Semiconductor device
A semiconductor device includes a substrate having a first region and a second region, the first region including memory cells, and the second region including transistors for driving the memory cells, and device isolation regions disposed within the substrate to define active regions of the substrate. The active regions include a first guard active region surrounding the first region, a second guard active region surrounding a portion of the second region, and at least one dummy active region disposed between the first guard active region and the second guard active region.
1. A semiconductor device, comprising:
a substrate having a first region and a second region, the first region including memory cells, and the second region including transistors for driving the memory cells; and
device isolation regions disposed within the substrate to define active regions of the substrate,
wherein the memory cells are formed on a first well disposed in the first region of the substrate, the first well having first conductivity-type impurities, and
wherein the active regions include:
a first guard active region surrounding the first region;
a second guard active region surrounding a portion of the second region; and
at least one dummy active region disposed between the first guard active region and the second guard active region,
wherein at least one first contact plug is connected to the first guard active region, and at least one second contact plug is connected to the second guard active region, wherein the at least one first contact plug and the at least one second contact plug are for connecting to a power source, and
the at least one dummy active region is formed at the same level as the first guard active region and the second guard active region, and the at least one dummy active region is not directly below any contact plugs.
2. The semiconductor device of claim 1 , wherein the substrate includes:
a second well disposed within the substrate to surround the first well, the second well including the first guard active region, and the second well including second conductivity-type impurities.
3. The semiconductor device of claim 1 , wherein the second guard active region surrounds at least a transistor of the second region that is closest to the first region.
4. The semiconductor device of claim 1 , wherein the substrate includes a second well disposed in the second region, the second well being disposed adjacent to the second guard active region.
5. The semiconductor device of claim 1 , wherein the active regions further include a cell active region disposed in the first region, and another dummy active region further disposed between the cell active region and the first guard active region.
6. The semiconductor device of claim 1 , wherein the at least one dummy active region is spaced apart from a boundary between the first region and the second region, and extends along the boundary.
7. The semiconductor device of claim 1 , wherein each dummy active region of the at least one dummy active region has a line shape on a plane.
8. The semiconductor device of claim 1 , wherein each dummy active region of the at least one dummy active region has a plurality of quadrangular patterns disposed in a row on a plane.
9. The semiconductor device of claim 1 , wherein the at least one dummy active region includes a plurality of regions, the plurality of regions being spaced apart from one another, and the plurality of regions extending in parallel in one direction.
10. The semiconductor device of claim 1 , further comprising:
a dummy gate electrode disposed on a first dummy active region of the at least one dummy active region and being in a floating state.
11. The semiconductor device of claim 10 , wherein the dummy gate electrode extends in one direction along the first dummy active region.
12. The semiconductor device of claim 10 , wherein a width of the dummy gate electrode is greater than a width of the first dummy active region.
13. The semiconductor device of claim 1 , further comprising:
a channel region extending vertically in the first region; and
gate electrodes spaced apart from one another and stacked along the channel region, the gate electrodes extending to have different lengths toward a boundary between the first region and the second region.
14. The semiconductor device of claim 13 , wherein the gate electrodes extend in a first direction, and the at least one dummy active region extends in a second direction, perpendicular to the first direction.
15. The semiconductor device of claim 1 , wherein, between the first guard active region and the second guard active region, a distance between the first guard active region or the second guard active region and the at least one dummy active region adjacent to the first guard active region or the second guard active region is less than 3 μm.
16. The semiconductor device of claim 1 , wherein the first guard active region is formed in a second well disposed within the substrate to surround the first well.
17. A semiconductor device, comprising:
a substrate having a first region and a second region, the first region including memory cells, and the second region including transistors for driving the memory cells; and
device isolation regions disposed within the substrate to define active regions of the substrate,
wherein the memory cells are formed on a first well disposed in the first region of the substrate, the first well having first conductivity-type impurities, and
wherein the active regions include:
a first guard active region surrounding the first region;
a second guard active region surrounding a portion of the second region; and
at least one dummy active region disposed between the first guard active region and the second guard active region,
wherein at least one first contact plug is connected to the first guard active region, and at least one second contact plug is connected to the second guard active region, wherein the at least one first contact plug and the at least one second contact plug are for connecting to a power source, and
the at least one dummy active region is formed at the same level as the first guard active region and the second guard active region, and the at least one dummy active region is not configured to transfer voltage or signals from any contact plugs to the substrate.
18. The semiconductor device of claim 17 , wherein the substrate includes:
a second well disposed within the substrate to surround the first well, the second well including the first guard active region, and the second well including second conductivity-type impurities.
19. The semiconductor device of claim 17 , wherein the second guard active region surrounds at least a transistor of the second region that is closest to the first region.
20. The semiconductor device of claim 17 , wherein the at least one dummy active region is not vertically aligned with any contact plugs.