Optical element and method for producing the same

1. An optical element, comprising:

a lens base; and

an antireflection film arranged on a surface of the lens base,

wherein the antireflection film includes:

a multilayer film arranged on the surface of the lens base, the multilayer film including:

one or more layers each formed of a silicon oxide film, and

one or more layers each formed of a tantalum oxide film, the one or more layers each formed of the silicon oxide film and the one or more layers each formed of the tantalum oxide film being alternately stacked;

an inner layer arranged on a surface of the multilayer film, the inner layer being formed of a magnesium fluoride film; and

an outer layer arranged on a surface of the inner layer, the outer layer being formed of a silicon oxide film.

2. The optical element according to claim 1 ,

wherein the antireflection film has a reflectance that meets 1.5%≥R550≥R650≥R850,and R850≤1% in a central area of the lens base, where R550 represents a reflectance of the antireflection film at a wavelength of 550 nm, R650 represents a reflectance of the antireflection film at a wavelength of 650 nm, and R850 represents a reflectance of the antireflection film at a wavelength of 850 nm.

3. The optical element according to claim 1 ,

wherein the multilayer film includes four layers in which the layers each formed of the silicon oxide film and the layers each formed of the tantalum oxide film are alternately stacked in this order on the surface of the lens base,

the antireflection film includes six layers including the multilayer film, the inner layer, and the outer layer,

the six layers have respective refractive indices of n1, n2, n3, n4, n5, and n6 and physical thicknesses of d1, d2, d3, d4, d5, and d6, in this order from the layer on the surface of the lens base, and

the antireflection film meets the following requirements:

1.45≤n1≤1.50 and 0.25λ0≤n1×d1≤0.48×λ0,

2.00≤n2≤2.30 and 0.02λ0≤n2×d2≤0.05×λ0,

1.45≤n3≤1.50 and 0.06λ0≤n3×d3≤0.13×λ0,

2.00≤n4≤2.30 and 0.32λ0≤n4×d4≤0.60×λ0,

1.38≤n5≤1.41 and 0.09λ0≤n5×d5≤0.17×λ0, and

1.45≤n6≤1.50 and 0.05λ0≤n6×d6≤0.11×λ0, where λ0 represents a design reference wavelength.

4. The optical element according to claim 1 ,

wherein the lens base is composed of a resin having a refractive index of 1.48 or more and 1.55 or less.

5. The optical element according to claim 4 ,

wherein the lens base is composed of a cycloolefin polymer resin or a PMMA resin.

6. The optical element according to claim 1 ,

wherein the multilayer film includes six layers in which the layers each formed of the silicon oxide film and the layers each formed of the tantalum oxide film are alternately stacked in this order on the surface of the lens base, and

the antireflection film includes eight layers including the multilayer film, the inner layer, and the outer layer.

7. The optical element according to claim 3 ,

wherein the layers have respective refractive indices of n1, n2, n3, n4, n5, n6, n7, and n8 and physical thicknesses of d1, d2, d3, d4, d5, d6, d7, and d8, in this order from the layer on the surface of the lens base, and

wherein the antireflection film meets the following requirements:

1.45≤n1≤1.50 and 0.44λ0≤n1×d1≤0.67×λ0,

2.00≤n2≤2.30 and 0.05λ0≤n2×d2≤0.09×λ0,

1.45≤n3≤1.50 and 0.09λ0≤n3×d3≤0.14×λ0,

2.00≤n4≤2.30 and 0.16λ0≤n4×d4≤0.25×λ0,

1.45≤n5≤1.50 and 0.05λ0≤n5×d5≤0.09×λ0,

2.00≤n6≤2.30 and 0.11λ0≤n6×d6≤0.17×λ0,

1.38≤n7≤1.41 and 0.17λ0≤n7×d7≤0.27×λ0, and

1.45≤n8≤1.50 and 0.04λ0≤n8×d8≤0.07×λ0, where λ0 represents a design reference wavelength.

8. The optical element according to claim 6 ,

wherein the layers have respective refractive indices of n1, n2, n3, n4, n5, n6, n7, and n8 and physical thicknesses of d1, d2, d3, d4, d5, d6, d7, and d8, in this order from the layer on the surface of the lens base, and

wherein the antireflection film meets the following requirements:

1.45≤n1≤1.50 and 0.33λ0≤n1×d1≤0.62×λ0,

2.00≤n2≤2.30 and 0.04λ0≤n2×d2≤0.08×λ0,

1.45≤n3≤1.50 and 0.06λ0≤n3×d3≤0.12×λ0,

2.00≤n4≤2.30 and 0.19λ0≤n4×d4≤0.36×λ0,

1.45≤n5≤1.50 and 0.01λ0≤n5×d5≤0.04×λ0,

2.00≤n6≤2.30 and 0.10λ0≤n6×d6≤0.19×λ0,

1.38≤n7≤1.41 and 0.10λ0≤n7×d7≤0.21×λ0, and

1.45≤n8≤1.50 and 0.05λ0≤n8×d8≤0.10×λ0, where λ0 represents a design reference wavelength.

9. The optical element according to claim 6 ,

wherein the layers have respective refractive indices of n1, n2, n3, n4, n5, n6, n7, and n8 and physical thicknesses of d1, d2, d3, d4, d5, d6, d7, and d8, in this order from the layer on the surface of the lens base, and

wherein the antireflection film meets the following requirements:

1.45≤n1≤1.50 and 0.39×λ0≤n1×d1≤0.72×λ0,

2.00≤n2≤2.30 and 0.05×λ0≤n2×d2≤0.09×λ0,

1.45≤n3≤1.50 and 0.07×λ0≤n3×d3≤0.13×λ0,

2.00≤n4≤2.30 and 0.16×λ0≤n4×d4≤0.30×λ0,

1.45≤n5≤1.50 and 0.05×λ0≤n5×d5≤0.09×λ0,

2.00≤n6≤2.30 and 0.10×λ0≤n6×d6≤0.19×λ0,

1.38≤n7≤1.41 and 0.12×λ0≤n7×d7≤0.22×λ0, and

1.45≤n8≤1.50 and 0.07×λ0≤n8×d8≤0.14×λ0, where λ0 represents a design reference wavelength.

