Forming single diffusion break and end isolation region after metal gate replacement, and related structure
The disclosure relates to integrated circuit (IC) structures with a single diffusion break (SDB) and end isolation regions, and methods of forming the same after forming a metal gate. A structure may include: a plurality of fins positioned on a substrate; a plurality of metal gates each positioned on the plurality of fins and extending transversely across the plurality of fins; an insulator region positioned on and extending transversely across the plurality of fins between a pair of the plurality of metal gates; at least one single diffusion break (SDB) positioned within the insulator region and one of the plurality of fins; an end isolation region positioned laterally adjacent to a lateral end of one of the plurality of metal gates; and an insulator cap positioned on an upper surface of at least a portion of one of the plurality of metal gates.
1. A method of forming an integrated circuit (IC) structure, the method comprising:
providing a structure including:
a plurality of fins positioned on a substrate,
a plurality of shallow trench isolations (STIs) each positioned on the substrate laterally adjacent to one of the plurality of fins,
a plurality of gates extending transversely across the plurality of fins, and
an insulator region positioned laterally between the plurality of fins,
forming a first trench by removing a portion of one of the plurality of gates and an underlying portion of one of the plurality of fins to expose the substrate thereunder;
forming a second trench by removing portions of the plurality of gates to expose one of the plurality of STIs thereunder, the second trench extending substantially in parallel with the plurality of fins and positioned adjacent to a lateral end of a remaining portion of one of the plurality of gates; and
forming an insulator within the first and second trenches.
2. The method of claim 1 , further comprising forming a plurality of gate trenches by selectively removing a portion of each of the plurality of gates, after forming the second trench, wherein the forming of the insulator includes forming the insulator within each of the plurality of gate trenches.
3. The method of claim 1 , wherein a depth of the first trench below an upper surface of the insulator region is greater than a depth of the second trench below an upper surface of the remaining portion of the insulator region.
4. The method of claim 1 , wherein the second trench is distal to the first trench along a length of the plurality of gates.
5. The method of claim 1 , wherein forming the insulator includes filling the first and second trenches with a single insulating material.
6. The method of claim 1 , wherein forming the insulator on the exposed substrate forms a single diffusion break (SDB) within the one of the plurality of fins.
7. The method of claim 1 , wherein forming the insulator on the exposed one of the plurality of STIs forms an end isolation region adjacent to the lateral end of the remaining portion of one of the plurality of gates.
8. A method of forming an integrated circuit (IC) structure, the method comprising:
providing a structure including:
a plurality of fins positioned on a substrate,
a plurality of shallow trench isolations (STIs) each positioned on the substrate laterally adjacent to one of the plurality of fins,
a plurality of gates extending transversely across the plurality of fins, and
an inter-level dielectric (ILD) region positioned laterally between the plurality of fins,
forming a first trench by removing a portion of one of the plurality of gates and an underlying portion of one of the plurality of fins to expose the substrate thereunder;
forming a second trench by removing portions of the plurality of gates to expose one of the plurality of STIs thereunder, the second trench extending substantially in parallel with the plurality of fins and positioned adjacent to a lateral end of a remaining portion of one of the plurality of gates;
forming a plurality of gate trenches by selectively removing a portion of each of the plurality of gates; and
forming an insulator within the first trench, the second trench, and the plurality of gate trenches.
9. The method of claim 8 , wherein forming the insulator in the second trench forms an end isolation region adjacent to the lateral end of the plurality of gates.
10. The method of claim 8 , wherein a depth of the first trench below an upper surface of the insulator region is greater than a depth of the second trench below an upper surface of the remaining portion of the insulator region.
11. The method of claim 8 , wherein the second trench is distal to the first trench along a length of the plurality of metal gates.
12. The method of claim 8 , wherein forming the insulator within the first trench forms a single diffusion break (SDB) within one of the plurality of fins.
13. The method of claim 8 , wherein forming the insulator includes filling the first trench, the second trench, and the plurality of gate trenches with a single insulating material.
14. The method of claim 13 , wherein the single insulating material includes a nitride material, and wherein the insulator region includes an oxide material.