Method and apparatus for pellicle removal
A method and apparatus for removing a pellicle from a photomask wherein the adhesive between the pellicle frame and photomask is cooled sufficiently to allow the adhesive property of the adhesive to diminish to the point where the adhesive will release from the photomask with little or no mechanical force and leaving minimal adhesive on the photomask. The adhesive is cooled by way of manifolds containing coolant being brought in contact with the pellicle frame or by way of a coolant spray nozzles spraying coolant directly onto the pellicle frame.
1. A method of removing an adhesive securing a pellicle frame to a photomask from the photomask comprising the steps of:
arranging the pellicle frame in proximity to a cooling system;
insulating a portion of the photomask, wherein the portion of the photomask is insulated from a coolant; and
cooling the adhesive securing the pellicle frame to the photomask to an embrittlement temperature of the adhesive.
2. The method of claim 1 , wherein the adhesive force of the adhesive is diminished to the point that the adhesive can be removed with no strain being applied to the pellicle.
3. The method of claim 1 , wherein a strain force is applied between the adhesive and the photomask.
4. The method of claim 2 , wherein the strain force comprises a movement of the pellicle frame.
5. The method of claim 1 , wherein the cooling step comprises the step of spraying the coolant onto the adhesive.
6. The method of claim 5 , further comprising the step of insulating the photomask to limit the cooling of the photomask.
7. The method of claim 1 , wherein the cooling step utilizes carbon dioxide.
8. The method of claim 1 , wherein the cooling step utilizes a hydrofluorocarbon.
9. The method of claim 1 , wherein the cooling step utilizes a cryogenic coolant.
10. The method of claim 9 , wherein the cryogenic coolant is selected from the group consisting essentially of nitrogen, argon, oxygen, hydrogen, helium, fluorine, methane, neon, carbon monoxide.
11. The method of claim 10 , wherein the cooling step comprises the steps of:
thermally coupling a manifold to the pellicle frame; and
flowing the cryogenic fluid through the manifold.
12. A method comprising the steps of:
selectively cooling a frame of a pellicle to reduce adhesion in an adhesive between the frame and a photomask, wherein a portion of the photomask is insulated from a coolant; and
removing the frame from the photomask in response to the reduced adhesion.
13. The method of claim 12 , wherein the adhesive force of the adhesive is diminished to the point that the adhesive can be removed with no strain being applied to the pellicle.
14. The method of claim 13 , wherein a strain force is applied between the adhesive and the photomask.
15. The method of claim 14 , wherein the strain force comprises a movement of the pellicle frame.
16. The method of claim 12 , wherein the selectively cooling step comprises the step of spraying the coolant onto the adhesive.
17. An apparatus for separating a pellicle from a photomask, comprising:
a first manifold containing cooling fluid; and
first adjustable supports, wherein the first adjustable supports secure a pellicle frame to the first manifold to selectively cool the pellicle frame and reduce adhesion in an adhesive between the pellicle frame and the photomask, wherein a portion of the photomask is insulated from the cooling fluid.
18. The apparatus of claim 17 , wherein the first adjustable supports adjust the orientation of the manifold.
19. The apparatus of claim 18 , further comprising second adjustable supports, wherein the second adjustable supports secure the photomask in place.
20. The apparatus of claim 19 , further comprising means for applying a strain force to the pellicle frame.