Solid-state imaging device, imaging system, and movable object

1. A solid-state imaging device comprising:

a plurality of pixels each of which includes a photoelectric conversion unit that generates charges by photoelectric conversion;

a first holding portion that holds charges transferred from the photoelectric conversion unit;

a second holding portion that holds charges transferred from the first holding portion; and

an amplifier unit that outputs a signal based on an amount of charges held by the second holding portion,

wherein the photoelectric conversion unit includes:

a second semiconductor region of a second conductivity type adapted to accumulate the generated charges,

a third semiconductor region of a first conductivity type provided under the second semiconductor region, and

a fourth semiconductor region of the second conductivity type provided under the third semiconductor region,

wherein the first holding portion includes:

a fifth semiconductor region of the second conductivity type provided spaced apart from the second semiconductor region, and

a sixth semiconductor region of the first conductivity type provided under the fifth semiconductor region at a depth at which the third semiconductor region is provided,

wherein a semiconductor region having a lower potential than each of the third semiconductor region and the sixth semiconductor region is provided between the third semiconductor region and the sixth semiconductor region,

wherein the semiconductor region is overlapped with the second semiconductor region in a plan view,

wherein in the plan view, the semiconductor region is arranged within an area between a center part of the photoelectric conversion unit and the first holding portion, and

wherein the second semiconductor region, the fourth semiconductor region, and the semiconductor region are overlapped with each other.

2. The solid-state imaging device according to claim 1 , wherein the semiconductor region is arranged between a center part of the photoelectric conversion unit and the first holding portion of adjacent another pixel in a plan view.

3. The solid-state imaging device according to claim 1 , further comprising a light-shielding film covering the first holding portion,

wherein the light-shielding film extends above the semiconductor region.

4. The solid-state imaging device according to claim 1 , wherein the fourth semiconductor region is provided extending under the sixth semiconductor region.

5. The solid-state imaging device according to claim 1 , wherein the third semiconductor region and the sixth semiconductor region are provided at the same depth in the semiconductor substrate and have the same impurity concentration.

6. The solid-state imaging device according to claim 1 , wherein the photoelectric conversion unit of one pixel and the photoelectric conversion unit of another pixel are arranged adjacent to each other, and the third semiconductor region of the one pixel and the third semiconductor region of the another pixel are connected to each other.

7. The solid-state imaging device according to claim 1 ,

wherein an impurity concentration of the third semiconductor region is set so that entirety of the third semiconductor region is not depleted, and

wherein an impurity concentration of the fourth semiconductor region is set so that the fourth semiconductor region is depleted when charges are accumulated in the second semiconductor region.

8. The solid-state imaging device according to claim 1 ,

wherein the photoelectric conversion unit and the first holding portion are provided in a seventh semiconductor region of the first conductivity type, and

wherein the third semiconductor region and the sixth semiconductor region are connected to the seventh semiconductor region.

9. The solid-state imaging device according to claim 8 , wherein the third semiconductor region and the sixth semiconductor region each have a higher impurity concentration than the seventh semiconductor region.

10. The solid-state imaging device according to claim 1 ,

wherein the first holding portion further includes an eighth semiconductor region of the first conductivity type provided in contact with a surface of a semiconductor substrate, and

wherein the fifth semiconductor region is provided under the eighth semiconductor region.

11. An imaging system comprising:

the solid-state imaging device according to claim 1 ; and

a signal processing unit that processes signals output from the pixels of the solid-state imaging device.

12. A movable object comprising:

the solid-state imaging device according to claim 1 ;

a distance information acquisition unit adapted to acquire distance information on a distance to an object, from parallax images based on signals from the solid-state imaging device; and

a control unit adapted to control the movable object based on the distance information.

13. The solid-state imaging device according to claim 1 , wherein the center part of the photoelectric conversion unit is a centroid of the second semiconductor region in the plan view.

14. The solid-state imaging device according to claim 1 , further comprising an optical waveguide arranged over the photoelectric conversion unit,

wherein the center part of the photoelectric conversion unit is a center of the optical waveguide in the plan view.

15. The solid-state imaging device according to claim 1 , further comprising a first semiconductor region of the first conductivity type provided in contact with a surface of a semiconductor substrate,

wherein the second semiconductor region is arranged under the first semiconductor region.

16. A solid-state imaging device comprising:

a plurality of pixels each of which includes a photoelectric conversion unit that generates charges by photoelectric conversion;

a first holding portion that holds charges transferred from the photoelectric conversion unit;

a second holding portion that holds charges transferred from the first holding portion; and

an amplifier unit that outputs a signal based on an amount of charges held by the second holding portion,

wherein the photoelectric conversion unit includes:

a second semiconductor region of a second conductivity type adapted to accumulate the generated charges, and

wherein the first holding portion includes:

a fifth semiconductor region of the second conductivity type provided spaced apart from the second semiconductor region,

wherein the solid-state imaging device further comprises:

a third semiconductor region of a first conductivity type provided under the second semiconductor region and the fifth semiconductor region, and

a fourth semiconductor region of the second conductivity type provided under the third semiconductor region,

wherein the third semiconductor region has an opening in a region overlapping with the second semiconductor region in a plan view,

wherein, in the plan view, the opening is arranged within an area between a center part of the photoelectric conversion unit and the first holding portion, and

wherein the second semiconductor region, the fourth semiconductor region, and the opening are overlapped with each other.

17. The solid-state imaging device according to claim 16 , wherein the opening is a semiconductor region having a potential lower than a potential of the third semiconductor region.

18. The solid-state imaging device according to claim 16 , wherein the opening is a semiconductor region having a potential lower than a potential of the third semiconductor region.

19. The solid-state imaging device according to claim 16 , further comprising an optical waveguide arranged over the photoelectric conversion unit,

wherein the center part of the photoelectric conversion unit is a center of the optical waveguide in the plan view.

20. The solid-state imaging device according to claim 16 , further comprising a first semiconductor region of the first conductivity type provided in contact with a surface of a semiconductor substrate,

wherein the second semiconductor region is arranged under the first semiconductor region.