IP Library › Granted Patent US 10,431,610
Granted Patent B2
US 10,431,610 · App. 14/272,625 · Granted Oct 1, 2019

X-ray detecting panel and manufacturing method thereof

Inventor: Sung-Woo Cho (Yongin, KR)
Assignee: Samsung Display Co., Ltd.
H01L27/1288H01L27/14663H01L27/1214
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Quick Facts
Patent No.
US 10,431,610
App. No.
14/272,625
Granted
Oct 1, 2019
Kind
B2
Abstract

A panel to detect X-rays includes a plurality of signal lines, a plurality of gate lines, and a plurality of cells in areas adjacent intersections of respective ones of the gate and control lines. A first area includes a first cell having a driving circuit, and a second area includes a second cell which omits a driving circuit. Data lines connected to respective ones of the cells carry signals from which an X-ray image is generated. The second cell may be located in a dummy cell area of the panel.

Claims (20)

1. An X-ray detecting panel comprising:

a substrate;

m gate lines on the substrate;

n data lines on the substrate and intersecting the m gate lines;

a thin film transistor in an area between adjacent gate lines of the first gate line to the (m−1 ) th gate line on the substrate;

a non-driving element in an area between the (m−1) th gate line and the m th gate line on the substrate; and

a photoelectric converter connected to the thin film transistor, wherein the thin film transistor and the non-driving element are connected to different ones of the gate lines, wherein the non-driving element includes a gate electrode connected to the m th gate line and a semiconductor layer insulated from the gate electrode, and does not include a source electrode and a drain electrode.

2. The panel as claimed in claim 1 , wherein an entire surface of the semiconductor layer is in direct contact with an insulating layer.

3. The panel as claimed in claim 2 , wherein the insulating layer includes a gate insulating layer and a capping layer.

4. The panel as claimed in claim 3 , wherein one surface of the semiconductor layer is in direct contact with the gate insulating layer and at least one other surface of the semiconductor layer is in direct contact with the capping layer.

5. The panel as claimed in claim 1 , further comprising:

a second photoelectric converter connected to the m th gate line,

wherein the non-driving element is between the second photoelectric converter and a correponding one of the n data lines.

6. An X-ray detecting panel, comprising:

a substrate;

m gate lines on the substrate;

n data lines on the substrate and intersecting the m gate lines;

a thin film transistor in an area between adjacent gate lines of the first gate line to the (m−1)th gate line on the substrate;

a non-driving element in an area between the (m−1)th gate line and the mth gate line on the substrate; and

a photoelectric converter connected to the thin film transistor, wherein the thin film transistor and the non-driving element are connected to different ones of the gate lines, wherein the non-driving element includes a gate electrode connected to the m th gate line and a gate insulating layer covering the gate electrode, and does not include a source electrode and a drain electrode, wherein the non-driving element does not include a semiconductor layer, a source electrode, and a drain electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2014
From: CHO, SUNG-WOO
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 032847/0478 →
Priority Claims (1)
KR 10-2013-0091907 · Aug 2, 2013 · national
Continuity (1)
Related Publication 20150034944A1 · Feb 5, 2015