Microelectromechanical structure with frames

1. A microelectromechanical structure, comprising:

a first capacitive detection element, a first frame, and a second frame patterned into a material layer of the microelectromechanical structure; wherein

the first capacitive detection element includes a stator and a rotor, wherein the stator is anchored to a support to form a stationary electrode, and the rotor is suspended to a support to form a mobile electrode;

the rotor has a degree in freedom for translation in a first direction that is parallel to the material layer of the microelectromechanical structure;

the stationary electrode and the mobile electrode form a capacitor, capacitance of which is changed by motion of the mobile electrode in the first direction;

the first frame is anchored to the support and circumscribes the stator and the rotor of the first capacitive detection element in the material layer of the microelectromechanical structure;

the second frame is anchored to the support and circumscribes the stator and the rotor of the first capacitive detection element in the material layer of the microelectromechanical structure between the first capacitive detection element and the first frame;

the second frame is electrically isolated from the first frame; and

the rotor and the second frame are galvanically coupled to have a same electric potential.

2. The microelectromechanical structure of claim 1 , further comprising one or more second capacitive detection elements, each circumscribed by a dedicated second frame, wherein the first frame circumscribes all capacitive detection elements in the microelectromechanical structure.

3. The microelectromechanical structure of claim 1 ,

wherein the microelectromechanical structure includes at least one second capacitive detection element, and

wherein the rotor of the second capacitive detection element is suspended to have a degree in freedom for translation in a direction that is perpendicular to the first direction.

4. The micro electromechanical structure of claim 1 , wherein the second frame includes at least one impact element of the motion limiter structure.

5. The microelectromechanical structure of claim 1 , further comprising at least two impact elements configured to provide successively activated motion limiter stages within the element gap.

6. The microelectromechanical structure of claim 5 , wherein the at least two impact elements include:

a first impact element induced into contact by closing of a first limiter gap in response to displacement of the rotor in a specific direction, the first limiter gap being smaller than the element gap in the specific direction; and

a second impact element induced into contact by closing of the element gap in response to displacement of the capacitive detection element in the specific direction.

7. The microelectromechanical structure of claim 6 , wherein the first impact element includes a flexural element.

8. The microelectromechanical structure of claim 7 , wherein the flexural element is configured to provide a spring constant in the specific direction, the spring constant being configured to provide a restoring force greater than adhesive force of contact in the second impact element.

9. The microelectromechanical structure of claim 1 ,

wherein the capacitive detection element includes a comb structure that comprises a plurality of comb bars that are disposed in parallel with, and adjacent to each other,

wherein a comb gap is a distance between each of the plurality of comb bars, and

wherein a width of the element gap is 0.5 to 5 times the width of the comb gap.

10. A microelectromechanical device, comprising the microelectromechanical structure of claim 1 .

11. The microelectromechanical structure of claim 1 , wherein the microelectromechanical structure includes a motion limiter structure activated by closing of an element gap in the material layer of the microelectromechanical structure between the rotor and the second frame that are in the same electric potential.