track includes a plurality of magnets, and wherein the first plate is rotatable about the central axis; and

an outer lifting mechanism including a ring disposed proximate the first plate, the ring having a single magnet track including a second plurality of magnets coupled to a bottom surface of the ring proximate a peripheral edge of the ring, wherein the ring is movable in a direction perpendicular to the first plate, wherein a polarity of each magnet within each individual magnet track is the same, and wherein a polarity between the two magnet tracks in the first pair of two magnet tracks is opposite.

2. The magnetron assembly of claim 1 , wherein the ring is movable between a lowered position and a raised position.

3. The magnetron assembly of claim 2 , wherein the second plurality of magnets disposed on the ring align with the second single magnet track disposed on the first plate to form a second pair of two magnet tracks when the ring is in the lowered position, and wherein the second plurality of magnets do not align with the second single magnet track when the ring is in the raised position.

4. The magnetron assembly of claim 2 , wherein at least one of a shunt block or a shunt plate is coupled to the first plate proximate an outer edge of the first plate.

5. The magnetron assembly of claim 4 , wherein the second plurality of magnets align with the at least one of the shunt block or shunt plate when the ring is in the lowered position, and wherein the second plurality of magnets do not align with the at least one of the shunt block or shunt plate when the ring is in the raised position.

6. The magnetron assembly of claim 1 , wherein a shunt is coupled to the second single magnet track.

7. The magnetron assembly of claim 1 , wherein the outer lifting mechanism includes at least one lift shaft coupled to the ring, and an actuator coupled to each lift shaft.

8. The magnetron assembly of claim 7 , wherein the actuator is one of a motor or a sliding linear mechanism.

9. The magnetron assembly of claim 7 , wherein bellows disposed about each lift shaft to seal the lift shaft.

10. The magnetron assembly of claim 1 , wherein the first pair of two magnet tracks and the second single magnet track are coupled to a bottom surface of the first plate, and wherein the second plurality of magnets are couple to a bottom surface of the ring.

11. The magnetron assembly of claim 1 , wherein the first plate is concentric with the ring.

12. The magnetron assembly of claim 1 , further comprising:

a first shaft coupled to the first plate about the central axis of the first plate, wherein the first shaft is disposed through a central opening of the ring.

13. The magnetron assembly of claim 12 , wherein the first plate is configured to rotate about the first shaft to align the second single magnet track and the second plurality of magnets when the ring is in a lowered position.

14. A substrate processing system, comprising:

a process chamber having an inner volume and a substrate support disposed therein;

a target disposed in an upper portion of the inner volume opposing the substrate support; and

a magnetron assembly disposed proximate a back surface of the target on a side opposite the substrate support, the magnetron assembly comprising:

an inner rotating mechanism including a first plate having a central axis, wherein the first plate includes a first pair of two magnet tracks disposed proximate a center portion of the first plate, and a second single magnet track disposed about a peripheral edge of the first plate, wherein each of the first pair of two magnet tracks and the second single magnet track includes a plurality of magnets, and wherein the first plate is rotatable about the central axis; and

an outer lifting mechanism including a ring disposed proximate the first plate, the ring having a single magnet track including a second plurality of magnets coupled to the ring proximate a peripheral edge of the ring, wherein the ring is movable in a direction perpendicular to the first plate, wherein a polarity of each magnet within each individual magnet track is the same, and wherein a polarity between the two magnet tracks in the first pair of two magnet tracks is opposite.

15. The substrate processing system of claim 14 , wherein the ring is movable between a lowered position and a raised position.

16. The substrate processing system of claim 15 , wherein the second plurality of magnets disposed on the ring align with the second single magnet track disposed on the first plate to form a second pair of two magnet tracks when the ring is in the lowered position, and wherein the second plurality of magnets do not align with the second single magnet track when the ring is in the raised position.

17. The substrate processing system of claim 14 , wherein the outer lifting mechanism includes at least one lift shaft coupled to the ring, and an actuator coupled to each lift shaft.

18. The magnetron assembly of claim 1 , wherein a polarity of each magnet within the second plurality of magnets disposed on the ring is the same, and wherein a polarity of the second plurality of magnets disposed on the ring is opposite of a polarity of the second single magnet track disposed on the first plate.

19. The substrate processing system of claim 14 , wherein a polarity of each magnet within the second plurality of magnets disposed on the ring is the same, and wherein a polarity of the second plurality of magnets disposed on the ring is opposite of a polarity of the second single magnet track disposed on the first plate.