Storage zone for an image array pixel

1. A pixel of an image array comprising one or more charge storage structures, each charge storage structure comprising:

a first charge storage trench doped to have a first conductivity type and having a first end configured to receive charge accumulated by a photodiode;

a second charge storage trench doped to have the first conductivity type; and

a first transfer gate linking a second end of the first charge storage trench, and the second charge storage trench, to a sense node, wherein the first and second charge storage trenches are linked together by a linking channel doped to have the first conductivity type and bordering a portion of an edge of the transfer gate, wherein the linking channel provides an electrostatic potential barrier between the first and second charge storage trenches, the linking channel being configured such that the electrostatic potential barrier is lower than an electrostatic potential barrier between the first charge storage trench and the sense node.

2. The pixel of claim 1 , wherein the linking channel has a width of between 20 nm and 300 nm.

3. The pixel of claim 1 , wherein the linking channel comprises a right-angled bend.

4. The pixel of claim 1 , wherein the dimensions of the linking channel, the doping concentration in the linking channel, and/or a voltage level applied to the first transfer gate, are configured such that the energy gap separating the linking channel and the sense node is at least 10 kT, where k is the Boltzmann constant, and T is the temperature.

5. The pixel of clam 1 , wherein the second charge storage trench extends perpendicular to the first charge storage trench.

6. The pixel of claim 5 , wherein, in addition to said first and second charge storage trenches, each charge storage structure comprises at most two further charge storage trenches, the trenches of each charge storage structure forming a “T” shape or a cross shape.

7. The pixel of claim 1 , wherein the pixel further comprises a photodiode linked to the first charge storage trench by a second transfer gate.

8. The pixel of claim 1 , wherein the first and second charge storage trenches are laterally delimited along at least a portion of their length by capacitive isolation trenches configured to be biased by a biasing voltage.

9. The pixel of claim 1 , further comprising a third charge storage trench doped to have the first conductivity type and linked to the first or second charge storage trench by a further linking channel doped to have the first conductivity type and bordering a further portion of the edge of the transfer gate.

10. The pixel of claim 1 , comprising a plurality of said charge storage structures.

11. An image array comprising an array of pixels, each pixel corresponding to the pixel of claim 1 .

12. A method of fabricating a pixel of an image array, the method comprising forming one or n ore charge storage structures, each charge storage structure being formed by:

forming a first charge storage trench doped to have a first conductivity type and having a first end configured to receive charge accumulated by a photodiode;

forming a second charge storage trench doped to have the first conductivity type; and

forming a first transfer gate linking a second end of the first charge storage trench, and the second charge storage trench, to a sense node, wherein the first and second charge storage trenches are linked together by a linking channel doped to have the first conductivity type and bordering a portion of an edge of the transfer gate, wherein the linking channel provides an electrostatic potential barrier between the first and second charge storage trenches, the linking channel being configured such that the electrostatic potential barrier is lower than an electrostatic potential barrier between the first charge storage trench and the sense node.