Production method for OLED panel, and production apparatus for OLED panel
A production method for an OLED panel includes forming on an upper face side of a transparent substrate, a layered body including a resin layer, a TFT layer, an OLED layer and a sealing layer including an organic sealing film, and then irradiating the resin layer being in contact with the transparent substrate with a laser beam to separate the transparent substrate and the layered body. In the production method, the resin layer includes a first region to be irradiated with a laser beam at a first intensity P1 and a second region to be irradiated with a laser beam at a second intensity P2 greater than the first intensity, the first region overlaps with the organic sealing film, and the second region does not overlap with the organic sealing film.
1. A production method for an OLED panel, the production method comprising:
forming on an upper face side of a transparent substrate, a layered body including a resin layer, a TFT layer, an OLED layer and a sealing layer including an organic sealing film, and then irradiating the resin layer being in contact with the transparent substrate with a laser beam to separate the transparent substrate and the layered body,
wherein the resin layer includes a first region to be irradiated with a laser beam at a first intensity and a second region to be irradiated with a laser beam at a second intensity greater than the first intensity,
the first region overlaps with the organic sealing film, and
the second region does not overlap with the organic sealing film.
2. The production method for an OLED panel according to claim 1 ,
wherein the sealing layer includes an inorganic sealing film, the TFT layer includes an inorganic insulating film, the first region overlaps with the inorganic sealing film and the inorganic insulating film, and the second region overlaps with the inorganic insulating film.
3. The production method for an OLED panel according to claim 2 ,
wherein when the layered body is formed, the organic sealing film has tensile stress, and the inorganic sealing film and the inorganic insulating film have compressive stress.
4. The production method for an OLED panel according to claim 1 ,
wherein tensile stress is generated in the second region of the resin layer by irradiating the resin layer with a laser beam at the second intensity.
5. The production method for an OLED panel according to claim 2 ,
wherein the second region overlaps with the inorganic sealing film.
6. The production method for an OLED panel according to claim 5 ,
wherein the resin layer includes a third region to be irradiated with a laser beam at a third intensity, a relationship of the first intensity≤the third intensity<the second intensity holds, and
the third region does not overlap with the organic sealing film and the inorganic sealing film, but overlaps with the inorganic insulating film.
7. The production method for an OLED panel according to claim 5 ,
wherein the resin layer includes a third region to be irradiated with a laser beam at a third intensity, the first intensity and the third intensity are equal, a relationship of the third intensity<the second intensity holds, and
the third region does not overlap with the organic sealing film and the inorganic sealing film, but overlaps with the inorganic insulating film.
8. The production method for an OLED panel according to claim 6 ,
wherein the TFT layer includes a plurality of terminals overlapping with the third region.
9. The production method for an OLED panel according to claim 8 ,
wherein the TFT layer includes an organic interlayer film disposed on the OLED layer side, and
edges of each terminal are covered with the organic interlayer film.
10. The production method for an OLED panel according to claim 9 ,
wherein the first region overlaps with the organic interlayer film.
11. The production method for an OLED panel according to claim 9 ,
wherein when the layered body is formed, the organic interlayer film has tensile stress.
12. The production method for an OLED panel according to claim 1 ,
wherein the second intensity is from 1.2 to 2.2 times the first intensity.
13. The production method for an OLED panel according to claim 1 ,
wherein the first region corresponds to a display part of one panel, and the second region surrounds the first region.
14. The production method for an OLED panel according to claim 1 ,
the production method further comprising attaching a film to an upper face of the sealing layer after the formation of the layered body.
15. The production method for an OLED panel according to claim 1 ,
the production method further comprising attaching a flexible base material to a lower face of the resin layer after the separation of the transparent substrate and the layered body.
16. The production method for an OLED panel according to claim 3 ,
wherein the organic sealing film is formed by curing an applied resin.
17. The production method for an OLED panel according to claim 3 ,
wherein the inorganic sealing film and the inorganic insulating film are each formed by a CVD.
18. The production method for an OLED panel according to claim 1 ,
wherein the resin layer is formed with polyimide.
19. A production apparatus for an OLED panel, the production apparatus forming on an upper face side of a transparent substrate, a layered body comprising a resin layer, a TFT layer, an OLED layer and a sealing layer including an organic sealing film, and then irradiating the resin layer being in contact with the transparent substrate with a laser beam to separate the transparent substrate and the layered body,
wherein the resin layer includes a first region to be irradiated with a laser beam at a first intensity and a second region to be irradiated with a laser beam at a second intensity greater than the first intensity,
the first region overlaps with the organic sealing film, and
the second region does not overlap with the organic sealing film.