Method of detaching a pellicle from a photomask
A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.
1. A method of detaching a pellicle from a photomask, the pellicle including an elastomer attaching element interposed between a pellicle frame and the photomask, the method comprising:
providing a detaching element at an extending portion of the attaching element, the extending portion being formed of the elastomer; and
applying a force to the detaching element so as to pull the extending portion in a first direction having a vector component directed normal to the major surface of the photomask and directed toward a backside of the pellicle.
2. The method as claimed in claim 1 , wherein the first direction also has a vector component directed parallel to a major surface of the photomask and directed away from a center region of the photomask.
3. The method as claimed in claim 1 , further comprising applying a force having a vector component directed normal to the major surface of the photomask and directed toward a backside of the pellicle using a forcing member inserted between the pellicle frame and the photomask.
4. The method as claimed in claim 3 , wherein the forcing member is a lever, and a plurality of forcing members and a plurality of extending portions of the attaching element are arranged symmetrically about the pellicle frame.