Oxide semiconductor transistor
A display device includes a driving transistor and an organic EL element. The driving transistor includes an oxide semiconductor layer; a first gate electrode that region overlapping the oxide semiconductor layer; a first insulting layer between the first gate electrode and the oxide semiconductor layer; a second gate electrode that includes a region overlapping the oxide semiconductor layer and the first gate electrode; a second insulating layer between the second gate electrode and the oxide semiconductor layer; and a first and a second transparent conductive layer that are provided between the oxide semiconductor layer and the first insulating layer and each include a region contacting the oxide semiconductor layer. The organic EL element includes a first electrode; a second electrode; a light emitting layer between the first electrode and the second electrode; and an electron transfer layer between the light emitting layer and the first electrode.
1. A transistor, comprising:
an oxide semiconductor layer over a substrate;
a first gate electrode arranged on a side of the oxide semiconductor layer opposite to the substrate and including a region overlapping the oxide semiconductor layer,
a first insulating layer between the first gate electrode and the oxide semiconductor layer; and
a first transparent conductive layer and a second transparent conductive layer arranged on a side of the oxide semiconductor layer to the substrate,
wherein
the first transparent conductive layer and the second transparent conductive layer are spaced apart from each other,
the first gate electrode has a region overlapping a region where the first transparent conductive layer and the second transparent conductive layer are spaced apart from each other, and
the first transparent conductive layer and the second transparent conductive layer are in contact with the oxide semiconductor layer.
2. The transistor according to claim 1 ,
wherein a surface of the oxide semiconductor layer facing the substrate has a first region in contact with the first transparent conductive layer and a second region in contact with the second transparent conductive layer, and
wherein the first region is a source region, and the second region is a drain region.
3. The transistor according to claim 2 ,
further comprising a first line arranged between the first transparent conductive layer and the oxide semiconductor layer, and a second line arranged between the second transparent conductive layer and the oxide semiconductor layer.
4. The transistor according to claim 3 ,
wherein the first line is electrically connected to the oxide semiconductor layer and the first transparent conductive film, and the second line is electrically connected to the oxide semiconductor layer and the second transparent conductive film.
5. The transistor according to claim 4 ,
wherein a first end of the first transparent conductive layer overlaps the first gate electrode, and a first end of the second transparent conductive layer overlaps the first gate electrode.
6. The transistor according to claim 5 ,
wherein the first line is arranged on a second end opposite to the first end of the first transparent conductive layer, and the second line is arranged on a second end opposite to the first end of the second transparent conductive layer.
7. The transistor according to claim 6 ,
wherein the oxide semiconductor layer has a channel region overlapping the first gate electrode,
wherein the first end of the first transparent conductive layer is adjacent to the channel region, and the first end of the second transparent conductive layer is adjacent the channel region, and
wherein the first line and the second line are arranged apart from the channel region.
8. The transistor according to claim 7 ,
wherein the oxide semiconductor layer includes low resistance regions having a resistivity lower than the channel region, and the low resistance regions are adjacent to the channel region.
9. The transistor according to claim 1 ,
wherein the oxide semiconductor layer contains at least one element, or a plurality of elements selected from indium (In), zinc (Zn), gallium (Ga), tin (Sn), aluminum (Al), and magnesium (Mg).
10. The transistor according to claim 1 ,
wherein the first transparent conductive layer and the second transparent conductive layer are conductive metal oxide.
11. The transistor according to claim 1 ,
further comprising a second insulating layer between the first transparent conductive layer and the second transparent conductive layer and the substrate,
wherein a second gate electrode between the second insulating layer and the substrate, and
wherein the first gate electrode and the second gate electrode overlap each other.
12. The transistor according to claim 11 ,
wherein the second gate electrode has a length in a channel length direction larger than a length of the first gate electrode in the channel length direction.
13. The transistor according to claim 11 ,
wherein an area of the second gate electrode overlapping the oxide semiconductor layer has than an area of the first gate electrode overlapping the oxide semiconductor layer.
14. The transistor according to claim 11 ,
wherein the first gate electrode and the second gate electrode ere electrically connected to each other.
15. The transistor according to claim 11 ,
wherein the second gate electrode is applied to constant voltage.
16. The transistor according to claim 11 ,
wherein a first end of the first transparent conductive layer overlaps the first gate electrode and the second gate electrode, and a first end of the second transparent conductive layer overlaps the first gate electrode and the second gate electrode.