Methods for forming a semiconductor device using tilted reactive ion beam
A semiconductor device and method is disclosed. In one example, the method for forming a semiconductor device includes forming a trench extending from a front side surface of a semiconductor substrate into the semiconductor substrate. The method includes forming of material to be structured inside the trench. Material to be structured is irradiated with a tilted reactive ion beam at a non-orthogonal angle with respect to the front side surface such that an undesired portion of the material to be structured is removed due to the irradiation with the tilted reactive ion beam while an irradiation of another portion of the material to be structured is masked by an edge of the trench.
1. A method for forming a semiconductor device, the method comprising:
forming a trench extending from a front side surface of a semiconductor substrate into the semiconductor substrate;
forming of a first insulating layer inside the trench;
irradiating the first insulating layer with a tilted reactive ion beam at a non-orthogonal angle with respect to the front side surface such that an undesired portion of the first insulating layer is removed due to the irradiation with the tilted reactive ion beam while an irradiation of another portion of the first insulating layer is masked by an edge of the trench; and
forming a second insulating layer inside the trench after the irradiation of the first insulating layer to form a combined insulating layer with vertically varying thickness.
2. The method of claim 1 , wherein semiconductor material from a side wall of the trench is converted to form at least a part of the second insulating layer during the forming of the second insulating layer, the method further comprising, after the forming of the second insulating layer, removing the combined insulating layer from the trench to form a trench with a vertically varying width.
3. The method of claim 1 , further comprising, after the forming of the second insulating layer, incorporating dopants into the semiconductor substrate through the combined insulating layer to form a doping region with a doping concentration varying vertically along the trench.
4. The method of claim 1 , further comprising depositing electrically conductive material inside the trench to form a gate electrode of a vertical transistor structure within the trench after the irradiation of the first insulating layer.
5. The method of claim 1 , wherein the tilted reactive ion beam is a ribbon beam.
6. The method of claim 5 , wherein the ribbon beam has a length at the front side surface of the semiconductor substrate larger than a lateral dimension of the semiconductor substrate.
7. The method of claim 1 , wherein the edge of the trench is beveled, chamfered or rounded due to the irradiation of the first insulating layer with the tilted reactive ion beam.
8. The method of claim 1 , wherein the non-orthogonal angle is less than 80°.
9. The method of claim 1 , further comprising, after the irradiation of the first insulating layer, irradiating a material to be structured with the tilted reactive ion beam at a second non-orthogonal angle with respect to the front side surface such that an undesired portion of the material to be structured is removed due to the irradiating with the tilted reactive ion beam while an irradiation of another portion of the material to be structured is masked by the edge of the trench.