IP Library Granted Patent US 10,372,280
Granted Patent B2
US 10,372,280 · App. 15/642,459 · Granted Aug 6, 2019

Capacitive sensor

Inventors: Tomoyuki Yamai (Tokyo, JP); Mitsuo Bito (Tokyo, JP); Yasuyuki Kitamura (Tokyo, JP); Yuta Hiraki (Tokyo, JP); Setsuo Ishibashi (Tokyo, JP); Manabu Yazawa (Tokyo, JP)
Assignee: ALPS ALPINE CO., LTD.
G06F3/044B32B15/02G02F1/13338G06F3/0416B32B2307/202B32B2307/412B32B2457/208G06F2203/04112
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Quick Facts
Patent No.
US 10,372,280
App. No.
15/642,459
Granted
Aug 6, 2019
Kind
B2
Abstract

A capacitive sensor includes a base material provided with a pattern of a light-transmissive conductive film. The light-transmissive conductive film contains metal nanowires. The pattern includes a detection pattern formed of a plurality of detection electrodes arranged with intervals and a plurality of lead-out wirings linearly extending in a first direction from the corresponding ones of the plurality of the detection electrodes. At least one of the detection electrodes of the detection pattern includes a current path-setting section for elongating the linear path length of the current from the detection electrode toward the lead-out wiring.

Claims (46)

1. A capacitive sensor comprising:

a base material provided with a pattern of a light-transmissive conductive film, wherein

the light-transmissive conductive film has a structure in which metal nanowires are dispersed in a binder; and

the pattern includes:

a detection pattern of a plurality of detection electrodes arranged with intervals; and

a plurality of lead-out wirings linearly extending in a first direction from corresponding ones of the plurality of the detection electrodes, wherein

at least one of the detection electrodes of the detection pattern includes a current path-setting section for elongating a linear path length of a current from the detection electrode toward the lead-out wiring;

the current path-setting section includes a slit pattern disposed to obstruct the linear path length of the current;

the current path-setting section includes a plurality of slit patterns having a length of a half or more of the length of the detection electrode and restricting the current path;

the plurality of the slit patterns are disposed parallel to each other;

at least a part of the plurality of the slit patterns inward extends from the end of the detection electrode; and

adjacent ones of the slit patterns restrict the current path at positions different from each other;

the current path-setting section includes a wiring path that allows the path of current flowing from the detection electrode toward the lead-out wiring to meander;

at least one of the detection electrodes including the current path-setting section and the lead-out wiring extending therefrom have a structure in which the metal nanowires are dispersed in a binder and are formed in a detection region;

the plurality of the detection electrodes are arranged in the first direction;

a plurality of pair of one of the detection electrodes and one of the lead-out wirings extending from corresponding one of the detection electrodes are formed so as to be separated from each other;

the plurality of the lead-out wirings in the detection region include an equal-interval region where the lead-out wirings are arrayed with a constant first pitch in a second direction orthogonal to the first direction;

the plurality of the slit patterns have widths equal to the intervals of the plurality of the lead-out wirings; and

the pitch of the plurality of the slit patterns is equal to the first pitch.

2. The capacitive sensor according to claim 1 , wherein

the first direction is a direction toward an external terminal region from the detection pattern; and

the current path-setting section is at least disposed to the detection electrode closest to the external terminal region.

3. The capacitive sensor according to claim 2 , wherein the current path-setting section is disposed to each of the plurality of the detection electrodes.

4. The capacitive sensor according to claim 3 , wherein the metal nanowires include silver nanowires.

5. The capacitive sensor according to claim 2 , wherein the metal nanowires include silver nanowires.

6. The capacitive sensor according to claim 1 , wherein the current path-setting section is disposed to each of the plurality of the detection electrodes.

7. The capacitive sensor according to claim 6 , wherein the metal nanowires include silver nanowires.

8. The capacitive sensor according to claim 1 , wherein the metal nanowires include silver nanowires.

9. A capacitive sensor comprising:

a base material provided with a pattern of a light-transmissive conductive film, wherein

the light-transmissive conductive film contains metal nanowires; and

the pattern includes:

a detection pattern of a plurality of detection electrodes arranged with intervals; and

a plurality of lead-out wirings linearly extending in a first direction from corresponding ones of the plurality of the detection electrodes, wherein

at least one of the detection electrodes of the detection pattern includes a current path-setting section for elongating a linear path length of a current from the detection electrode toward the lead-out wiring;

the current path-setting section includes a slit pattern disposed for obstructing the linear path length of the current; and

the current path-setting section includes a plurality of slit patterns having a length of a half or more of the length of the detection electrode and restricting the current path;

the plurality of the slit patterns are disposed parallel to each other;

at least a part of the plurality of the slit patterns inward extends from the end of the detection electrode;

adjacent ones of the slit patterns restrict the current path at positions different from each other;

the current path-setting section includes a wiring path that allows the path of current flowing from the detection electrode toward the lead-out wiring to meander;

the plurality of the detection electrodes are arranged in the first direction;

a plurality of pair of one of the detection electrodes and one of the lead-out wirings extending from corresponding one of the detection electrodes are formed so as to be separated from each other,

the plurality of the lead-out wirings in the detection region include an equal-interval region where the lead-out wirings are arrayed with a constant first pitch in a second direction orthogonal to the first direction;

the plurality of the slit patterns have widths equal to the intervals of the plurality of the lead-out wirings; and

the pitch of the plurality of the slit patterns is equal to the first pitch.

Assignments (2)
CHANGE OF NAME Recorded Jan 31, 2019
From: ALPS ELECTRIC CO., LTD
To: ALPS ALPINE CO., LTD
Reel/Frame 048207/0399 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2017
From: YAMAI, TOMOYUKI; BITO, MITSUO; KITAMURA, YASUYUKI; HIRAKI, YUTA; ISHIBASHI, SETSUO; YAZAWA, MANABU
To: ALPS ELECTRIC CO., LTD.
Reel/Frame 042920/0656 →
Priority Claims (1)
JP 2015-007252 · Jan 16, 2015 · national
Continuity (2)
Continuation PCTJP2015080503 · Oct 29, 2015
Related Publication 20170308206A1 · Oct 26, 2017