Display device, manufacturing method of display device, and electronic device
A display device in which a peripheral circuit portion has high operation stability is provided. The display device includes a first substrate and a second substrate. A first insulating layer is provided over a first surface of the first substrate. A second insulating layer is provided over a first surface of the second substrate. The first surface of the first substrate and the first surface of the second substrate face each other. An adhesive layer is provided between the first insulating layer and the second insulating layer. A protective film in contact with the first substrate, the first insulating layer, the adhesive layer, the second insulating layer, and the second substrate is formed in the vicinity of a peripheral portion of the first substrate and the second substrate.
1. A method for manufacturing a display device, comprising the steps of:
over a first surface of a first substrate, forming a transistor, a capacitor, a pixel electrode and a first insulating layer;
over a first surface of a second substrate, forming a light-blocking layer, a coloring layer, an insulating layer, a spacer and a second insulating layer;
bonding the first substrate and the second substrate with an adhesive layer to seal the transistor, the capacitor and a display element;
forming a groove portion by performing a first cutting treatment on the second substrate;
forming a protective film in the vicinity of a peripheral portion of the groove portion, the first substrate and the second substrate, the protective film in contact with the first substrate, the first insulating layer, the adhesive layer, the second insulating layer and the second substrate; and
fabricating a plurality of display devices by performing a second cutting treatment on the first substrate.
2. The method for manufacturing a display device according to claim 1 ,
wherein the protective film is in contact with a second surface of the first substrate, and
wherein the second surface of the first substrate is an opposite surface of the first substrate from the first surface of the first substrate.
3. The method for manufacturing a display device according to claim 1 , wherein the protective film is formed by an atomic layer deposition method.
4. The method for manufacturing a display device according to claim 1 , wherein the protective film comprises one selected from the group consisting of aluminum oxide, hafnium oxide, zirconium oxide, titanium oxide, zinc oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, silicon oxide, manganese oxide, nickel oxide, erbium oxide, cobalt oxide, tellurium oxide, barium titanate, titanium nitride, tantalum nitride, aluminum nitride, tungsten nitride, cobalt nitride, manganese nitride, hafnium nitride, ruthenium, platinum, nickel, cobalt, manganese and copper.
5. The method for manufacturing a display device according to claim 2 ,
wherein the protective film is in contact with a second surface of the second substrate, and
wherein the second surface of the second substrate is an opposite surface of the second substrate from the first surface of the second substrate.
6. A method for manufacturing a display device, comprising the steps of:
over a first surface of a first substrate, forming a first insulating layer;
over the first insulating layer, forming a transistor;
over a first surface of a second substrate, forming a second insulating layer; and
bonding the first substrate and the second substrate with an adhesive layer to seal the transistor;
forming a groove portion by performing a first cutting treatment on the second substrate;
forming a protective film, so that the protective film is in contact with the second substrate, the first insulating layer in the vicinity of a peripheral portion of the groove portion, and the first substrate; and
fabricating a plurality of display devices by performing a second cutting treatment on the first substrate.
7. The method for manufacturing a display device according to claim 6 ,
wherein the protective film is in contact with a second surface of the first substrate, and
wherein the second surface of the first substrate is an opposite surface of the first substrate from the first surface of the first substrate.
8. The method for manufacturing a display device according to claim 6 , wherein the protective film is formed by an atomic layer deposition method.
9. The method for manufacturing a display device according to claim 6 , wherein the protective film comprises one selected from the group consisting of aluminum oxide, hafnium oxide, zirconium oxide, titanium oxide, zinc oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, silicon oxide, manganese oxide, nickel oxide, erbium oxide, cobalt oxide, tellurium oxide, barium titanate, titanium nitride, tantalum nitride, aluminum nitride, tungsten nitride, cobalt nitride, manganese nitride, hafnium nitride, ruthenium, platinum, nickel, cobalt, manganese and copper.
10. The method for manufacturing a display device according to claim 7 ,
wherein the protective film is in contact with a second surface of the second substrate, and
wherein the second surface of the second substrate is an opposite surface of the second substrate from the first surface of the second substrate.