Container treatment system
A system includes a cold plasma applicator configured to couple directly to a container, wherein the cold plasma applicator is configured to generate a cold plasma within the container. A method includes operating a cold plasma applicator to generate a cold plasma to treat contents within a container, wherein the cold plasma applicator is configured to directly couple to the container, or the cold plasma applicator comprises a varying geometry application surface having a plurality of protruding electrode portions spaced apart from one another to define a plurality of intermediate recessed portions, or a combination thereof.
1. A system, comprising:
a cold plasma applicator configured to generate a cold plasma within a container, wherein the cold plasma applicator comprises a varying geometry application surface having a plurality of protruding electrode portions spaced apart from one another to define a plurality of intermediate recessed portions, and wherein the varying geometry application surface is adjustable; and
a controller coupled to a drive and one or more sensors, wherein the controller is configured to control the drive to adjust a width or a depth of said application surface in response to sensor feedback from the one or more sensors.
2. The system of claim 1 , wherein the cold plasma applicator has a wavy plasma application surface having the plurality of protruding electrode portions and the plurality of intermediate recessed portions, wherein the wavy plasma application surface curves alternatingly in opposite directions.
3. The system of claim 1 , wherein the cold plasma applicator has a zigzagging plasma application surface having the plurality of protruding electrode portions and the plurality of intermediate recessed portions, wherein the zigzagging plasma application surface turns alternatingly in opposite directions.
4. The system of claim 1 , comprising a conductive material defining the plurality of protruding electrode portions, and a dielectric layer disposed over the conductive material, wherein the dielectric layer is configured to interface with an outer surface of the container.
5. The system of claim 4 , wherein a thickness of the dielectric layer varies along the varying geometry application surface.
6. The system of claim 5 , wherein the thickness of the dielectric layer is greater along the plurality of protruding electrode portions and lesser along the plurality of intermediate recessed portions.
7. The system of claim 1 , comprising a ground structure configured to be disposed on an opposite side of the container relative to the cold plasma applicator.
8. The system of claim 7 , wherein the ground structure comprises a planar ground surface.
9. The system of claim 7 , wherein the ground structure comprises a varying geometry ground surface having a plurality of protruding ground portions spaced apart from one another to define a plurality of intermediate recessed ground portions.
10. A system, comprising:
a cold plasma applicator configured to generate a cold plasma within a container, wherein the cold plasma applicator comprises a varying geometry application surface having a plurality of protruding electrode portions spaced apart from one another to define a plurality of intermediate recessed portions, and wherein the cold plasma applicator comprises a drive coupled to the varying geometry application surface to adjust a width of the plurality of the intermediate recessed portions, a depth of the plurality of intermediate recessed portions, or a combination thereof.
11. The system of claim 10 , wherein the cold plasma applicator has a wavy plasma application surface having the plurality of protruding electrode portions and the plurality of intermediate recessed portions, wherein the wavy plasma application surface curves alternatingly in opposite directions.
12. The system of claim 10 , wherein the cold plasma applicator has a zigzagging plasma application surface having the plurality of protruding electrode portions and the plurality of intermediate recessed portions, wherein the zigzagging plasma application surface turns alternatingly in opposite directions.
13. The system of claim 10 , comprising a controller coupled to the drive and one or more sensors, wherein the controller is configured to control the drive to adjust the width or the depth in response to sensor feedback from the one or more sensors.
14. The system of claim 10 , comprising a conductive material defining the plurality of protruding electrode portions, and a dielectric layer disposed over the conductive material, wherein the dielectric layer is configured to interface with an outer surface of the container.
15. The system of claim 14 , wherein a thickness of the dielectric layer varies along the varying geometry application surface.
16. The system of claim 15 , wherein the thickness of the dielectric layer is greater along the plurality of protruding electrode portions and lesser along the plurality of intermediate recessed portions.
17. The system of claim 10 , comprising a ground structure configured to be disposed on an opposite side of the container relative to the cold plasma applicator.
18. The system of claim 17 , wherein the ground structure comprises a planar ground surface.
19. The system of claim 17 , wherein the ground structure comprises a varying geometry ground surface having a plurality of protruding ground portions spaced apart from one another to define a plurality of intermediate recessed ground portions.
20. The system of claim 10 , comprising the container having food contents or medical contents.