Durable, high performance wire grid polarizer having permeable junction between top protection layer

1. A method of manufacturing a wire grid polarizer (WGP), comprising the following steps in the following order:

providing an array of wires on a bottom protection layer with channels between adjacent wires, the channels being air filled;

applying a top protection layer at a distal end of the wires, farthest from the bottom protection layer, such that the top protection layer: spans the channels, keeping the channels air filled; forms a continuous layer with the top protection layer on adjacent wires touching; and has permeable junctions, including a permeable junction between the top protection layer on adjacent wires

wherein the bottom protection layer and the top protection layer each have: a coefficient of thermal conductivity ≥2 W/(m*K); a melting temperature ≥600° C.; an oxygen diffusion coefficient ≤10 −21 m 2 /s; water solubility ≤0.005 g/L; and refractive index n≤2.2 and extinction coefficient k≤0.06 across the visible light spectrum; then

applying an upper barrier-layer: through the permeable junctions into the channels and onto surfaces of the channels; and on an outermost surface of the top protection layer.

2. The method of claim 1 , wherein applying the upper barrier-layer includes the following steps in the following order:

applying an amino phosphonate by liquid immersion deposition; then

applying a hydrophobic chemical by vapor deposition.

3. The method of claim 1 , wherein the bottom protection layer and the top protection layer each have a Young's modulus of ≥10 GPa.

4. The method of claim 1 , wherein:

thickness of the top protection layer is ≥10 nm and ≤1 μm; and

thickness of the bottom protection layer is ≥300 μm and ≤5 mm.

5. The method of claim 1 , wherein providing the array of wires on the bottom protection layer includes applying a film on top of the bottom protection layer by sputter deposition, etching the film to form the array of wires and the channels between adjacent wires, and etching into the bottom protection layer to increase a size of the channels for a depth ≥5 nm.

6. The method of claim 1 , wherein the top protection layer is applied by sputter deposition.

7. The method of claim 1 , wherein applying the upper barrier-layer includes placing the WGP in an oven, introducing Si(R 1 ) i (R 2 ) j into the oven, the Si(R 1 ) i (R 3 ) j being in a gaseous phase in the oven, then vapor depositing the Si(R 1 ) i (R 3 ) j onto the WGP, where i is 1 or 2, j is 1, 2, or 3, and i+j=4; R 2 is —N(CH 3 ) 2 ; R 1 is CF 3 (CF 2 ) n (CH 2 ) m ; 2≤n≤9; and 1≤m≤3.

8. The method of claim 1 , wherein the upper barrier-layer is a conformal coating with a maximum thickness of ≤20 nm.

9. The method of claim 1 , further comprising applying by atomic layer deposition a lower barrier-layer, before applying the top protection layer, on the wires and on the bottom protection layer inside of the channels, in a conformal layer.

10. A method of manufacturing a wire grid polarizer (WGP), comprising the following steps in the following order:

providing an array of wires on a bottom protection layer with channels between adjacent wires, the channels being air filled;

applying a top protection layer at a distal end of the wires, farthest from the bottom protection layer, such that the top protection layer: spans the channels, keeping the channels air filled; forms a continuous layer with the top protection layer on adjacent wires touching; and has permeable junctions, including a permeable junction between the top protection layer on adjacent wires; then

applying an upper barrier-layer: through the permeable junctions into the channels and onto surfaces of the channels; and on an outermost surface of the top protection layer, wherein the upper barrier-layer is applied to allow each channel to extend beyond a distal end of the wires, farthest from the bottom protection layer, into the top protection layer for a depth ≥5 nm.

11. The method of claim 10 , wherein applying the upper barrier-layer includes the following steps in the following order:

applying an amino phosphonate; then

applying a hydrophobic chemical.

12. The method of claim 11 , wherein the amino phosphonate includes nitrilotri(methylphosphonic acid).

13. The method of claim 10 , wherein the bottom protection layer and the top protection layer each comprise ≥90% aluminum oxide.

14. The method of claim 10 , wherein:

thickness of the top protection layer is ≥10 nm and ≤1 μm; and

thickness of the bottom protection layer is ≥300 μm and ≤5 mm.

15. A method of manufacturing a wire grid polarizer (WGP), comprising the following steps in the following order:

providing an array of wires on a bottom protection layer with channels between adjacent wires, the channels being air filled;

applying a lower barrier-layer on the wires and on the bottom protection layer inside of the channels, in a conformal layer, wherein: the lower barrier-layer comprises two layers of different materials, including an oxidation-barrier and a moisture-barrier; the oxidation-barrier is located between the moisture-barrier and the wires and is distinct from the wires; the oxidation-barrier includes aluminum oxide, silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, a rare earth oxide, or combinations thereof; the moisture-barrier includes hafnium oxide, zirconium oxide, a rare earth oxide different from the rare earth oxide of the oxidation-barrier, or combinations thereof;

applying a top protection layer at a distal end of the wires, farthest from the bottom protection layer, such that the top protection layer: spans the channels, keeping the channels air filled; forms a continuous layer with the top protection layer on adjacent wires touching; and has permeable junctions, including a permeable junction between the top protection layer on adjacent wires; then

applying an upper barrier-layer: through the permeable junctions into the channels and onto surfaces of the channels; and on an outermost surface of the top protection layer.

16. The method of claim 15 , wherein:

the upper barrier-layer is applied to allow each channel to extend beyond a distal end of the wires, farthest from the bottom protection layer, into the top protection layer for a depth D 14U ≥10 nm;

providing the array of wires on the bottom protection layer includes applying a film on top of the bottom protection layer by sputter deposition, etching the film to form the array of wires and the channels between adjacent wires, and etching into the bottom protection layer to increase a size of the channels for a depth D 14L ; and

|D 14L −D 14U |≤30 nm.

17. The method of claim 15 , wherein applying the upper barrier-layer includes the following steps in the following order:

applying an amino phosphonate by liquid immersion deposition; then

applying a hydrophobic chemical by vapor deposition.

18. The method of claim 17 , wherein the upper barrier-layer is a conformal coating with a maximum thickness of ≤20 nm.

19. The method of claim 15 , wherein the bottom protection layer and the top protection layer each comprise ≥90% aluminum oxide.

20. The method of claim 15 , wherein:

thickness of the top protection layer is ≥10 nm and ≤1 μm; and

thickness of the bottom protection layer is ≥300 μm and ≤5 mm.