10. The optical element according to claim 9 ,

wherein the antireflection film meets the following requirements:

0.50×λ≤n1×d1≤0.61×λ0,

0.06×λ≤n2×d2≤0.08×λ0,

0.09×λ≤n3×d3≤0.11×λ0,

0.21×λ≤n4×d4≤0.25×λ0,

0.06×λ≤n5×d5≤0.07×λ0,

0.13×λ≤n6×d6≤0.16×λ0,

0.15×λ≤n7×d7≤0.19×λ0, and

0.10×λ≤n8×d8≤0.12×λ0.

11. The optical element according to claim 1 ,

wherein the multilayer film includes eight layers in which the layers each formed of the silicon oxide film and the layers each formed of the tantalum oxide film are alternately stacked in this order on the surface of the lens base, and

the antireflection film includes ten layers including the multilayer film, the inner layer, and the outer layer.

12. The optical element according to claim 11 ,

wherein the layers have respective refractive indices of n1, n2, n3, n4, n5, n6, n7, n8, n9, and n10 and physical thicknesses of d1, d2, d3, d4, d5, d6, d7, d8, d9, and d10, in this order from the layer on the surface of the lens base, and

wherein the antireflection film meets the following requirements:

1.45≤n1≤1.50 and 0.40λ0≤n1×d1≤0.61×λ0,

2.00≤n2≤2.30 and 0.03λ0≤n2×d2≤0.05×λ0,

1.45≤n3≤1.50 and 0.07λ0≤n3×d3≤0.12×λ0,

2.00≤n4≤2.30 and 0.07λ0≤n4×d4≤0.12×λ0,

1.45≤n5≤1.50 and 0.03λ0≤n5×d5≤0.06×λ0,

2.00≤n6≤2.30 and 0.17λ0≤n6×d6≤0.27×λ0,

1.45≤n7≤1.50 and 0.04λ0≤n7×d7≤0.07×λ0,

2.00≤n8≤2.30 and 0.09λ0≤n8×d8≤0.15×λ0,

1.38≤n9≤1.41 and 0.15λ0≤n9×d9≤0.24×λ0, and

1.45≤n10≤1.50 and 0.05λ0≤n10×d10≤0.08×λ0, where λ0 represents a design reference wavelength.

13. The optical element according to claim 11 ,

wherein the layers have respective refractive indices of n1, n2, n3, n4, n5, n6, n7, n8, n9, and n10 and physical thicknesses of d1, d2, d3, d4, d5, d6, d7, d8, d9, and d10, in this order from the layer on the surface of the lens base, and

wherein the antireflection film meets the following requirements:

1.45≤n1≤1.50 and 0.37×λ0≤n1×d1≤0.69×λ0,

2.00≤n2≤2.30 and 0.03×λ0≤n2×d2≤0.06×λ0,

1.45≤n3≤1.50 and 0.06×λ0≤n3×d3≤0.12×λ0,

2.00≤n4≤2.30 and 0.06×λ0≤n4×d4≤0.12×λ0,

1.45≤n5≤1.50 and 0.03×λ0≤n5×d5≤0.06×λ0,

2.00≤n6≤2.30 and 0.13×λ0≤n6×d6≤0.25×λ0,

1.45≤n7≤1.50 and 0.04×λ0≤n7×d7≤0.08×λ0,

2.00≤n8≤2.30 and 0.09×λ0≤n8×d8≤0.16×λ0,

1.38≤n9≤1.41 and 0.14×λ0≤n9×d9≤0.26×λ0, and

1.45≤n10≤1.50 and 0.04×λ0≤n10×d10≤0.08×λ0, where λ0 represents a design reference wavelength.

14. The optical element according to claim 13 ,

wherein the antireflection film meets the following requirements:

0.47×λ0≤n1×d1≤0.58×λ0,

0.04×λ0≤n2×d2≤0.05×λ0,

0.08×λ0≤n3×d3≤0.10×λ0,

0.08×λ0≤n4×d4≤0.10×λ0,

0.04×λ0≤n5×d5≤0.05×λ0,

0.17×λ0≤n6×d6≤0.21×λ0,

0.06×λ0≤n7×d7≤0.07×λ0,

0.11×λ0≤n8×d8≤0.14×λ0,

0.18×λ0≤n9×d9≤0.22×λ0, and

0.06×λ0≤n10×d10≤0.70×λ0.

15. A method for producing an optical element including an antireflection film on a lens base, the method comprising:

a multilayer film formation step of forming a multilayer film on a surface of the lens base, the multilayer film including:

a layer formed of a silicon oxide film, and

a layer formed of a tantalum oxide film, the layer formed of the silicon oxide film and the layer formed of the tantalum oxide film being alternately stacked;

an inner layer formation step of forming an inner layer on a surface of the multilayer film, the inner layer being formed of a magnesium fluoride film; and

an outer layer formation step of forming an outer layer on a surface of the inner layer, the outer layer being formed of a silicon oxide film.

16. The method according to claim 15 ,

wherein the multilayer film formation step, the inner layer formation step, and the outer layer formation step are performed by an ion-assisted deposition process.