Multiple width nanosheet devices
A technique relates to a semiconductor device. A first stack includes a first plurality of nanowires respectively coupled to first source and drain regions, and a second stack includes a second plurality of nanowires respectively coupled to second source and drain regions. First source and drain contacts couple to a first predefined number of the first plurality of nanowires. Second source and drain contacts to couple to a second predefined number of the second plurality of nanowires, wherein the first predefined number is different from the second predefined number.
1. A method of forming a semiconductor device, the method comprising:
forming a first stack comprising a first plurality of nanowires respectively coupled to first source and drain regions, and a second stack comprising a second plurality of nanowires respectively coupled to second source and drain regions, wherein the first source and drain regions are grown from exposed sidewalls of the first plurality of nanowires and the second source and drain regions are grown from exposed sidewalls of the second plurality of nanowires;
forming first source and drain contacts to couple to a first predefined number of the first plurality of nanowires, the first source and drain contacts being directly connected to the first source and drain regions; and
forming second source and drain contacts to couple to a second predefined number of the second plurality of nanowires, the first predefined number being different from the second predefined number, wherein a depth of the first source and drain contacts is different from another depth of the second source and drain contacts.
2. The method of claim 1 further comprising forming a third stack comprising a third plurality of nanowires respectively coupled to third source and drain regions.
3. The method of claim 2 further comprising forming third source and drain contacts to couple to a third predefined number of the third plurality of nanowires.
4. The method of claim 3 , wherein the third predefined number is different from the first predefined number and the second predefined number.
5. The method of claim 3 , wherein the third predefined number is greater than the second predefined number, and the second predefined number is greater than the first predefined number.
6. The method of claim 1 , wherein the first predefined number of the first plurality of nanowires defines at least one active nanowire in the first stack.
7. The method of claim 1 , wherein the second predefined number of the second plurality of nanowires defines at least one active nanowire in the second stack.
8. The method of claim 1 , wherein the first source and drain contacts comprise a first depth arranged to couple to the first predefined number of the first plurality of nanowires via the first source and drain regions.
9. The method of claim 8 , wherein the second source and drain contacts comprise a second depth arranged to couple to the second predefined number of the second plurality of nanowires via the second source and drain regions, the first depth being different from the second depth.
10. A semiconductor device comprising:
a first stack comprising a first plurality of nanowires respectively coupled to first source and drain regions;
a second stack comprising a second plurality of nanowires respectively coupled to second source and drain regions, wherein the first source and drain regions are grown from exposed sidewalls of the first plurality of nanowires and the second source and drain regions are grown from exposed sidewalls of the second plurality of nanowires;
first source and drain contacts electrically coupled to a first predefined number of the first plurality of nanowires in the first stack, the first source and drain contacts being directly connected to the first source and drain regions; and
second source and drain contacts electrically coupled to a second predefined number of the second plurality of nanowires, the first predefined number being different from the second predefined number, wherein a depth of the first source and drain contacts is different from another depth of the second source and drain contacts.
11. The semiconductor device of claim 10 further comprising a third stack comprising a third plurality of nanowires respectively coupled to third source and drain regions.
12. The semiconductor device of claim 11 further comprising third source and drain contacts coupled to a third predefined number of the third plurality of nanowires in the third stack.
13. The semiconductor device of claim 12 , wherein the third predefined number is different from the first predefined number and the second predefined number.
14. The semiconductor device of claim 12 , wherein the third predefined number is greater than the second predefined number, and the second predefined number is greater than the first predefined number.
15. The semiconductor device of claim 10 , wherein the first predefined number of the first plurality of nanowires defines at least one active nanowire in the first stack.
16. The semiconductor device of claim 10 , wherein the second predefined number of the second plurality of nanowires defines at least one active nanowire in the second stack.
17. The semiconductor device of claim 10 , wherein the first source and drain contacts comprise a first depth arranged to couple to the first predefined number of the first plurality of nanowires via the first source and drain regions.
18. The semiconductor device of claim 17 , wherein the second source and drain contacts comprise a second depth arranged to couple to the second predefined number of the second plurality of nanowires via the second source and drain regions, the first depth being different from the second depth.
19. A method of forming a semiconductor device, the method comprising:
forming a first stack comprising a first plurality of nanowires respectively coupled to first source and drain regions, and a second stack comprising a second plurality of nanowires respectively coupled to second source and drain regions, wherein the first source and drain regions are grown from exposed sidewalls of the first plurality of nanowires and the second source and drain regions are grown from exposed sidewalls of the second plurality of nanowires;
forming first trenches exposing first select ones of the first source and drain regions, the first select ones of the first source and drain regions being coupled to a first predefined number of the first plurality of nanowires;
forming second trenches exposing second select ones of the second source and drain regions, the second select ones of the second source and drain regions being coupled to a second predefined number of the second plurality of nanowires;
forming first source and drain contacts to couple to the first predefined number of the first plurality of nanowires via the first select ones of the first source and drain regions; and
forming second source and drain contacts to couple to the second predefined number of the second plurality of nanowires via the second select ones of the second source and drain regions, wherein the first predefined number is different from the second predefined number.
20. The method of claim 19 , wherein the first predefined number of the first plurality of nanowires defines at least one active nanowire in the first stack and the second predefined number of the second plurality of nanowires defines at least one active nanowire in the second stack.