Method of manufacturing light emitting device

1. A method of manufacturing a light emitting device, the method comprising:

providing an element-structure wafer having a first substrate and a laser element structure on the first substrate;

bonding a laser element structure side of the element-structure wafer to a second substrate to obtain a bonded wafer;

removing at least a portion of the first substrate to obtain a thinned bonded wafer;

singulating the thinned bonded wafer to obtain a laser element with the second substrate;

mounting the laser element with the second substrate on a heat dissipating member such that a laser element side of the laser element with the second substrate faces the heat dissipating member; and

removing the second substrate from the laser element.

2. The method of manufacturing the light emitting device according to claim 1 , wherein

the bonding of the laser element structure side of the element-structure wafer to the second substrate is performed by using a bonding method that allows physical separation, and

the removing of the second substrate from the laser element is performed by physical separation.

3. The method of manufacturing the light emitting device according to claim 1 , wherein

the providing of the element-structure wafer includes providing the element-structure wafer having the laser element structure having ridges on a side opposite to the first substrate.

4. The method of manufacturing the light emitting device according to claim 3 , wherein

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes bonding the element-structure wafer and the second substrate at portions where the ridges are formed in a plan view while the element-structure wafer and the second substrate are not bonded with each other at portions other than the portions where the ridges are formed in the plan view.

5. The method of manufacturing the light emitting device according to claim 2 , wherein

the providing of the element-structure wafer includes forming a first metal layer on an outermost surface of the laser element structure on a side opposite to the first substrate, and

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes

providing the second substrate having a main body and a second metal layer disposed on an outermost surface on a main surface side of the main body, and

bonding the first metal layer of the element-structure wafer to the second metal layer of the second substrate, while maintaining an interface between the first metal layer of the element-structure wafer and the second metal layer of the second substrate.

6. The method of manufacturing the light emitting device according to claim 5 , wherein

the providing of the element-structure wafer includes forming the first metal layer so that the first metal layer constitutes at least a portion of each of electrodes of the laser element structure.

7. The method of manufacturing the light emitting device according claim 1 , wherein

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes bonding the element-structure wafer to the second substrate such that an easy-cleavage plane of the first substrate and an easy-cleavage plane of the second substrate are parallel to each other when viewed from the laser element structure side or a second substrate side.

8. The method of manufacturing the light emitting device according to claim 1 , wherein

the providing of the element-structure w includes providing an GaN substrate as the first substrate and providing a nitride semiconductor layer as the laser element structure, and

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes providing an Si substrate as the second substrate.

9. The method of manufacturing a light emitting device according to claim 1 , wherein

the removing of the second substrate from the laser element is performed by pushing the second substrate.

10. The method of manufacturing the light emitting device according to claim 9 , wherein

the providing of the element-structure wafer includes providing the element-structure wafer having the laser element structure having ridges extending in an extending direction on a side opposite to the first substrate.

11. The method of manufacturing the light emitting device according to claim 10 , wherein

the removing of the second substrate from the laser element includes pushing the second substrate to move the second substrate in the extending direction of the ridges.

12. The method of manufacturing the light emitting device according to claim 10 , wherein

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes bonding the element-structure wafer and the second substrate at portions where the ridges are formed in a plan view while the element-structure wafer and the second substrate are not bonded with each other at portions other than the portions where the ridges are formed in the plan view.

13. The method of manufacturing the light emitting device according to claim 9 , wherein

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes bonding the element-structure Wafer and the second substrate by a metal bonding technique.

14. The method of manufacturing the light emitting device according to claim 13 , wherein

the bonding of the laser element structure side of the element-structure wafer to the second substrate is performed under conditions in which a temperature of the bonding is 200° C. to 300° C., a force of the bonding is 3 kN to 10 kN, and duration of the bonding is 5 minutes to 15 minutes.

15. The method of manufacturing the light emitting device according to claim 9 , wherein

the providing of the element-structure wafer includes forming a first metal layer on an outermost surface of the laser element structure on a side opposite to the first substrate, and

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes

providing the second substrate having a main body and a second metal layer disposed on an outermost surface on a main surface side of the main body, and

bonding the first metal layer of the element-structure wafer to the second metal layer of the second substrate by the metal bonding technique.

16. The method of manufacturing the light emitting device according to claim 15 , wherein

the providing of the element-structure wafer includes forming the first metal layer so that the first metal layer constitutes at least a portion of each of electrodes of the laser element structure.

17. The method of manufacturing the light emitting device according to claim 9 , wherein

the providing of the element-structure wafer includes providing an GaN substrate as the first substrate and a nitride semiconductor layer as the laser element structure, and

the bonding of the laser element structure side of the element-structure wafer to the second substrate includes providing an Si substrate as the second substrate.

18. The method of manufacturing a light emitting device according to claim 1 , wherein

the removing of the second substrate from the laser element is performed by lifting the second substrate while holding the second substrate by a clamp or a suction jig.