IP Library › Granted Patent US 10,466,390
Granted Patent B2
US 10,466,390 · App. 15/322,508 · Granted Nov 5, 2019

Silica film, optical member, and polarizing member

Inventor: Shigeto Kobori (Yokohama, JP)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
G02B1/111G02B1/113G02B1/14G02B1/18G02B5/3025G02F1/133502
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,466,390
App. No.
15/322,508
Granted
Nov 5, 2019
Kind
B2
Abstract

Provided is a silica film, etc. not having the film strength thereof being easily degraded, even when hollow silica particles are contained therein. Further, provided is a silica film, etc. having a lower reflectivity. A silica layer (the silica film) comprises silica and fluorinated hollow silica particles. The silica is formed by converting polysilazane into silica. The fluorinated hollow silica particles are locally distributed on the surface of the silica layer. The part where the fluorinated hollow silica particles are localized has the function of a low refractive index layer, and the parts other than the part where the fluorinated hollow silica particles are localized have the function of a hard coat layer.

Claims (38)

1. An optical element comprising:

a substrate; and

a silica film disposed on the substrate,

wherein the silica film has a first surface and a second surface, the first and second surfaces being opposite to each other,

the silica film includes silica and fluorinated hollow silica particles distributed in the silica, the fluorinated hollow silica particles being different from the silica, and the silica being formed by converting a polysilazane to the silica,

the fluorinated hollow silica particles are unevenly distributed with a greater concentration toward the first surface, and

the first surface of the silica film has an undulating structure.

2. The optical element of claim 1 , wherein the silica film further comprises a reactive silicon compound.

3. The optical element of claim 1 , wherein a region of the silica film where the fluorinated hollow silica particles are concentrated is a low-refractive index layer, and a region other than the region where the fluorinated hollow silica particles are concentrated is a hard coat layer.

4. The optical element of claim 1 , wherein the fluorinated hollow silica particles are hollow silica particles having a fluorine functional group that is introduced to a part of hydroxyl groups existing on a surface of the hollow silica particles.

5. The optical element of claim 4 , wherein the fluorinated functional group comprises at least one selected from a (per)fluoro alkyl group and a (per)fluoro polyether group.

6. The optical element of claim 1 , wherein the fluorinated hollow silica particles have at least two particle diameter distributions which are different from each other.

7. The optical element of claim 1 , wherein an arithmetic mean roughness (Ra) of the first surface is 10 nm or higher.

8. The optical element of claim 1 , wherein the substrate is a polarizing means for polarizing light.

9. The optical element of claim 1 , wherein the silica film is formed from a coating solution for forming a silica film, the coating solution comprising:

the polysilazane or a mixture of the polysilazane and a reactive silicon compound;

the fluorinated hollow silica particles; and

a solvent that disperses the polysilazane and the fluorinated hollow silica particles.

10. The optical element of claim 9 , wherein a weight ratio of the polysilazane and the fluorinated hollow silica particles is in a range of about 94:6 to about 98:2.

11. The optical element of claim 9 , wherein the solvent is a hydrophobic and non-polar organic solvent.

12. The optical element of claim 1 , wherein the undulating structure is formed by a variation in a thickness of a layer of the fluorinated hollow silica particles concentrated toward the first surface.

13. A display device comprising

a display on which an image is displayed; and

an optical element disposed on a surface of the display,

wherein the optical element comprises:

a substrate; and

a silica film disposed on the substrate,

wherein the silica film has a first surface and a second surface, the first and second surfaces being opposite to each other,

the silica film includes silica and fluorinated hollow silica particles distributed in the silica, the fluorinated hollow silica particles being different from the silica, and the silica being formed by converting a polysilazane to the silica,

the fluorinated hollow silica particles are unevenly distributed with a greater concentration toward the first surface, and

the first surface of the silica film has an undulating structure.

14. The display device of claim 13 , wherein the silica film further comprises a reactive silicon compound.

15. The display device of claim 13 , wherein a region of the silica film where the fluorinated hollow silica particles are concentrated is a low-refractive index layer, and a region other than the region where the fluorinated hollow silica particles are concentrated is a hard coat layer.

16. The display device of claim 13 , wherein the fluorinated hollow silica particles are hollow silica particles having a fluorine functional group that is introduced to a part of hydroxyl groups existing on a surface of the hollow silica particles.

17. The display device of claim 16 , wherein the fluorinated functional group comprises at least one selected from a (per)fluoro alkyl group and a (per)fluoro polyether group.

18. The display device of claim 13 , wherein the fluorinated hollow silica particles have at least two particle diameter distributions which are different from each other.

19. The display device of claim 13 , wherein an arithmetic mean roughness (Ra) of the first surface is 10 nm or higher.

20. The display device of claim 13 , wherein the undulating structure is formed by a variation in a thickness of a layer of the fluorinated hollow silica particles concentrated toward the first surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2016
From: KOBORI, SHIGETO
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 040781/0594 →
Priority Claims (3)
JP 2014-135339 · Jun 30, 2014 · national
JP 2014-220831 · Oct 29, 2014 · national
JP 2015-119477 · Jun 12, 2015 · national
Continuity (1)
Related Publication 20170123108A1 · May 4, 2017
Cited By (1)
US 12,523,089