Double-gate vertical transistor semiconductor device
View Patent ↗A semiconductor device is disclosed that includes a substrate and at least a first, second, third, and fourth vertical transistor supported by the substrate. Each transistor comprises a vertical channel, a polarity gate electrode forming a polarity gate adapted to act on a first portion of the channel to affect a polarity of the channel, and a control gate electrode forming a control gate adapted to act on a second portion of the channel to control the electrical conductivity of the channel. The polarity gate electrode and the control gate electrode of each one of the transistors extend laterally from their respective gate and in mutually opposite directions, and the transistors are laterally spaced from each other and arranged such that the control gate electrodes of the first and third transistor face each other and the control gate electrodes of the second and fourth transistor face each other.
1. A semiconductor device comprising:
a substrate; and
at least a first, a second, a third, and a fourth vertical transistor supported by the substrate;
wherein each one of the vertical transistors comprises:
a vertical channel having a length axis perpendicular to a main plane of extension of the substrate;
a polarity gate electrode forming a polarity gate adapted to act on a first portion of the vertical channel to affect a polarity of the vertical channel; and
a control gate electrode forming a control gate adapted to act on a second portion of the vertical channel to control an electrical conductivity of the vertical channel;
wherein the polarity gate electrode and the control gate electrode of each one of the vertical transistors extend laterally from their respective gate and in mutually opposite directions; and
wherein the vertical channels are laterally spaced from each other and arranged such that the control gate electrodes of the first and third vertical transistors face each other and the control gate electrodes of the second and fourth vertical transistors face each other.
2. The semiconductor device according to claim 1 , wherein each one of the vertical transistors is arranged in a respective corner of a quadrangle outline.
3. The semiconductor device according to claim 1 , wherein the control gate electrodes of the first and third vertical transistors are connected to each other and to a common first gate contact, and wherein the control gate electrodes of the second and fourth vertical transistors are connected to each other and to a common second gate contact.
4. The semiconductor device according to claim 1 , wherein each one of the vertical transistors comprises a top electrode connected to an upper portion of the vertical channel and a bottom electrode connected to a lower portion of the vertical channel, and wherein the top electrode and the bottom electrode extend laterally away from the vertical channel in mutually opposite directions perpendicular to an extension of the polarity gate electrode or control gate electrode.
5. The semiconductor device according to claim 4 , wherein each one of the vertical transistors is arranged such that the bottom electrodes of the first and second vertical transistors face each other and the bottom electrodes of the third and fourth vertical transistors face each other.
6. The semiconductor device according to claim 5 , wherein the bottom electrodes of the vertical transistors are connected to each other and to a common electrode contact.
7. The semiconductor device according to claim 1 , wherein the vertical channel of at least one of the vertical transistors is formed of at least one nanowire.
8. The semiconductor device according to claim 7 , wherein the vertical channel comprises a plurality of nanowires.
9. The semiconductor device according to claim 1 , wherein the vertical channel is formed of a vertical nano-sheet.
10. The semiconductor device according to claim 1 , wherein the polarity gate electrode is adapted to act on a first portion the vertical channel close to a source of the vertical transistor and to a second portion close a drain of the vertical transistor, and wherein the control gate electrode is adapted to act on the channel at a portion therebetween.
11. The semiconductor device according to claim 1 , wherein the vertical transistors are interconnected to form an XOR gate.
12. The semiconductor device according to claim 1 , wherein the vertical transistors are interconnected to form a majority gate.
13. The semiconductor device according to claim 1 , wherein each one of the vertical transistors is a gate-all around transistor.
14. The semiconductor device according to claim 1 , wherein each one of the vertical transistors is a field-effect transistor.
15. A semiconductor device, comprising:
a substrate; and
at least a first, a second, a third, and a fourth vertical transistor supported by the substrate;
wherein each one of the vertical transistors comprises:
a vertical channel;
a polarity gate electrode forming a polarity gate adapted to act on a first portion of the vertical channel to affect a polarity of the vertical channel; and
a control gate electrode forming a control gate adapted to act on a second portion of the vertical channel to control an electrical conductivity of the vertical channel;
wherein the polarity gate electrode and the control gate electrode of each one of the vertical transistors extend laterally from their respective gate and in mutually opposite directions; and
wherein the vertical channels are laterally spaced from each other and arranged such that the control gate electrodes of the first and third vertical transistors face each other and the control gate electrodes of the second and fourth vertical transistors face each other.
16. The semiconductor device according to claim 15 , wherein the control gate electrodes of the first and third vertical transistors are connected to each other and to a common first gate contact, and wherein the control gate electrodes of the second and fourth vertical transistors are connected to each other and to a common second gate contact.
17. The semiconductor device according to claim 15 , wherein the vertical channel of at least one of the vertical transistors comprises at least one nanowire.
18. The semiconductor device according to claim 15 , wherein each one of the vertical transistors is arranged in a respective corner of a quadrangle outline.
19. The semiconductor device according to claim 15 , wherein each one of the vertical transistors comprises a top electrode connected to an upper portion of the vertical channel and a bottom electrode connected to a lower portion of the vertical channel, and wherein the top electrode and the bottom electrode extend laterally away from the vertical channel in mutually opposite directions perpendicular to an extension of the polarity gate electrode or control gate electrode.
20. The semiconductor device according to claim 15 , wherein the vertical channel of at least one of the vertical transistors is formed of a vertical nano-sheet.