Surface acoustic wave device having a piezoelectric layer on a quartz substrate and methods of manufacturing thereof
Embodiments of a Surface Acoustic Wave (SAW) device and methods of fabrication thereof are disclosed. In some embodiments, a SAW device includes a quartz carrier substrate, a piezoelectric layer on a surface of the quartz carrier substrate, and at least one interdigitated transducer on a surface of the piezoelectric layer opposite the quartz carrier substrate, wherein a thickness of the piezoelectric layer is less than twice a transducer electrode period of the at least one interdigitated transducer. Using the piezoelectric layer on the carrier substrate suppresses acoustic radiation into the bulk, thereby improving the performance of the SAW device. Further, by utilizing quartz for the carrier substrate, additional advantages of small viscous losses, small permittivity, and small thermal sensitivity are achieved. Still further, as compared to Silicon, the use of quartz for the carrier substrate eliminates resistive losses.
1. A Surface Acoustic Wave (SAW) device, comprising:
a quartz carrier substrate; and
a piezoelectric layer on a surface of the quartz carrier substrate, wherein a bulk cutoff frequency in the quartz carrier substrate is higher than a resonance frequency of the SAW device.
2. The SAW device of claim 1 wherein the bulk cutoff frequency in the quartz carrier substrate is more than 10% higher than the resonance frequency of the SAW device.
3. The SAW device of claim 1 wherein the quartz carrier substrate comprises a plane that includes a z-axis of the quartz carrier substrate or a plane which makes an angle smaller than 10 degrees with the z-axis of the quartz carrier substrate.
4. The SAW device of claim 3 wherein the plane is rotated along the z-axis and a normal of the plane forms an angle in a range of about 30 and 55 degrees with an x-axis of a quartz crystal of the quartz carrier substrate.
5. The SAW device of claim 3 wherein the plane is rotated along the z-axis and a normal of the plane forms an angle of about 90 degrees or an angle close to 90 degrees with an x-axis of a quartz crystal of the quartz carrier substrate.
6. The SAW device of claim 3 wherein the plane is rotated along the z-axis and a normal of the plane forms an angle of about 0 degrees or an angle close to 0 degrees with an x-axis of a quartz crystal of the quartz carrier substrate.
7. The SAW device of claim 1 wherein the piezoelectric layer is formed of Lithium Niobate with an orientation between Y−20 degrees and Y +60 degrees.
8. The SAW device of claim 1 wherein the piezoelectric layer is formed of Lithium Tantalate with an orientation between Y and Y +60 degrees.
9. The SAW device of claim 1 further comprising at least one interdigitated transducer on a surface of the piezoelectric layer opposite the quartz carrier substrate.
10. The SAW device of claim 9 wherein a thickness of the piezoelectric layer is less than four times a transducer electrode period of the at least one interdigitated transducer.
11. The SAW device of claim 9 wherein a thickness of the piezoelectric layer is less than twice a transducer electrode period of the at least one interdigitated transducer.
12. The SAW device of claim 1 further comprising one or more additional layers on the surface of the quartz carrier substrate between the quartz carrier substrate and the piezoelectric layer.
13. The SAW device of claim 12 wherein the one or more additional layers comprise one or more dielectric layers.
14. A Surface Acoustic Wave (SAW) device, comprising:
a quartz carrier substrate;
a piezoelectric layer on a surface of the quartz carrier substrate; and
at least one interdigitated transducer on a surface of the piezoelectric layer opposite the quartz carrier substrate;
wherein a Bulk Acoustic Wave (BAW) velocity in the quartz carrier substrate is higher than a SAW velocity of the SAW device.
15. The SAW device of claim 14 wherein the BAW velocity is at least about 4400 meters per second (m/s).
16. The SAW device of claim 15 wherein the BAW velocity is in a range between about 4400 m/s and about 4660 m/s.
17. The SAW device of claim 14 wherein a bulk cutoff frequency in the quartz carrier substrate is more than 10% higher than a resonance frequency of the SAW device.
18. The SAW device of claim 14 wherein the quartz carrier substrate comprises a plane that includes a z-axis of the quartz carrier substrate or a plane which makes an angle smaller than 10 degrees with the z-axis of the quartz carrier substrate.
19. The SAW device of claim 18 wherein the plane is rotated along the z-axis and a normal of the plane forms an angle in a range of about 30 and 55 degrees with an x-axis of a quartz crystal of the quartz carrier substrate.
20. The SAW device of claim 18 wherein the plane is rotated along the z-axis and a normal of the plane forms an angle of about 90 degrees or an angle close to 90 degrees with an x-axis of a quartz crystal of the quartz carrier substrate.
21. The SAW device of claim 18 wherein the plane is rotated along the z-axis and a normal of the plane forms an angle of about 0 degrees or an angle close to 0 degrees with an x-axis of a quartz crystal of the quartz carrier substrate.
22. The SAW device of claim 14 wherein the piezoelectric layer is formed of Lithium Niobate with an orientation between Y−20 degrees and Y +60 degrees.
23. The SAW device of claim 14 wherein the piezoelectric layer is formed of Lithium Tantalate with an orientation between Y and Y +60 degrees.
24. The SAW device of claim 14 wherein a thickness of the piezoelectric layer is less than four times a transducer electrode period of the at least one interdigitated transducer.