Nanostructures fabricated by metal assisted chemical etching for antibacterial applications
The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.
1. A method of forming antimicrobial nanostructures on a surface of a consumer electronic device, the method comprising:
forming a master template comprising a silicon substrate having spike nanostructures by contacting a silicon substrate with a silver salt and an acid comprising hydrofluoric acid at a temperature of about 20° C. to about 30° C. for a time greater than 3 minutes to less than 10 minutes to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate, wherein the silicon substrate comprises a monocrystalline silicon;
the spikes having a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to about 1 micrometer, and a density of about 10 to 100 per square microns, wherein the concentration of the silver salt is about 5 mM to 9 mM and the concentration of the acid is about 1 M to about 15 M;
contacting a liquid material with the master template, wherein the liquid material comprises a thermoplastic polymer;
curing the liquid material to form a patterned template, wherein the curing comprises radiation curing;
contacting the patterned template with a polymeric material to form a polymer film having antimicrobial nanostructures on a surface of the polymer film; and
applying the polymer film as a coating to the surface of the consumer electronic device;
wherein the antimicrobial structures on the surface of the polymer film comprise a plurality of spikes that are the same as the spikes on the silicon substrate; and
wherein the antimicrobial structures on the surface of the polymer film eliminate microorganisms or inhibit the growth of microorganisms.
2. The method of claim 1 , wherein the polymeric material comprises polyacetals, polyolefins, polyacrylics, polyacrylates, polycarbonates, polystyrenes, polyesters, polyamides, polyamideimides, polyarylates, polyarylsulfones, polyethersulfones, polyphenylene sulfides, polyvinyl chlorides, polysulfones, polyimides, polyetherimides, polytetrafluoroethylenes, polyetherketones, polyether etherketones, polyether ketone ketones, polybenzoxazoles, polyphthalides, polyanhydrides, polyvinyl ethers, polyvinyl thioethers, polyvinyl alcohols, polyvinyl ketones, polyvinyl halides, polyvinyl nitriles, polyvinyl esters, polysulfonates, polysulfides, polythioesters, polysulfonamides, polyureas, polyphosphazenes, polysilazanes, polyethylene terephthalate, polybutylene terephthalate, polyurethane, ethylene propylene diene rubber, polytetrafluoroethylene, fluorinated ethylene propylene, perfluoroalkoxyethylene, polychlorotrifluoroethylene, polyvinylidene fluoride, or the like, or a combination thereof.
3. The method of claim 1 , wherein the silver salt comprises silver nitrate.
4. The method of claim 1 , wherein the microorganisms comprise bacteria, fungi, algae, yeast, mold, or a combination thereof.
5. The method of claim 1 , wherein the second end of the spikes is effective to penetrate a cell wall of the microorganisms.
6. The method of claim 1 , wherein the microorganisms comprise bacteria Bacillus , bacteria E. Coli , or a combination thereof.
7. The method of claim 1 , wherein an average spacing between second ends of adjacent spikes is about 50 nanometers to about 1 micron.
8. The method of claim 1 , wherein the spikes have tapered thickness.
9. The method of claim 1 , wherein the spikes has a thickness variation of less than about 10%.
10. The method of claim 1 , wherein the consumer electronic device comprises a keyboard, smartphone, laptop, or camera.
11. A method of forming antimicrobial nanostructures, the method comprising:
forming a master template comprising a silicon substrate having spike nanostructures by contacting a silicon substrate with a silver salt and an acid comprising hydrofluoric acid at a temperature of about 20° C. to about 30° C. for a time greater than 3 minutes to less than 10 minutes to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate, wherein the silicon substrate comprises a monocrystalline silicon;
the spikes having a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to about 1 micrometer, and a density of about 10 to 100 per square microns, wherein the concentration of the silver salt is about 5 mM to 9 mM and the concentration of the acid is about 1 M to about 15 M;
contacting a liquid material with the master template, wherein the liquid material comprises a thermoplastic polymer;
curing the liquid material to form a patterned template, wherein the curing comprises radiation curing;
contacting the patterned template with a polymeric material to form a polymer film having antimicrobial nanostructures on a surface of the polymer film; and
applying the polymer film as a coating to the surface of a seat, door knob, handle, shelve, toilet seat, tray, or arm rest;
wherein the antimicrobial structures on the surface of the polymer film comprise a plurality of spikes that are the same as the spikes on the silicon substrate; and
wherein the antimicrobial structures on the surface of the polymer film eliminate microorganisms or inhibit the growth of microorganisms.