GAA FET with u-shaped channel
A semiconductor device is disclosed. The semiconductor device includes a channel region, extending along a direction, that has a U-shaped cross-section; a gate dielectric layer wrapping around the channel region; and a gate electrode wrapping around respective central portions of the gate dielectric layer and the channel region.
1. A semiconductor device, comprising:
a channel region, extending along a direction, that has a first U-shaped cross-section, the first U-shaped cross-section having a middle portion, a first extension extending up from a first end of the middle portion, and a second extension extending up from a second end of the middle portion;
a gate dielectric layer completely wrapping around the channel region to form a U-shaped structure having a second U-shaped cross-section that contains the first U-shaped cross-section; and
a gate electrode completely wrapping around the second U-shaped cross-section of the gate dielectric layer, wherein the gate electrode is interposed between the first extension and the second extension.
2. The device of claim 1 , further comprising:
source/drain features disposed at respective side portions of the channel region.
3. The device of claim 1 , wherein the channel region is formed of a semiconductor material selected from: silicon, germanium, silicon-germanium, III-V compound semiconductor materials, and a combination thereof.
4. The device of claim 1 , wherein the gate dielectric layer includes a high-k dielectric material.
5. The device of claim 1 , wherein the first U-shaped cross-section includes a horizontal portion and two vertical portions coupled to respective ends of the horizontal portion.
6. The device of claim 1 , wherein the gate electrode is formed of a material selected from: Al, Cu, W, Ti, Ta, TiN, TiAl, TiAlN, TaN, NiSi, CoSi, polysilicon, and a combination thereof.
7. The device of claim 1 , wherein the gate dielectric layer has a thickness that is about 1 to 2 nanometers.
8. A semiconductor device, comprising:
a channel region that comprises a horizontal cross-section and two vertical cross-sections coupled to respective ends of the horizontal cross-section so as to provide a first U-shaped cross-section;
a gate dielectric layer completely wrapping around the channel region to form a U-shaped structure having a second U-shaped cross-section containing the first U-shaped cross-section, wherein the gate dielectric layer is interposed between the two vertical cross-sections of the channel region; and
a gate electrode completely wrapping around the second U-shaped cross-section of the gate dielectric layer between a source region and drain region formed in the channel region.
9. The device of claim 8 , wherein the gate dielectric layer includes a high-k dielectric material.
10. The device of claim 8 , wherein the channel region is formed of a semiconductor material selected from: silicon, germanium, silicon-germanium, III-V compound semiconductor materials, and a combination thereof.
11. The device of claim 8 , wherein the gate electrode is formed of a material selected from: Al, Cu, W, Ti, Ta, TiN, TiAl, TiAlN, TaN, NiSi, CoSi, polysilicon, and a combination thereof.
12. A semiconductor device, comprising:
a channel region, extending along a first direction, wherein the channel region has a first U-shaped cross-section including a horizontal portion and two vertical portions coupled to respective ends of the horizontal portion;
a gate dielectric layer completely wrapping around the channel region when viewed as a cross-section of the channel region and the gate dielectric layer, wherein the gate dielectric layer extends between the two vertical portions of the channel region;
a gate electrode completely wrapping around the gate dielectric layer when viewed as the cross-section of the channel region and the gate dielectric layer; and
a source and a drain disposed at respective side portions of the channel region on opposite sides of the gate electrode.
13. The device of claim 12 , wherein the channel region is formed of a semiconductor material selected from: silicon, germanium, silicon-germanium, III-V compound semiconductor materials, and a combination thereof.
14. The device of claim 12 , wherein the gate dielectric layer includes a high-k dielectric material.
15. The device of claim 12 , wherein the gate dielectric layer and the channel region form a U-shaped structure having a second U-shaped cross-section containing the first U-shaped cross-section.
16. The device of claim 12 , wherein the gate electrode is formed of a material selected from: Al, Cu, W, Ti, Ta, TiN, TiAl, TiAlN, TaN, NiSi, CoSi, polysilicon, and a combination thereof.
17. The device of claim 12 , wherein the gate dielectric layer has a thickness that is about 1 to 2 nanometers.
18. The device of claim 12 , wherein the gate dielectric layer is formed of a high-k dielectric material.