IP Library Granted Patent US 10,446,740
Granted Patent B2
US 10,446,740 · App. 16/364,590 · Granted Oct 15, 2019

Magnetoresistance effect element

Inventors: Tomoyuki Sasaki (Tokyo, JP); Katsuyuki Nakada (Tokyo, JP); Tatsuo Shibata (Tokyo, JP)
Assignee: TDK CORPORATION
H01L43/10G01R33/093G01R33/098G11B5/3909G11C11/161G11C11/1675H01L27/105H01L27/222H01L29/82H01L43/08
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Quick Facts
Patent No.
US 10,446,740
App. No.
16/364,590
Granted
Oct 15, 2019
Kind
B2
Abstract

A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, and the tunnel barrier layer has a spinel structure represented by a composition formula of AIn 2 O x (0<x≤4), and an A-site is a non-magnetic divalent cation which is one or more selected from a group consisting of magnesium, zinc and cadmium.

Claims (20)

1. A magnetoresistance effect element comprising:

a first ferromagnetic metal layer;

a second ferromagnetic metal layer; and

a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers,

wherein the tunnel barrier layer has a spinel structure comprising a divalent cation and a trivalent cation in a unit cell wherein a concentration of constituent elements of the divalent cation in the unit cell is more than half a concentration of constituent elements of the trivalent cation in the unit cell, and

wherein the divalent cation is a non-magnetic divalent cation which is one or more selected from a group consisting of magnesium, zinc and cadmium,

wherein the tunnel barrier layer comprises: at least one lattice-matched portion that is lattice-matched with both of the first ferromagnetic metal layer and the second ferromagnetic metal layer; and at least one lattice-mismatched portion that is not lattice-matched with at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer,

and wherein, when viewed in a stacking direction of a cross-section TEM image of the interface between the tunnel barrier layer and the first and/or the second ferromagnetic metal layer, a lattice-matched portion is made up of a plurality of sequential, continuously-connected lattice lines, and a lattice-mismatched portion is made up of a plurality of sequential, non-continuously-connected lattice lines and/or no lattice lines.

2. The magnetoresistance effect element according to claim 1 ,

wherein a volume ratio of the lattice-matched portion with respect to a volume of the entire tunnel barrier layer is 65% to 95%.

3. The magnetoresistance effect element according to claim 1 ,

wherein the tunnel barrier layer has a spinel structure in which an atomic arrangement is disordered.

4. The magnetoresistance effect element according to claim 1 ,

wherein the first ferromagnetic metal layer has larger coercivity than that of the second ferromagnetic metal layer.

5. The magnetoresistance effect element according to claim 1 ,

wherein the tunnel barrier layer has a film thickness of 0.7 nm to 1.7 nm.

6. The magnetoresistance effect element according to claim 1 ,

wherein at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer has magnetic anisotropy perpendicular to a stacking direction.

7. The magnetoresistance effect element according to claim 1 ,

wherein at least one of the first ferromagnetic metal layer and the second ferromagnetic metal layer is Co 2 Mn 1-a Fe a Al b Si 1-b (0≤a≤1, 0≤b≤1).

Priority Claims (1)
JP 2015-071412 · Mar 31, 2015 · national
Continuity (2)
Division 15556261
Related Publication 20190221735A1 · Jul 18, 2019