Substrate for organic electronic device and method of manufacturing the same
Provided are a substrate for an OED, a method of manufacturing the same, and a use thereof. The substrate includes a flexible base film and an inorganic material layer, and the inorganic material layer includes a multilayer structure of at least two thin layers. Such an inorganic material layer may have an excellent physical property, for example, a barrier property, by inhibiting crystallinity. In addition, by employing the multilayer structure, an inorganic material layer having a physical property which is difficult to be realized by a conventional inorganic material layer, for example, a high refractive index, in addition to the barrier property may be formed.
1. An organic electronic device (OED), comprising:
a substrate for the organic electronic device (OED), and
a device region having a first electrode layer, an organic material layer, and a second electrode layer,
wherein the substrate comprises:
a flexible base film having a haze of 40% to 90% and having a glass transition temperature of about 200° C. or more, and a refractive index with respect to light having a wavelength of 550 nm of 1.8 or more and comprising scattering particles having an average particle diameter of 50 to 100 nm; and
an inorganic material layer formed on the base film and including a stack structure of alternating first and second sub layers each having a thickness of 7 nm or less,
wherein the inorganic material layer has a thickness of 10 to 100 nm,
wherein the inorganic material layer includes 4 sub layers or more and 45 sub layers or less, and does not include a sub layer having a thickness of more than 7 nm,
wherein the inorganic material layer and the base film have a difference in refractive index of 1 or less,
wherein the device region is on the inorganic material layer of the substrate,
wherein the first electrode layer is a transparent electrode layer and the second electrode layer is a reflective electrode layer,
wherein the first electrode layer is closer to the substrate than the second electrode layer, and
wherein the base film comprises a functional group chemically reacted with the inorganic material layer, and the functional group is at least one selected from the group consisting of a hydroxyl group, an amino group and carboxyl group.
2. The organic electronic device (OED) according to claim 1 , wherein the first sub layer and the second sub layer are stacked in contact with each other, and are each of a different material selected from an oxide, a nitride and an oxynitride.
3. The organic electronic device (OED) according to claim 1 , wherein the inorganic material layer further includes a third sub layer of a material different from the first and second sub layers.
4. The organic electronic device (OED) according to claim 1 , wherein the first sub layer has a refractive index with respect to a wavelength of 550 nm of 1.4 to 1.9, and the second sub layer has a refractive index with respect to a wavelength of 550 nm of 2.0 to 2.6.
5. The organic electronic device (OED) according to claim 1 , wherein the inorganic material layer has a refractive index with respect to a wavelength of 550 nm of 1.8 to 2.2.
6. The organic electronic device (OED) according to claim 1 , wherein the substrate has a water vapor transmission rate (WVTR) of 10 −6 to 10 −3 g/m 2 /day.
7. A light source for a display, comprising:
the OED of claim 1 .
8. A lighting device, comprising:
the OED of claim 1 .
9. The organic electronic device (OED) of claim 1 , wherein the scattering particles comprise hollow particles or particles having a core/shell structure.
10. The organic electronic device (OED) of claim 1 , wherein the first sub layer comprises Al 2 O 3 and the second sub layer comprises TiO 2 .