Substrate processing device and substrate processing method
A substrate processing device 10 has a water removing unit 110 and, when a solvent supply unit 58 supplies a volatile solvent to a surface of a substrate W, the water removing unit 110 supplies a water removing agent to the surface of the substrate W to promote replacement of the cleaning water on the surface of the substrate W with the volatile solvent.
1. A substrate processing method comprising the steps of:
supplying a cleaning water to a surface of a substrate; and
supplying a volatile solvent in a liquid state to the surface of the substrate on which the cleaning water exists, and replacing the cleaning water with the volatile solvent, wherein
in the step of replacing the cleaning water with the volatile solvent, a water removing agent which reacts with the cleaning water is supplied to the substrate together with the supply of the volatile solvent, and
wherein the water removing agent is triethyl phosphate or trimethyl phosphate.
2. The substrate processing method according to claim 1 , further comprising:
removing a droplet of the volatile solvent on the surface of the substrate by heating the surface of the substrate so as to dry the surface of the substrate.
3. The substrate processing method according to claim 2 , further comprising:
rotating the substrate while heating the substrate, wherein the droplet of the volatile solvent is dispersed radially outward by a centrifugal force caused by the rotating of the substrate, and the dispersed droplet is absorbed and removed through a solvent suction port provided around the rotating substrate.
4. The substrate processing method according to claim 3 , wherein
in the step of replacing the cleaning water, the volatile solvent and the water removing agent are supplied to the rotating substrate, and during the rotating of the substrate, a film of the volatile solvent is formed over the surface of the substrate so that the surface of the substrate is not exposed.