Atomic layer deposition-inhibiting material
An atomic layer deposition-inhibiting material composed of a fluorine-containing resin that has a fluorine content of 30 at % or greater, has at least one tertiary carbon atom and quaternary carbon atom, and lacks ester groups, hydroxyl groups, carboxyl groups, and imide groups.
1. An atomic layer deposition-inhibiting material comprising a fluorine-containing resin represented by the following formula (I):
X—[(CR 1 2 ) p —CR 4 R 5 —(CR 2 2 ) r —CR 6 R 7 —(CR 3 2 ) q ] n —Y (I)
where:
X and Y each independently is H, F, or CR 11 3 ;
R 11 each independently is H or F;
R 1 , R 2 , and R 3 each independently is H or F;
R 4 and R 6 each independently is H, F, or an alkyl group having 1 to 6 carbon atoms;
R 5 and R 7 each independently is an alkyl group having 1 to 6 carbon atoms; or
R 5 and R 7 may together form a group represented by the following formula:
—(O) s —(CR 12 2 ) t —
where
R 12 represents H, F, or an alkyl group having 1 to 6 carbon atoms,
s represents an integer of 0 to 2, and t represents an integer of 1 to 6;
p, q, and r each independently is an integer of 0 to 6; and
n is a natural number.
2. The atomic layer deposition-inhibiting material according to claim 1 , wherein the fluorine-containing resin comprises a resin represented by the formula (I):
R 1 and R 3 are F, p is 1 or 2,
R 4 and R 6 are F,
R 5 and R 7 together form —O—CF 2 —CF 2 — or —O—CF(CF 3 ) 2 —O—,
q is 0 or 1, and
r is 0.
3. The atomic layer deposition-inhibiting material according to claim 1 , wherein the fluorine-containing resin comprises no hydrogen atom.