IP Library Granted Patent US 10,290,649
Granted Patent B2
US 10,290,649 · App. 15/843,691 · Granted May 14, 2019

Semiconductor device and method for manufacturing same

Inventor: Koichi Matsuno (Mie, JP)
Assignee: Toshiba Memory Corporation
H01L27/11582H01L21/7682H01L21/76816H01L21/76877H01L23/528H01L23/5226H01L23/5329H01L27/1157H01L27/11524H01L27/11556H01L2221/1063
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Quick Facts
Patent No.
US 10,290,649
App. No.
15/843,691
Granted
May 14, 2019
Kind
B2
Abstract

According to one embodiment, a semiconductor device includes a foundation layer, a stacked body provided above the foundation layer, a columnar portion, a hole, and a sealing film. The stacked body includes a plurality of conductive layers stacked with an air gap interposed. The columnar portion includes a semiconductor body. The semiconductor body extends in a stacking direction of the stacked body through the stacked body and contacts the foundation layer. The hole extends in the stacking direction through the stacked body and forms a cavity communicating with the air gap. The sealing film plugs an upper end of the hole forming the cavity.

Claims (40)

1. A semiconductor device, comprising:

a foundation layer;

a stacked body provided above the foundation layer, the stacked body including a plurality of conductive layers stacked with an air gap interposed;

a columnar portion including a semiconductor body, the semiconductor body extending in a stacking direction of the stacked body through the stacked body and contacting the foundation layer;

a hole extending in the stacking direction through the stacked body and forming a cavity communicating with the air gap;

a sealing film plugging an upper end of the hole forming the cavity; and

a first separation portion extending in a first direction and dividing the stacked body into a plurality of blocks in a second direction, the first direction crossing the stacking direction, the second direction crossing the first direction.

2. The device according to claim 1 , wherein a plurality of the holes is arranged in a first direction crossing the stacking direction.

3. The device according to claim 1 , wherein a plurality of the holes is arranged in the first direction between the first separation portion and the columnar portion.

4. The device according to claim 1 , further comprising a second separation portion extending in the first direction and dividing the conductive layer of at least an uppermost layer into a plurality of blocks in the second direction.

5. The device according to claim 4 , wherein a plurality of the holes is arranged in the first direction in a region overlapping the second separation portion.

6. The device according to claim 5 , wherein the second separation portion is a cavity communicating with the holes.

7. The device according to claim 1 , wherein a plurality of the columnar portions and a plurality of the holes are arranged periodically at a substantially uniform pitch.

8. The device according to claim 1 , wherein a region between the plurality of conductive layers adjacent to each other in the stacking direction includes

a region where an insulating layer is provided, and

a region where the air gap spreads at a periphery of the hole.

9. The device according to claim 1 , wherein a diameter of the hole is smaller than a diameter of the columnar portion.

10. The device according to claim 1 , wherein

the foundation layer includes a semiconductor region, and

the semiconductor body contacts the semiconductor region.

11. The device according to claim 10 , wherein a side surface of the semiconductor body contacts the semiconductor region.

12. A semiconductor device, comprising:

a foundation layer;

a stacked body provided above the foundation layer, the stacked body including a plurality of conductive layers stacked with an air gap interposed;

a columnar portion including a semiconductor body, the semiconductor body extending in a stacking direction of the stacked body through the stacked body and contacting the foundation layer;

a hole extending in the stacking direction through the stacked body and forming a cavity communicating with the air gap; and

a sealing film plugging an upper end of the hole forming the cavity, wherein

the stacked body includes an insulating layer provided between the foundation layer and the conductive layer of a lowermost layer, and

the foundation layer includes a protrusion piercing the insulating layer and being provided under the hole.

13. The device according to claim 12 , further comprising a first separation portion extending in a first direction and dividing the stacked body into a plurality of blocks in a second direction, the first direction crossing the stacking direction, the second direction crossing the first direction.

14. The device according to claim 13 , wherein a plurality of the holes is arranged in the first direction between the first separation portion and the columnar portion.

15. The device according to claim 13 , further comprising a second separation portion extending in the first direction and dividing the conductive layer of at least an uppermost layer into a plurality of blocks in the second direction.

16. The device according to claim 15 , wherein a plurality of the holes is arranged in the first direction in a region overlapping the second separation portion.

17. The device according to claim 16 , wherein the second separation portion is a cavity communicating with the holes.

18. The device according to claim 12 , wherein a plurality of the holes is arranged in a first direction crossing the stacking direction.

19. The device according to claim 12 , wherein a plurality of the columnar portions and a plurality of the holes are arranged periodically at a substantially uniform pitch.

20. The device according to claim 12 , wherein a region between the plurality of conductive layers adjacent to each other in the stacking direction includes

a region where an insulating layer is provided, and

a region where the air gap spreads at a periphery of the hole.

21. The device according to claim 12 , wherein a diameter of the hole is smaller than a diameter of the columnar portion.

Assignments (4)
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 15, 2017
From: MATSUNO, KOICHI
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 044408/0690 →
Priority Claims (1)
JP 2017-126467 · Jun 28, 2017 · national
Continuity (1)
Related Publication 20190006383A1 · Jan 3, 2019
Cited By (1)
US 12,349,348