IP Library Granted Patent US 10,471,165
Granted Patent B2
US 10,471,165 · App. 15/688,306 · Granted Nov 12, 2019

Sterilization or disinfection of workpieces, including medical and dental instruments

Inventors: John Richardson (Hanover, VA); Kevin White (Richmond, VA); Benjamin Niemaseck (Chesterfield, VA); Douglas McIlwaine (Ashland, VA); James Wilkins (Midlothian, VA); Rob Bedinger (Richmond, VA); Yatao Liu (Cypress, CA); James Liang-Hiong Chia (Irvine, CA); Stephen C. Fanning (Trabuco Canyon, CA); Tim Taylor (Orange, CA)
Assignee: CHEMTREAT, INC.
A61L2/20A61L2202/14A61L2202/24
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Quick Facts
Patent No.
US 10,471,165
App. No.
15/688,306
Granted
Nov 12, 2019
Kind
B2
Abstract

Devices and methods for sterilizing and/or disinfecting workpieces, such as medical and dental instruments. The device can include a chamber that receives the workpieces and can be sealed. The chamber is filled with chlorine dioxide gas to a threshold concentration and for a time sufficient to sterilize and/or disinfect the workpieces.

Claims (18)

1. A device for sterilizing or disinfecting a workpiece, the device comprising:

a chamber defining an interior treatment space, the chamber being configured to be able to receive the workpiece when the chamber is opened and to be sealed when the chamber is closed;

a chlorine dioxide gas source that is configured to supply chlorine dioxide gas to the chamber when the chamber is closed, the chlorine dioxide gas source being further configured to generate the chlorine dioxide gas by contacting a dry chlorite reactant media with an ozone-containing gas,

wherein the device is configured to fill the interior treatment space with the chlorine dioxide gas when the chamber is closed at least until the chlorine dioxide concentration in the internal treatment space reaches a predetermined threshold concentration.

2. The device according to claim 1 , further comprising a chlorine dioxide sensor that is configured to detect chlorine dioxide concentration in the interior treatment space.

3. The device according to claim 2 , further comprising a controller that is configured to receive information from the chlorine dioxide sensor, and is configured to send signals to control an amount of the chlorine dioxide gas that the chlorine dioxide gas source supplies to the chamber based on the information received from the chlorine dioxide sensor.

4. The device according to claim 1 , further comprising an ozone generator that is configured to generate the ozone-containing gas, and wherein the ozone-containing gas is supplied to the dry chlorite reactant media.

5. The device according to claim 4 , further comprising an air compressor that supplies compressed air to the ozone generator.

6. The device according to claim 5 , further comprising a controller that is configured to send signals to at least one of the ozone generator and air compressor to control the amount of chlorine dioxide gas that is supplied to the chamber.

7. The device according to claim 1 , further comprising a pressure sensor that is configured to detect pressure in the interior treatment space.

8. The device according to claim 1 , wherein the device is configured to be able to control the humidity in the interior treatment space.

9. The device according to claim 1 , further comprising a scrubber that is configured to receive evacuated gas from the chamber, and wherein the scrubber is further configured to adsorb or neutralize chlorine dioxide in the evacuated gas.

10. The device according to claim 1 , further comprising a pressure relief valve that releases gas in the chamber if the chamber exceeds a threshold pressure.

11. The device according to claim 1 , wherein the interior treatment space of the chamber includes a plurality of holding sites that are configured to hold medical and/or dental instruments.

12. The device according to claim 1 , wherein the device is configured to fill the interior treatment space with the chlorine dioxide gas so that the concentration of chlorine dioxide in the interior treatment space is in the range of from 5 mg/L to 1,000 mg/L.

13. The device according to claim 1 , wherein the device is configured to maintain the concentration of chlorine dioxide in the internal treatment space at or above the predetermined threshold concentration for a treatment period of from 2 minutes to three hours.

14. The device according to claim 13 , wherein, after the treatment period, the device is configured to change the concentration of chlorine dioxide in the chamber to a second predetermined threshold concentration for storing the workpiece while the chamber remains in the closed position.

15. The device according to claim 1 , wherein the chlorine dioxide gas source is configured so that ozone in the ozone-containing gas reacts with chlorite in the dry chlorite reactant media at a gas-solid interface between the ozone-containing gas and the dry chlorite reactant media to produce the chlorine dioxide gas.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2018
From: RICHARDSON, JOHN; WHITE, KEVIN; NIEMASECK, BENJAMIN; MCILWAINE, DOUGLAS; WILKINS, JAMES; BEDINGER, ROB; LIU, YATAO; CHIA, JAMES LIANG-HIONG; FANNING, STEPHEN C.; TAYLOR, TIM
To: CHEMTREAT, INC.; METREX RESEARCH, LLC
Reel/Frame 046206/0491 →
Continuity (2)
Provisional Application 62379939 · Aug 26, 2016
Related Publication 20180055963A1 · Mar 1, 2018
Cited By (4)
US 12,575,572 US 12,588,679 US 12,653,193 US 12,662,377