UV-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby
The present invention relates to a UV-curable ink composition, a method for producing a bezel pattern of a display substrate using same, and a bezel pattern produced thereby, the UV-curable ink composition comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and an adhesion promoter, wherein the content ratio of the epoxy compound to the oxetane compound is 1:0.5-1:6, and an adhesion to a glass substrate after curing is 4B or higher according to the ASTM D3359 standard.
1. A UV-curable ink composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, a surfactant and an adhesion promoter,
wherein a content ratio of the epoxy compound to the oxetane compound is 1:1.7 to 1:6, the adhesion promoter is one or more epoxy silane-based compounds, the adhesion promoter is contained in an amount of 2 to 8 wt % with respect to the total weight of the UV-curable ink composition, and adhesive force to a glass base material after curing is 4B or higher according to the ASTM D3359 standard.
2. The UV-curable ink composition of claim 1 , further comprising one or more selected from the group consisting of a diluent, and a photosensitizer.
3. The UV-curable ink composition of claim 1 , wherein the oxetane compound comprises an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings.
4. The UV-curable ink composition of claim 1 , wherein a content of the epoxy compound is 5 to 60 wt % with respect to the total weight of the UV-curable ink composition.
5. The UV-curable ink composition of claim 1 , wherein a content of the oxetane compound is 15 to 80 wt % with respect to the total weight of the UV-curable ink composition.
6. The UV-curable ink composition of claim 1 , wherein the photopolymerization initiator is an iodonium salt or a sulfonium salt.
7. The UV-curable ink composition of claim 1 , wherein a content of the photopolymerization initiator is 1 to 15 wt % with respect to the total weight of the UV-curable ink composition.
8. The UV-curable ink composition of claim 1 , wherein a content of the colorant is 1 to 15 wt % with respect to the total weight of the UV-curable ink composition.
9. The UV-curable ink composition of claim 2 , wherein a content of the diluent is 0 to 30 wt % with respect to the total weight of the UV-curable ink composition.
10. The UV-curable ink composition of claim 2 , wherein the surfactant is a fluorine-based surfactant.
11. The UV-curable ink composition of claim 2 , wherein the surfactant is contained in an amount of 0.1 to 5.0 wt % with respect to the total weight of the UV-curable in composition.
12. The UV-curable ink composition of claim 2 , wherein the photosensitizer is contained in an amount of 1 to 200 parts by weight with respect to 100 parts by weight of the photopolymerization initiator.
13. The UV-curable ink composition of claim 1 , wherein a dose for curing the UV-curable ink composition is 1 to 10,000 mJ/cm 2 .
14. The UV-curable ink composition of claim 1 , wherein the UV-curable ink composition has a viscosity of 1 cP to 50 cP at 25° C.
15. The UV-curable ink composition of claim 14 , wherein the UV-curable ink composition has a viscosity of 3 cP to 45 cP at 25° C.
16. The UV-curable ink composition of claim 1 , wherein the UV-curable ink composition has a taper angle of 0° to 30° after being cured.
17. The UV-curable ink composition of claim 16 , wherein the taper angle is 0° to 10°.
18. The UV-curable ink composition of claim 1 , wherein the UV-curable ink composition is for forming a bezel pattern.
19. A method for producing a bezel pattern for a display substrate, comprising:
a) forming a bezel pattern on a substrate by using the UV-curable ink composition of claim 1 ; and
b) curing the bezel pattern.
20. The method of claim 19 , further comprising cleaning and drying the substrate prior to a) the forming of the bezel pattern.
21. The method of claim 20 , wherein the cleaning and drying of the substrate is carried out by one or more treatments selected from the group consisting of a wet surface treatment, a UV ozone treatment, and a normal pressure plasma treatment.
22. The method of claim 19 , wherein the method of forming the bezel pattern on the substrate in Step a) is a method selected from an inkjet printing, a gravure coating, and a reverse offset coating.
23. The method of claim 19 , wherein Step a) is carried out at a process temperature of 10° C. to 100° C.
24. The method of claim 23 , wherein Step a) is carried out at a process temperature of 20° C. to 70° C.
25. The method of claim 19 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.
26. The method of claim 25 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.
27. The method of claim 19 , wherein the bezel pattern has a taper angle of 0° to 30°.
28. The method of claim 27 , wherein the bezel pattern has a taper angle of 0° to 10°.
29. The method of claim 19 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.
30. A bezel pattern for a display substrate, which is formed on a substrate by curing the UV-curable ink composition of claim 1 .
31. The bezel pattern of claim 30 , wherein the bezel pattern has a thickness of 0.1 μm to 20 μm.
32. The bezel pattern of claim 31 , wherein the bezel pattern has a thickness of 0.5 μm to 5 μm.
33. The bezel pattern of claim 30 , wherein the bezel pattern has a taper angle of 0° to 30°.
34. The bezel pattern of claim 33 , wherein the bezel pattern has a taper angle of 0° to 10°.
35. The bezel pattern of claim 30 , wherein the bezel pattern has an OD value of 0.05 to 2.5 per a film thickness of 1.0 μm.