Semiconductor device including transistor which includes first gate and second gate
A semiconductor device capable of holding data for a long time is provided. The semiconductor device includes a first transistor, a second transistor, and a circuit. The first transistor includes a first gate and a second gate. The first transistor includes a first semiconductor in a channel formation region. The first gate and the second gate overlap with each other in a region with the first semiconductor provided therebetween. The second transistor includes a second semiconductor in a channel formation region. A first terminal of the second transistor is electrically connected to a gate of the second transistor and the second gate. A second terminal of the second transistor is electrically connected to the circuit. The circuit has a function of generating a negative potential. The second semiconductor has a wider bandgap than the first semiconductor.
1. A semiconductor device comprising:
a first transistor comprising a first gate, a second gate, and a first oxide semiconductor in a channel formation region;
a second transistor comprising a third gate, a fourth gate, and a second oxide semiconductor in a channel formation region; and
a circuit configured to generate a negative potential,
wherein the first gate of the first transistor and the second gate of the first transistor overlap with each other in a region with the first oxide semiconductor of the first transistor between the first gate of the first transistor and the second gate of the first transistor,
wherein the third gate of the second transistor is electrically connected to one of a source and a drain of the second transistor,
wherein the one of the source and the drain of the second transistor is electrically connected to the second gate of the first transistor,
wherein the other of the source and the drain of the second transistor is electrically connected to the circuit,
wherein the fourth gate of the second transistor is electrically connected to the third gate of the second transistor,
wherein each of the first oxide semiconductor of the first transistor and the second oxide semiconductor of the second transistor comprises In and Ga, and
wherein a bandgap of the second oxide semiconductor of the second transistor is wider than a bandgap of the first oxide semiconductor of the first transistor.
2. The semiconductor device according to claim 1 , wherein a ratio of a number of Ga atoms to a number of In atoms in the second oxide semiconductor of the second transistor is higher than a ratio of a number of Ga atoms to a number of In atoms in the first oxide semiconductor of the first transistor.
3. A memory device comprising the semiconductor device according to claim 1 .
4. An electronic device comprising:
the semiconductor device according to claim 1 ; and
a display device, a microphone, a speaker, an operation key, or a housing.
5. A semiconductor device comprising:
a first transistor comprising a first gate, a second gate, and a first oxide semiconductor in a channel formation region;
a second transistor comprising a third gate, a fourth gate, and a second oxide semiconductor in a channel formation region;
a third transistor;
a capacitor; and
a circuit configured to generate a negative potential,
wherein the first gate of the first transistor and the second gate of the first transistor overlap with each other in a region with the first oxide semiconductor of the first transistor between the first gate of the first transistor and the second gate of the first transistor,
wherein the third gate of the second transistor is electrically connected to a gate of the third transistor and a first terminal of the capacitor,
wherein one of a source and a drain of the second transistor is electrically connected to the second gate of the first transistor,
wherein the other of the source and the drain of the second transistor is electrically connected to the circuit,
wherein the fourth gate of the second transistor is electrically connected to the third gate of the second transistor,
wherein each of the first oxide semiconductor of the first transistor and the second oxide semiconductor of the second transistor comprises In and Ga, and
wherein a bandgap of the second oxide semiconductor of the second transistor is wider than a bandgap of the first oxide semiconductor of the first transistor.
6. The semiconductor device according to claim 5 , wherein the bandgap of the second oxide semiconductor of the second transistor is greater than or equal to 2.2 eV.
7. The semiconductor device according to claim 5 , wherein a ratio of a number of Ga atoms to a number of In atoms in the second oxide semiconductor of the second transistor is higher than a ratio of a number of Ga atoms to a number of In atoms in the first oxide semiconductor of the first transistor.
8. A memory device comprising the semiconductor device according to claim 5 .
9. An electronic device comprising:
the semiconductor device according to claim 5 ; and
a display device, a microphone, a speaker, an operation key, or a housing.
10. The semiconductor device according to claim 1 , further comprising a capacitor,
wherein a first terminal of the capacitor is electrically connected to the one of the source and the drain of the second transistor.
11. A semiconductor device comprising:
a first transistor comprising a first gate, a second gate, and a first oxide semiconductor in a channel formation region;
a second transistor comprising a third gate, a fourth gate, and a second oxide semiconductor in a channel formation region; and
a circuit configured to generate a negative potential,
wherein the first gate of the first transistor and the second gate of the first transistor overlap with each other in a region with the first oxide semiconductor of the first transistor between the first gate of the first transistor and the second gate of the first transistor,
wherein the third gate of the second transistor is electrically connected to one of a source and a drain of the second transistor,
wherein the one of the source and the drain of the second transistor is electrically connected to the second gate of the first transistor,
wherein the other of the source and the drain of the second transistor is electrically connected to the circuit,
wherein the fourth gate of the second transistor is electrically connected to the third gate of the second transistor, and
wherein each of the first oxide semiconductor of the first transistor and the second oxide semiconductor of the second transistor comprises In and Ga.
12. The semiconductor device according to claim 11 , wherein a ratio of a number of Ga atoms to a number of In atoms in the second oxide semiconductor of the second transistor is higher than a ratio of a number of Ga atoms to a number of In atoms in the first oxide semiconductor of the first transistor.
13. A memory device comprising the semiconductor device according to claim 11 .
14. An electronic device comprising:
the semiconductor device according to claim 11 ; and
a display device, a microphone, a speaker, an operation key, or a housing.
15. The semiconductor device according to claim 11 , further comprising a capacitor,
wherein a first terminal of the capacitor is electrically connected to the one of the source and the drain of the second transistor.