Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator
The present invention relates to a compound represented by the general formula (A), a base- and/or radical-generating agent comprising the compound, and so on. In the formula, four pieces of R 1 each independently represents a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.
1. A compound represented by the general formula (A):
wherein four pieces of R 1 each independently represent a hydrogen atom or a fluorine atom; four pieces of R 2 each independently represent a fluorine atom or a trifluoromethyl group; R 3 , R 6 , R 7 and R 10 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms; R 4 and R 5 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, or R 4 and R 5 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; and R 8 and R 9 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aryl group having 6 to 14 carbon atoms and optionally having a substituent selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, a dialkylamino group having 2 to 12 carbon atoms, a halogen atom, and a nitro group, or R 8 and R 9 are bonded to each other to represent an alkylene group having 2 to 4 carbon atoms; provided that two or three of the eight groups R 3 to R 10 are each a hydrogen atom, and, in a case where two of the eight groups are each a hydrogen atom, then three to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms, and, in a case where three of the eight groups are each a hydrogen atom, then four or five of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.
2. The compound according to claim 1 , wherein, in the general formula (A), two of the eight groups R 3 to R 10 are each a hydrogen atom, and four to six of the remaining groups are each an alkyl group having 1 to 12 carbon atoms.
3. The compound according to claim 1 , wherein, in the general formula (A), R 3 to R 6 are each an alkyl group having 1 to 6 carbon atoms.
4. The compound according to claim 1 , wherein the compound represented by the general formula (A) is a compound represented by the general formula (C-A1), (C-A2) or (C-A3):
wherein four pieces of R 1 and four pieces of R 2 are as described above,
wherein four pieces of R 1 and four pieces of R 2 are as described above,
wherein four pieces of R 1 and four pieces of R 2 are as described above.
5. The compound according to claim 1 , wherein, in the general formula (A), the four pieces of R 1 are each a hydrogen atom or each a fluorine atom, and the four pieces of R 2 are each a fluorine atom.
6. The compound according to claim 1 , wherein, in the general formula (A), the four pieces of R 1 are each a hydrogen atom, and the four pieces of R 2 are each a trifluoromethyl group.
7. The compound according to claim 1 , wherein the compound represented by the general formula (A) is a compound represented by the formula (1), (2), (3), (4) or (5):
8. A base- and/or radical-generating agent comprising the compound according to claim 1 .
9. The base- and/or radical-generating agent according to claim 8 , wherein the base- and/or radical-generating agent generates a base and/or a radical through irradiation with an active energy ray.
10. A base-generating agent comprising the compound according to claim 1 .
11. The base-generating agent according to claim 10 , wherein the base-generating agent generates a base through irradiation with an active energy ray.
12. A base- and/or radical-curable resin composition comprising the compound according to claim 1 , and a base-curable resin raw material and/or a radical-reactive compound.
13. The composition according to claim 12 , wherein the base-curable resin raw material is a mixture of an epoxy compound and a multivalent carboxylic acid.
14. The composition according to claim 12 , wherein the base-curable resin raw material is a mixture of an epoxy compound and a polythiol.
15. A base-curable resin composition comprising the compound according to claim 1 , and a base-curable resin raw material.