Transparent display device and method of manufacturing a transparent display device
In a method of manufacturing a transparent display device, a substrate including a pixel region and a transmission region may be provided. A first electrode may be formed on the substrate in the pixel region, and a display layer may be formed on the first electrode. A second electrode facing the first electrode may be formed on the display layer, and a capping structure including a first capping layer and a second capping layer may be formed on the second electrode. The first capping layer may be formed on the second electrode in the pixel region and a first region of the transmission region by using a mask that has an opening, the mask may be shifted, and the second capping layer may be formed on the second electrode in the pixel region and a second region of the transmission region by using the shifted mask.
1. A transparent display device comprising:
a substrate including a first pixel region, a first transmission region, a second pixel region, and a second transmission region;
a first electrode disposed over the substrate in each of the first pixel region and the second pixel region;
a display layer disposed on the first electrode;
a second electrode facing the first electrode and disposed on the display layer; and
a capping structure disposed on the second electrode,
wherein the capping structure comprises:
a first capping layer disposed on the second electrode in the first pixel region, the first transmission region, and the second pixel region; and
a second capping layer disposed on the second electrode in the first pixel region, the second pixel region, and the second transmission region.
2. The transparent display device of claim 1 , wherein the capping structure has a first thickness in the first pixel region and the second pixel region, and has a second thickness less than the first thickness in the first transmission region and the second transmission region.