IP Library Granted Patent US 10,329,312
Granted Patent B2
US 10,329,312 · App. 15/092,953 · Granted Jun 25, 2019

Lanthanum compound, method of synthesizing lanthanum compound, lanthanum precursor composition, method of forming thin film, and method of manufacturing integrated circuit device

Inventors: Gyu-hee Park (Hwaseong-si, KR); Youn-soo Kim (Yongin-si, KR); Jae-soon Lim (Seoul, KR); Youn-joung Cho (Hwaseong-si, KR); Haruyoshi Sato (Tokyo, JP); Naoki Yamada (Tokyo, JP); Hiroyuki Uchiuzou (Tokyo, JP)
Assignees: Samsung Electronics Co., Ltd.; Adeka Corporation
C07F7/10
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Quick Facts
Patent No.
US 10,329,312
App. No.
15/092,953
Granted
Jun 25, 2019
Kind
B2
Abstract

A silicon-containing intermediate is synthesized by reacting a lanthanum tris[bis(trialkylsilyl)amide] complex with an alkylcyclopentadiene. A lanthanum compound is synthesized by reacting the silicon-containing intermediate with a dialkylamidine-based compound.

Claims (27)

1. A compound of the following Chemical Formula 1:

wherein R 1 is a C1-C4 linear or branched alkyl group, and each R X is independently a C1-C2 alkyl group.

2. The compound as claimed in claim 1 , wherein the compound is pure.

3. A method of forming the compound as claimed in claim 1 , the method comprising:

reacting a lanthanum tris(alkylsilylamide) complex with an alkylcyclopentadiene, wherein:

in the lanthanum tris(alkylsilylamide) complex, the alkyl groups are each independently a C1-C2 alkyl group, and

in the alkylcyclopentadiene, the alkyl group is a C1-C4 linear or branched alkyl group.

4. The method as claimed in claim 3 , further comprising purifying the resultant of the reaction of the lanthanum tris(alkylsilylamide) complex with the alkylcyclopentadiene.

5. The method as claimed in claim 4 , wherein the purifying includes sublimation of the compound represented by Chemical Formula 1.

6. A method of manufacturing an integrated circuit (IC) device using the compound as claimed in claim 1 , the method comprising:

forming a lower structure on a substrate; and

forming a lanthanum-containing film on the lower structure, the lanthanum-containing film being produced by deposition of lanthanum-containing species from a composition that includes the compound represented by Chemical Formula 1 and a compound represented by the following Chemical Formula 2:

wherein, in Chemical Formula 2, R 1 is a C1-C4 linear or branched alkyl group, each of R 2 and R 3 is independently a C1-C4 linear or branched alkyl group, and R 4 is hydrogen or a methyl group.

7. A synthesis method, the method comprising:

synthesizing a silicon-containing intermediate of Chemical Formula 1 by reacting a lanthanum tris[bis(trialkylsilyl)amide] complex with an alkylcyclopentadiene,

wherein R 1 is a C1-C4 linear or branched alkyl group, and each R X is independently a C1-C2 alkyl group; and

synthesizing a lanthanum compound of Chemical Formula 2 by reacting the silicon-containing intermediate of Chemical Formula 1 with a dialkylamidine-based compound,

wherein R 1 is a C1-C4 linear or branched alkyl group, each of R 2 and R 3 is independently a C1-C4 linear or branched alkyl group, and R 4 is hydrogen atom or a methyl group.

8. The method as claimed in claim 7 , wherein in the silicon-containing intermediate of Chemical Formula 1, R X is a methyl group.

9. The method as claimed in claim 7 , wherein the lanthanum compound of Chemical Formula 2 is a liquid at room temperature.

10. The method as claimed in claim 7 , wherein the dialkylamidine-based compound is formed from diisopropyl acetamidine.

11. The method as claimed in claim 7 , wherein in the lanthanum compound of Chemical Formula 2, R 1 is an ethyl group, each of R 2 and R 3 is an isopropyl group, and R 4 is a methyl group.

12. The method as claimed in claim 7 , wherein in the lanthanum compound of Chemical Formula 2, each of R 1 , R 2 , and R 3 is an isopropyl group, and R 4 is a methyl group.

13. The method as claimed in claim 7 , wherein in the lanthanum compound of Chemical Formula 2, R 1 is an isopropyl group, each of R 2 and R 3 is a t-butyl group, and R 4 is a methyl group.

14. The method as claimed in claim 7 , further comprising, before the synthesizing of the silicon-containing intermediate, synthesizing the lanthanum tris[bis(trialkylsilyl)amide] complex by reacting a lanthanum halide with a bis(trialkylsilyl)amide alkali metal salt.

15. The method as claimed in claim 14 , wherein the lanthanum halide is LaCl 3 .

16. The method as claimed in claim 14 , wherein the bis(trialkylsilyl)amide alkali metal salt includes sodium (Na), lithium (Li), or potassium (K).

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE 2ND ASSIGNEE:PLEASE CORRECT THE SPELLING OF THE ASSIGNEE TO READ:ADEKA CORPORATION PREVIOUSLY RECORDED ON REEL 038218 FRAME 0984. ASSIGNOR(S) HEREBY CONFIRMS THE GYU-HEE PARK ET AL.TO:SAMSUNG ELECTRONICS CO., LTD.ANDADEKA CORPORATION. Recorded Mar 4, 2019
From: PARK, GYU-HEE; KIM, YOUN-SOO; LIM, JAE-SOON; CHO, YOUN-JOUNG; YAMADA, NAOKI; UCHIUZOU, HIROYUKI
To: SAMSUNG ELECTRONICS CO., LTD.; ADEKA CORPORATION
Reel/Frame 050095/0472 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 7, 2016
From: PARK, GYU-HEE; KIM, YOUN-SOO; LIM, JAE-SOON; CHO, YOUN-JOUNG; SATO, HARUYOSHI; YAMADA, NAOKI; UCHIUZOU, HIROYUKI
To: SAMSUNG ELECTRONICS CO., LTD.; ADEDA CORPORATION
Reel/Frame 038218/0984 →
Priority Claims (1)
KR 10-2015-0096785 · Jul 7, 2015 · national
Continuity (1)
Related Publication 20170008914A1 · Jan 12, 2017