Electrochromic device and manufacturing method therefor
An electrochromic device, the electrochromic device including a substrate; a first electrode provided on the substrate; an ion storage layer provided on the first electrode; a polymer electrolyte layer provided on the ion storage layer; an electrochromic layer provided on the polymer electrolyte layer; and a second electrode provided on the electrochromic layer, wherein the ion storage layer includes Mo a Ti b O x N y , and a, b, x and y are the same as or different from each other and each independently is a real number of greater than or equal to 0.5 and less than or equal to 60. Also included is a method for manufacturing an electrochromic device.
1. An electrochromic device, comprising:
a substrate;
a first electrode provided on the substrate;
an ion storage layer provided on the first electrode;
a polymer electrolyte layer provided on the ion storage layer;
an electrochromic layer provided on the polymer electrolyte layer; and
a second electrode provided on the electrochromic layer,
wherein the ion storage layer includes Mo a Ti b O x N y , wherein a, b, x and y are the same as or different from each other and each independently is a real number of greater than or equal to 0.5 and less than or equal to 60.
2. The electrochromic device of claim 1 , wherein the ion storage layer has a thickness of greater than or equal to 20 nm and less than or equal to 100 nm.
3. The electrochromic device of claim 1 , wherein the ion storage layer has a refractive index of 1.8 to 2.9 at a 550 nm wavelength.
4. The electrochromic device of claim 1 , wherein a and b satisfy the following Equation (1) and x and y satisfy the following Equation (2):
0.5
<
a
b
<
1.5
(
1
)
0.1
<
x
y
<
5.
(
2
)
5. The electrochromic device of claim 1 , wherein the electrochromic layer includes an oxide including tungsten (W).
6. The electrochromic device of claim 1 , wherein the electrochromic layer has a thickness of greater than or equal to 20 nm and less than or equal to 1 μm.
7. The electrochromic device of claim 1 , further comprising a film on the second electrode.
8. A method for manufacturing an electrochromic device comprising:
forming a first electrode on a substrate;
forming an ion storage layer on the first electrode;
forming an electrochromic layer on a second electrode; and
forming a polymer electrolyte layer between the ion storage layer and the electrochromic layer,
wherein the ion storage layer includes Mo a Ti b O x N y , wherein a, b, x and y are the same as or different from each other and each independently is a real number of greater than or equal to 0.5 and less than or equal to 60.
9. The method for manufacturing an electrochromic device of claim 8 , wherein the forming of an ion storage layer and the forming of an electrochromic layer are conducted using a vacuum deposition method or direct current sputtering (DC sputtering).
10. The method for manufacturing an electrochromic device of claim 8 , wherein a and b satisfy the following Equation (1) and x and y satisfy the following Equation (2):
0.5
<
a
b
<
1.5
(
1
)
0.1
<
x
y
<
5.
(
2
)
11. The method for manufacturing an electrochromic device of claim 8 , wherein the electrochromic layer includes an oxide including tungsten (W).
12. The electrochromic device of claim 1 , wherein the ion storage layer has a thickness of greater than or equal to 20 nm and less than or equal to 240 nm.