Apparatus for treating substrate
A substrate treating apparatus is provided which includes a treating container of which a top end is opened, a substrate support unit placed in a treating container to support a substrate, a treatment solution supply unit supplying a treatment solution to a substrate put on the support unit, and a heating unit placed in the substrate support unit to heat the substrate. The heating unit includes a heating element and a reflection element reflecting a heat from the heating element upward.
1. A substrate treating apparatus comprising:
a treating container of which a top end is opened;
a substrate support placed in a treating container to support a substrate;
a treatment solution supply supplying a treatment solution to a substrate put on the substrate support; and
a heating unit placed in the substrate support to heat the substrate,
wherein the heating unit comprises:
a heating element comprising a plurality of lamps; and
a reflection element reflecting a heat from the heating element upward, the reflection element comprising:
a lower reflection plate located under the lamps;
a main reflection plate disposed between lamps on the lower reflection plate;
an inner reflection plate located between a center of the substrate support and the lamps on the lower reflection plate; and
an outer reflection plate spaced apart from the inner reflection plate, with the lamps interposed therebetween, and disposed on the lower reflection plate,
wherein an uppermost surface of the outer reflection plate is horizontally lower than an uppermost surface of the main reflection plate and an uppermost surface of the inner reflection plate.
2. The substrate treating apparatus of claim 1 , wherein the substrate support comprises:
a chuck stage on which a substrate is put and rotatable; and
a rotary unit having a hollow form and rotating the chuck stage in connection with the chuck stage,
wherein the heating element is located in the chuck stage and includes the plurality of lamps concentrically arranged to have ring shapes of which distances from a center of the chuck stage are different from each other.
3. The substrate treating apparatus of claim 1 , wherein the main reflection plate protrudes upward from the lower reflection plate.
4. The substrate treating apparatus of claim 3 , wherein the main reflection plate comprises a first side wall, and
wherein the first side wall is inclined to be away from adjacent lamps toward a top end thereof.
5. The substrate treating apparatus of claim 4 , wherein the main reflection plate further comprises:
a second side wall,
wherein the first side wall and the second side wall is symmetrical with a virtual line, passing through a center of the main reflection plate, as the center.
6. The substrate treating apparatus of claim 1 , wherein a width of the main reflection plate becomes progressively narrower toward a top end thereof.
7. The substrate treating apparatus of claim 6 , wherein the inner reflection plate is perpendicular to the lower reflection plate.
8. The substrate treating apparatus of claim 1 , wherein a surface of the reflection element is formed of a metallic material.
9. The substrate treating apparatus of claim 8 , wherein a surface of the reflection element is formed of one of gold, silver, or aluminum.