IP Library Granted Patent US 10,428,014
Granted Patent B2
US 10,428,014 · App. 14/901,525 · Granted Oct 1, 2019

Base generator, base-reactive composition containing said base generator, and base generation method

Inventors: Nobuhiko Sakai (Kawagoe, JP); Kosuke Yanaba (Kawagoe, JP); Koji Arimitsu (Tokyo, JP)
Assignees: FUJIFILM Wako Pure Chemical Corporation; Tokyo University of Science Foundation
C07C279/26B01J19/123B01J19/127B01J19/128C07C59/84C07C65/28C07D209/48C07D311/86G03F7/0045C07C2601/14C07C2603/24
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Quick Facts
Patent No.
US 10,428,014
App. No.
14/901,525
Granted
Oct 1, 2019
Kind
B2
Abstract

The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc.

Claims (18)

1. A compound of formula (A′) or (A″):

wherein R 1′ to R 5′ each independently is an alkyl group having 1 to 8 carbon atoms, R 6′ is a hydrogen atom; an alkyl group having 1 to 6 carbon atoms which may have a substituent selected from the group consisting of an epoxy group, an alkoxycarbonyl group having 2 to 6 carbon atoms, a coumarinylcarbonyl group, an anthraquinonyl group, a xanthonyl group and a thioxanthonyl group; an alkenyl group having 2 to 6 carbon atoms; or an arylalkyl group having 7 to 15 carbon atoms which may have a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, and a nitro group, R 7′ is an alkyl group having 1 to 8 carbon atoms which may have an amino group, and Z − is an anion derived from a carboxylic acid of formula (B 1 ), (B 2 ), (B 3 ) or (B 4 );

wherein R 8 to R 16 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group;

wherein R 17 to R 25 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group, and Y is an oxygen atom or a sulfur atom;

wherein R 26 to R 36 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group, and two pieces of R may form a ring structure by binding to each other;

wherein R 37 to R 42 each independently is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group, and two pieces of R may form a ring structure by binding to each other;

wherein R 1′″ to R 4′″ each independently is an alkyl group having 1 to 8 carbon atoms, R 5′″ is an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 14 carbon atoms which may have a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, and a nitro group, R 7′″ is an aryl group having 6 to 14 carbon atoms which may have a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom, and a nitro group, and Z − is the same as described above.

2. The compound according to claim 1 , wherein the anion Z − derived from a carboxylic acid in the general formula (A′) or (A″) is an anion of formula (B 1 ′), (B 2 ′), (B 3 ′) or (B 4 ′):

wherein R 8′ to R 16′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;

wherein R 17′ to R 25′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and Y is an oxygen atom or a sulfur atom;

wherein R 26′ , R 27′ , and R 29′ to R 36′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R 28′ is a hydrogen atom or an alkoxy group having 1 to 4 carbon atoms;

wherein R 37′ to R 42′ each independently is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.

3. The compound according to claim 1 , wherein the compound of formula (A) is a compound of formula (1), (2), (3), (4), (5), (6), (7), (8), (9), (10), (11) or (12):

4. A base generator comprising the compound according to claim 1 .

5. The base generator according to claim 4 , which is a base generator generating a base by irradiation of active energy ray.

6. A base-reactive composition, which comprises the base generator according to claim 4 and a base-reactive compound, wherein the base reactive compound is a compound selected from the group consisting of an epoxy-based compound, a silicon-based compound, an isocyanate-based compound, and a polyamic acid-based compound.

7. The base-reactive composition according to claim 6 , wherein the composition is a composition further comprising an organic solvent.

8. A method for generating a base, which comprises irradiating active energy ray having a wavelength of 100 to 700 nm to the compound according to claim 1 for an irradiation time of 0.01 to 1,000 seconds.

Assignments (2)
CHANGE OF NAME Recorded Jun 13, 2018
From: WAKO PURE CHEMICAL INDUSTRIES, LTD.
To: FUJIFILM WAKO PURE CHEMICAL CORPORATION
Reel/Frame 046076/0786 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2015
From: SAKAI, NOBUHIKO; YANABA, KOSUKE; ARIMITSU, KOJI
To: WAKO PURE CHEMICAL INDUSTRIES, LTD.; TOKYO UNIVERSITY OF SCIENCE FOUNDATION
Reel/Frame 037368/0983 →
Priority Claims (1)
JP 2013-137489 · Jun 28, 2013 · national
Continuity (1)
Related Publication 20160122292A1 · May 5, 2016