Insulating structure
View Patent ↗In an insulating structure which insulates an electrode provided inside a vacuum region of an ion implanter from another member and supports the electrode, a first insulating member supports the electrode. A second insulating member is fitted to the first insulating member to suppress deposition of contamination particles to the first insulating member. The second insulating member is formed of a material having a hardness lower than that of the first insulating member. A Vickers hardness of an outer surface of the second insulating member is 5 GPa or less. Bending strength of the second insulating member is 100 MPa or less. The second insulating member is formed of a material including at least one of boron nitride, a porous ceramic, and a resin.
1. An insulating structure which insulates an electrode provided inside a vacuum region of an ion implanter from another member and supports the electrode, comprising:
a first insulating member which supports the electrode; and
a second insulating member which is fitted to the first insulating member to suppress deposition of contamination particles on the first insulating member,
wherein the second insulating member is formed of a material having a hardness lower than that of the first insulating member,
wherein the second insulating member includes a tubular portion which annularly surrounds at least a portion of the first insulating member, and
wherein a clearance gap between the tubular portion and the first insulating member is 1 mm or less.
2. The insulating structure according to claim 1 ,
wherein a Vickers hardness of an outer surface of the second insulating member is 5 GPa or less.
3. The insulating structure according to claim 1 ,
wherein bending strength of the second insulating member is 100 MPa or less.
4. The insulating structure according to claim 1 ,
wherein the second insulating member is formed of a material including at least one of boron nitride, a porous ceramic, and a resin.
5. An insulating structure which insulates an electrode provided inside a vacuum region of an ion implanter from another member and supports the electrode, comprising:
a first insulating member which supports the electrode; and
a second insulating member which is fitted to the first insulating member to suppress deposition of contamination particles on the first insulating member,
wherein the second insulating member is formed of a material having a hardness lower than that of the first insulating member,
wherein the second insulating member is fitted to the first insulating member with play.
6. The insulating structure according to claim 5 ,
wherein the play is 0.2 mm or more.
7. The insulating structure according to claim 1 ,
wherein the second insulating member includes a plurality of portions which can be separated from each other, and
wherein the plurality of portions are fitted to different positions of the first insulating member.
8. The insulating structure according to claim 1 , further comprising:
a protection member which annularly surrounds at least a portion of the second insulating member to protect the second insulating member from the contamination particles.
9. The insulating structure according to claim 1 ,
wherein the first insulating member and the second insulating member are provided between the plurality of electrodes for extracting an ion beam from a plasma generating unit.
10. The insulating structure according to claim 5 ,
wherein a Vickers hardness of an outer surface of the second insulating member is 5 GPa or less.
11. The insulating structure according to claim 5 ,
wherein bending strength of the second insulating member is 100 MPa or less.
12. The insulating structure according to claim 5 ,
wherein the second insulating member is formed of a material including at least one of boron nitride, a porous ceramic, and a resin.
13. The insulating structure according to claim 5 ,
wherein the second insulating member includes a tubular portion which annularly surrounds at least a portion of the first insulating member, and
wherein a clearance gap between the tubular portion and the first insulating member is 1 mm or less.
14. The insulating structure according to claim 5 ,
wherein the second insulating member includes a plurality of portions which can be separated from each other, and
wherein the plurality of portions are fitted to different positions of the first insulating member.
15. The insulating structure according to claim 5 , further comprising:
a protection member which annularly surrounds at least a portion of the second insulating member to protect the second insulating member from the contamination particles.
16. The insulating structure according to claim 5 ,
wherein the first insulating member and the second insulating member are provided between the plurality of electrodes for extracting an ion beam from a plasma generating unit.