High performance chemical and bio sensors using metal oxide semiconductors
Electrochemical and bio sensors using metal oxide semiconductors and method of making the same are described herein. The sensor includes a gate electrode, a dielectric layer over the gate electrode, a channel layer over the dielectric layer, and source and drain electrodes formed on the channel layer to provide a field effect transistor structure. The channel layer is a metal oxide semiconductor film that has a substantially uniform thickness of at least 3 nm thick and less than 10 nm thick. The metal oxide semiconductor film is functionalized with molecules attached thereto that are open to make contact with a fluid for detection of at least one component or at least one physical or chemical property of the fluid.
1. A method of producing a metal oxide semiconductor film for sensor devices, comprising:
mixing at least one of a metal nitrate or a hydrate of a metal nitrate precursor in a solvent to obtain a precursor solution;
depositing a layer of said precursor solution onto a surface of a substrate;
annealing said layer of said precursor solution to provide said metal oxide semiconductor film, wherein said metal oxide semiconductor film has a substantially uniform thickness of at least 3 nm thick and less than 10 nm thick; and
functionalizing said metal oxide semiconductor film by attaching molecules on a surface of the metal oxide semiconductor film, said molecules being open to make contact with a fluid so as to provide a sensing metal oxide semiconductor film for detecting at least one component of said fluid or at least one physical property or chemical property of said fluid,
wherein functionalizing the metal oxide semiconductor film comprises:
functionalizing the metal oxide semiconductor film by attaching at least one type of enzyme on the surface of said metal oxide semiconductor film, or
functionalizing the metal oxide semiconductor film with a salinized (3-Aminopropyl)triethoxysilane (APTES) so that the sensing metal oxide semiconductor film is used to measure pH of said fluid, or both.
2. The method of claim 1 , wherein said metal oxide semiconductor film is a substantially amorphous film.
3. The method of claim 1 , wherein said substantially uniform thickness is uniform to within a root-mean-square deviation of less than 10%.
4. The method of claim 1 , wherein said substantially uniform thickness is uniform to within a root-mean-square deviation of less than 30%.
5. The method of claim 1 , wherein said metal oxide semiconductor film has a substantially uniform thickness of at least 1 nm thick and less than 5 nm thick.
6. The method of claim 1 , wherein said metal oxide semiconductor film has a substantially uniform thickness of about 3.5 nm thick.
7. The method of claim 1 , wherein said solvent is water.
8. The method of claim 1 , wherein said solvent is deionized water.
9. The method of claim 1 , wherein said at least one of a metal nitrate or a hydrate of a metal nitrate precursor is indium nitrate hydrate.
10. The method of claim 1 , wherein said at least one of a metal nitrate or a hydrate of a metal nitrate precursor is at least one of indium nitrate hydrate, zinc nitrate hydrate, aluminum nitrate hexahydrate, gallium nitrate hydrate, or titanium nitrate.
11. The method of claim 1 , wherein said precursor solution has a concentration of said metal nitrate or a hydrate of a metal nitrate precursor within a range of 0.05 mole to 0.1 mole in solution.
12. The method of claim 1 , wherein said annealing comprises a pre-baking to remove solvent from said layer after said depositing, and wherein said annealing further comprises a hard-baking of said layer to form an oxide film.
13. The method of claim 12 , wherein said pre-baking is performed at about 100° C. and said hard-baking is performed at about 250° C.
14. The method of claim 1 , wherein said substrate is a flexible substrate.
15. The method of claim 1 , wherein said substrate is at least one of a glass substrate, a silicon substrate, polymer substrate, and metal substrate.
16. The method of claim 1 , wherein said substrate has a thickness of at least 0.5 μm and less than 2 μm.
17. The method of claim 1 , wherein said at least one type of enzyme is a glucose oxidase so that the sensing metal oxide semiconductor film is used to detect glucose in said fluid.