Scatterometry overlay based on reflection peak locations
Metrology methods and modules are provided, which comprise measuring intensity spatial distributions and peaks of spots at the pupil plane of a metrology system that correspond to various diffraction orders scattered from target cells and calculating overlay(s) of the target cell(s) from the measured intensity spatial distributions and peaks. For example, intensity peak or distribution of zeroth diffraction orders from four cells, first diffraction orders from two cells as well as diffraction orders from a single cell may be used to derive an overlay estimation, which may also be compared to standard overlay measurements for different purposes. Intensity spatial distributions may also be used to derive weight function for adjusting measurements or the metrology system.
1. A method comprising:
measuring, with a metrology tool, at a pupil plane of an optical system of the metrology tool a reflection signal from a plurality of zeroth-order spots corresponding with a plurality of zeroth order intensity peaks scattered from a plurality of target cells;
fitting, with one or more processors communicatively coupled to the optical system of the metrology tool, a function to approximate a spatial distribution of an intensity across the plurality of zeroth-order spots measured at the pupil plane;
determining, with the one or more processors communicatively coupled to the optical system of the metrology tool, a plurality of intensity peak positions of the function;
calculating a weight function based on the approximated spatial distribution of the intensity across the plurality of zeroth-order spots measured at the pupil plane; and
calibrating the metrology tool based on the calculated weight function; and
calculating, with the one or more processors communicatively coupled to the optical system of the metrology tool, an overlay of a target based on a portion of one or more measurements of the reflection signal from the plurality of zeroth-order spots corresponding with the plurality of spots.
2. The method of claim 1 , wherein:
the measuring further comprises measuring intensity peaks of ±first order spots corresponding to two target cells; and
the calculating of the overlay of the target is carried out with respect to the measured intensity peaks of the ±first order spots corresponding to the two target cells.
3. The method of claim 1 , further comprising comparing the calculated overlay with a standard overlay measurement to evaluate a given metrology recipe.
4. The method of claim 1 , further comprising comparing the calculated overlay with a standard overlay measurement to calibrate the pupil by optimizing a matching between the calculated overlay and the standard overlay measurement.
5. The method of claim 1 , further comprising comparing the calculated overlay with a standard overlay measurement to provide an indication of exceptional targets or measurement conditions.
6. The method of claim 1 , wherein the metrology tool comprises an angled resolved scatterometry overlay metrology tool.
7. The method of claim 1 , wherein the plurality of target cells comprises four target cells.
8. An overlay metrology system comprising:
an optical system configured to measure at a pupil plane of the overlay metrology system a reflection signal from a plurality of zeroth-order spots corresponding with a plurality of zeroth order intensity peaks scattered from a plurality of target cells; and
one or more processors communicatively coupled to the optical system and configured to:
fit a function to approximate a spatial distribution of an intensity across the plurality of zeroth-order spots measured at the pupil plane;
determine a plurality of intensity peak positions of the function;
calculate a weight function based on the approximated spatial distribution of the intensity across the plurality of zeroth-order spots measured at the pupil plane;
calibrate the metrology system based on the calculated weight function; and
calculate an overlay of a target based on a portion of one or more measurements of the reflection signal from the plurality of zeroth-order spots corresponding with the plurality of zeroth order intensity peaks.
9. The system of claim 8 , wherein the one or more processors are further configured to compare the calculated overlay with a standard overlay measurement to evaluate a given metrology recipe.
10. The system of claim 8 , wherein the one or more processors are further configured to compare the calculated overlay with a standard overlay measurement to calibrate the pupil by optimizing a matching between the calculated overlay and the standard overlay measurement.
11. The system of claim 8 , wherein the one or more processors are further configured to compare the calculated overlay with a standard overlay measurement to provide an indication of exceptional targets or measurement conditions.
12. The system of claim 8 , wherein the overlay metrology system comprises an angled resolved scatterometry overlay system.
13. The system of claim 8 , wherein the plurality of target cells comprises four target cells.